TW200517322A - Conveying apparatus, application system and inspection system - Google Patents
Conveying apparatus, application system and inspection systemInfo
- Publication number
- TW200517322A TW200517322A TW093127752A TW93127752A TW200517322A TW 200517322 A TW200517322 A TW 200517322A TW 093127752 A TW093127752 A TW 093127752A TW 93127752 A TW93127752 A TW 93127752A TW 200517322 A TW200517322 A TW 200517322A
- Authority
- TW
- Taiwan
- Prior art keywords
- conveying direction
- conveying
- conveyed material
- conveying apparatus
- conveyed
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0245—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to a moving work of indefinite length, e.g. to a moving web
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Coating Apparatus (AREA)
- Materials For Photolithography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
This invention is to provide a conveying apparatus, reducing the thrust required for conveying and restraining deflection of a conveyed material, and an application system and an inspection system having the apparatus. This conveying apparatus 12, 62, includes: a base 16 having a principal surface 16a extended in the conveying direction X of the conveyed material; a guide member18 extended in the conveying direction X; a moving member 20 guided by the guide member 18 to be moved in the conveying direction X; a holding member 24 fixed to the moving member 20 to hold the conveyed material 28 at a space from the principal surface 16a; and a gas discharge and sucking mechanism 26 for sucking and discharging gas to and from the conveyed material 28 conveyed in the conveying direction X in a partial area in the conveying direction X on the base 16.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003347433 | 2003-10-06 | ||
JP2003421506A JP4426276B2 (en) | 2003-10-06 | 2003-12-18 | Conveying device, coating system, and inspection system |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200517322A true TW200517322A (en) | 2005-06-01 |
TWI261041B TWI261041B (en) | 2006-09-01 |
Family
ID=34655936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093127752A TWI261041B (en) | 2003-10-06 | 2004-09-14 | Conveying apparatus, application system and inspection system |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4426276B2 (en) |
KR (1) | KR100628699B1 (en) |
CN (1) | CN1611430A (en) |
TW (1) | TWI261041B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI746777B (en) * | 2017-01-24 | 2021-11-21 | 日商Thk股份有限公司 | Work conveyance control system and motion guide device |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005321505A (en) * | 2004-05-07 | 2005-11-17 | Kokusai Gijutsu Kaihatsu Co Ltd | Exposure apparatus |
JP2006186251A (en) * | 2004-12-28 | 2006-07-13 | Kumamoto Technology & Industry Foundation | Coating apparatus |
TWI307929B (en) * | 2005-05-12 | 2009-03-21 | Olympus Corp | Substrate inspection apparatus |
JP4553376B2 (en) * | 2005-07-19 | 2010-09-29 | 東京エレクトロン株式会社 | Floating substrate transfer processing apparatus and floating substrate transfer processing method |
JP2007051001A (en) * | 2005-08-19 | 2007-03-01 | Nippon Sekkei Kogyo:Kk | Method and apparatus for conveying thin sheet-like material |
JP4634265B2 (en) * | 2005-09-27 | 2011-02-16 | 東京エレクトロン株式会社 | Coating method and coating apparatus |
JP4615415B2 (en) * | 2005-09-30 | 2011-01-19 | シャープ株式会社 | Display element component correcting apparatus and display element component correcting method |
JP2007283428A (en) * | 2006-04-14 | 2007-11-01 | Yokogawa Electric Corp | Workpiece machining device and workpiece transfer system |
JP2007316162A (en) * | 2006-05-23 | 2007-12-06 | Sharp Corp | Display device component correcting apparatus and display device component correcting method |
JP2008016543A (en) * | 2006-07-04 | 2008-01-24 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus |
JP4962760B2 (en) * | 2006-07-19 | 2012-06-27 | 横河電機株式会社 | Transport system |
JP5265099B2 (en) * | 2006-09-11 | 2013-08-14 | オリンパス株式会社 | Board inspection equipment |
JP4272230B2 (en) * | 2006-12-22 | 2009-06-03 | 東京エレクトロン株式会社 | Vacuum dryer |
JP2008212804A (en) * | 2007-03-02 | 2008-09-18 | Tokyo Ohka Kogyo Co Ltd | Conveying and coating machine of substrate |
JP4495752B2 (en) * | 2007-11-06 | 2010-07-07 | 東京エレクトロン株式会社 | Substrate processing apparatus and coating apparatus |
JP5403389B2 (en) * | 2008-03-27 | 2014-01-29 | 日本電気硝子株式会社 | Glass substrate inspection apparatus and glass substrate inspection method |
KR101431146B1 (en) | 2008-05-09 | 2014-08-18 | 주식회사 디엠에스 | apparatus for coating photoresist on substrate |
KR101634825B1 (en) * | 2008-06-09 | 2016-06-29 | 케이엘에이-텐코어 코오포레이션 | Referenced inspection device |
JP5056611B2 (en) * | 2008-06-20 | 2012-10-24 | 凸版印刷株式会社 | Substrate processing equipment |
TWI544294B (en) * | 2008-08-18 | 2016-08-01 | 瑪波微影Ip公司 | Charged particle beam lithography system and target positioning device |
JP4787872B2 (en) * | 2008-10-16 | 2011-10-05 | 東京エレクトロン株式会社 | Substrate transfer processing equipment |
DE102010008233A1 (en) * | 2010-02-11 | 2011-08-11 | Schmid Technology GmbH, 68723 | Device and method for transporting substrates |
KR101146609B1 (en) * | 2010-04-08 | 2012-05-16 | 주식회사 태성기연 | Apparatus for transferring of glass panel |
JP2012096920A (en) * | 2010-11-05 | 2012-05-24 | Hitachi High-Technologies Corp | Glass substrate defect inspection device and glass substrate defect inspection method and glass substrate defect inspection system |
TW201314372A (en) * | 2011-09-26 | 2013-04-01 | Dainippon Screen Mfg | Coating device |
JP5918518B2 (en) * | 2011-11-30 | 2016-05-18 | 川崎重工業株式会社 | Yaw correction mechanism and its correction method for transported workpieces |
JP2014010018A (en) * | 2012-06-28 | 2014-01-20 | Seiko Epson Corp | Handler and inspection device |
JP2015034071A (en) * | 2013-08-08 | 2015-02-19 | 日本電気硝子株式会社 | Sheet member conveyance device, sheet member support device, sheet member inspection device, and sheet member conveying method |
JP2015218055A (en) * | 2014-05-20 | 2015-12-07 | オイレス工業株式会社 | Transportation rail and float transportation device |
JP6349388B2 (en) * | 2014-05-21 | 2018-06-27 | シャープ株式会社 | Wet process equipment |
CN115946453A (en) * | 2014-06-17 | 2023-04-11 | 科迪华公司 | Printing system assembly and method |
KR102022471B1 (en) * | 2014-09-19 | 2019-09-18 | 한화정밀기계 주식회사 | Apparatus for inspection of substrate |
JP2019010691A (en) * | 2017-06-29 | 2019-01-24 | 日本電産サンキョー株式会社 | Hand of industrial robot and industrial robot |
CN108333191B (en) * | 2018-05-14 | 2024-02-06 | 杭州智谷精工有限公司 | Optical double-field plane body rapid detection equipment based on dark field scanning and machine vision |
JP2021150351A (en) * | 2020-03-17 | 2021-09-27 | 東レエンジニアリング株式会社 | Substrate floating transport device |
JPWO2022202396A1 (en) * | 2021-03-25 | 2022-09-29 | ||
CN114602741B (en) * | 2022-03-30 | 2023-08-29 | 深圳市鑫龙邦科技有限公司 | Roll-to-roll COB lamp strip dispenser and method |
WO2024009470A1 (en) * | 2022-07-07 | 2024-01-11 | Jswアクティナシステム株式会社 | Conveyance device, conveyance method, and method for producing semiconductor device |
-
2003
- 2003-12-18 JP JP2003421506A patent/JP4426276B2/en not_active Expired - Fee Related
-
2004
- 2004-09-14 TW TW093127752A patent/TWI261041B/en not_active IP Right Cessation
- 2004-09-16 KR KR1020040074123A patent/KR100628699B1/en not_active IP Right Cessation
- 2004-10-08 CN CNA2004100835055A patent/CN1611430A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI746777B (en) * | 2017-01-24 | 2021-11-21 | 日商Thk股份有限公司 | Work conveyance control system and motion guide device |
Also Published As
Publication number | Publication date |
---|---|
JP4426276B2 (en) | 2010-03-03 |
TWI261041B (en) | 2006-09-01 |
JP2005132626A (en) | 2005-05-26 |
KR20050033426A (en) | 2005-04-12 |
KR100628699B1 (en) | 2006-09-28 |
CN1611430A (en) | 2005-05-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |