TW200517322A - Conveying apparatus, application system and inspection system - Google Patents

Conveying apparatus, application system and inspection system

Info

Publication number
TW200517322A
TW200517322A TW093127752A TW93127752A TW200517322A TW 200517322 A TW200517322 A TW 200517322A TW 093127752 A TW093127752 A TW 093127752A TW 93127752 A TW93127752 A TW 93127752A TW 200517322 A TW200517322 A TW 200517322A
Authority
TW
Taiwan
Prior art keywords
conveying direction
conveying
conveyed material
conveying apparatus
conveyed
Prior art date
Application number
TW093127752A
Other languages
Chinese (zh)
Other versions
TWI261041B (en
Inventor
Yoshiyuki Tomita
Yuuji Kobayashi
Yasushi Koyanagawa
Yousuke Mitsunaga
Original Assignee
Sumitomo Heavy Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries filed Critical Sumitomo Heavy Industries
Publication of TW200517322A publication Critical patent/TW200517322A/en
Application granted granted Critical
Publication of TWI261041B publication Critical patent/TWI261041B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02Means for manipulating or holding work, e.g. for separate articles for particular articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0245Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to a moving work of indefinite length, e.g. to a moving web
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Coating Apparatus (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

This invention is to provide a conveying apparatus, reducing the thrust required for conveying and restraining deflection of a conveyed material, and an application system and an inspection system having the apparatus. This conveying apparatus 12, 62, includes: a base 16 having a principal surface 16a extended in the conveying direction X of the conveyed material; a guide member18 extended in the conveying direction X; a moving member 20 guided by the guide member 18 to be moved in the conveying direction X; a holding member 24 fixed to the moving member 20 to hold the conveyed material 28 at a space from the principal surface 16a; and a gas discharge and sucking mechanism 26 for sucking and discharging gas to and from the conveyed material 28 conveyed in the conveying direction X in a partial area in the conveying direction X on the base 16.
TW093127752A 2003-10-06 2004-09-14 Conveying apparatus, application system and inspection system TWI261041B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003347433 2003-10-06
JP2003421506A JP4426276B2 (en) 2003-10-06 2003-12-18 Conveying device, coating system, and inspection system

Publications (2)

Publication Number Publication Date
TW200517322A true TW200517322A (en) 2005-06-01
TWI261041B TWI261041B (en) 2006-09-01

Family

ID=34655936

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093127752A TWI261041B (en) 2003-10-06 2004-09-14 Conveying apparatus, application system and inspection system

Country Status (4)

Country Link
JP (1) JP4426276B2 (en)
KR (1) KR100628699B1 (en)
CN (1) CN1611430A (en)
TW (1) TWI261041B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI746777B (en) * 2017-01-24 2021-11-21 日商Thk股份有限公司 Work conveyance control system and motion guide device

Families Citing this family (38)

* Cited by examiner, † Cited by third party
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JP2005321505A (en) * 2004-05-07 2005-11-17 Kokusai Gijutsu Kaihatsu Co Ltd Exposure apparatus
JP2006186251A (en) * 2004-12-28 2006-07-13 Kumamoto Technology & Industry Foundation Coating apparatus
TWI307929B (en) * 2005-05-12 2009-03-21 Olympus Corp Substrate inspection apparatus
JP4553376B2 (en) * 2005-07-19 2010-09-29 東京エレクトロン株式会社 Floating substrate transfer processing apparatus and floating substrate transfer processing method
JP2007051001A (en) * 2005-08-19 2007-03-01 Nippon Sekkei Kogyo:Kk Method and apparatus for conveying thin sheet-like material
JP4634265B2 (en) * 2005-09-27 2011-02-16 東京エレクトロン株式会社 Coating method and coating apparatus
JP4615415B2 (en) * 2005-09-30 2011-01-19 シャープ株式会社 Display element component correcting apparatus and display element component correcting method
JP2007283428A (en) * 2006-04-14 2007-11-01 Yokogawa Electric Corp Workpiece machining device and workpiece transfer system
JP2007316162A (en) * 2006-05-23 2007-12-06 Sharp Corp Display device component correcting apparatus and display device component correcting method
JP2008016543A (en) * 2006-07-04 2008-01-24 Dainippon Screen Mfg Co Ltd Substrate processing apparatus
JP4962760B2 (en) * 2006-07-19 2012-06-27 横河電機株式会社 Transport system
JP5265099B2 (en) * 2006-09-11 2013-08-14 オリンパス株式会社 Board inspection equipment
JP4272230B2 (en) * 2006-12-22 2009-06-03 東京エレクトロン株式会社 Vacuum dryer
JP2008212804A (en) * 2007-03-02 2008-09-18 Tokyo Ohka Kogyo Co Ltd Conveying and coating machine of substrate
JP4495752B2 (en) * 2007-11-06 2010-07-07 東京エレクトロン株式会社 Substrate processing apparatus and coating apparatus
JP5403389B2 (en) * 2008-03-27 2014-01-29 日本電気硝子株式会社 Glass substrate inspection apparatus and glass substrate inspection method
KR101431146B1 (en) 2008-05-09 2014-08-18 주식회사 디엠에스 apparatus for coating photoresist on substrate
KR101634825B1 (en) * 2008-06-09 2016-06-29 케이엘에이-텐코어 코오포레이션 Referenced inspection device
JP5056611B2 (en) * 2008-06-20 2012-10-24 凸版印刷株式会社 Substrate processing equipment
TWI544294B (en) * 2008-08-18 2016-08-01 瑪波微影Ip公司 Charged particle beam lithography system and target positioning device
JP4787872B2 (en) * 2008-10-16 2011-10-05 東京エレクトロン株式会社 Substrate transfer processing equipment
DE102010008233A1 (en) * 2010-02-11 2011-08-11 Schmid Technology GmbH, 68723 Device and method for transporting substrates
KR101146609B1 (en) * 2010-04-08 2012-05-16 주식회사 태성기연 Apparatus for transferring of glass panel
JP2012096920A (en) * 2010-11-05 2012-05-24 Hitachi High-Technologies Corp Glass substrate defect inspection device and glass substrate defect inspection method and glass substrate defect inspection system
TW201314372A (en) * 2011-09-26 2013-04-01 Dainippon Screen Mfg Coating device
JP5918518B2 (en) * 2011-11-30 2016-05-18 川崎重工業株式会社 Yaw correction mechanism and its correction method for transported workpieces
JP2014010018A (en) * 2012-06-28 2014-01-20 Seiko Epson Corp Handler and inspection device
JP2015034071A (en) * 2013-08-08 2015-02-19 日本電気硝子株式会社 Sheet member conveyance device, sheet member support device, sheet member inspection device, and sheet member conveying method
JP2015218055A (en) * 2014-05-20 2015-12-07 オイレス工業株式会社 Transportation rail and float transportation device
JP6349388B2 (en) * 2014-05-21 2018-06-27 シャープ株式会社 Wet process equipment
CN115946453A (en) * 2014-06-17 2023-04-11 科迪华公司 Printing system assembly and method
KR102022471B1 (en) * 2014-09-19 2019-09-18 한화정밀기계 주식회사 Apparatus for inspection of substrate
JP2019010691A (en) * 2017-06-29 2019-01-24 日本電産サンキョー株式会社 Hand of industrial robot and industrial robot
CN108333191B (en) * 2018-05-14 2024-02-06 杭州智谷精工有限公司 Optical double-field plane body rapid detection equipment based on dark field scanning and machine vision
JP2021150351A (en) * 2020-03-17 2021-09-27 東レエンジニアリング株式会社 Substrate floating transport device
JPWO2022202396A1 (en) * 2021-03-25 2022-09-29
CN114602741B (en) * 2022-03-30 2023-08-29 深圳市鑫龙邦科技有限公司 Roll-to-roll COB lamp strip dispenser and method
WO2024009470A1 (en) * 2022-07-07 2024-01-11 Jswアクティナシステム株式会社 Conveyance device, conveyance method, and method for producing semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI746777B (en) * 2017-01-24 2021-11-21 日商Thk股份有限公司 Work conveyance control system and motion guide device

Also Published As

Publication number Publication date
JP4426276B2 (en) 2010-03-03
TWI261041B (en) 2006-09-01
JP2005132626A (en) 2005-05-26
KR20050033426A (en) 2005-04-12
KR100628699B1 (en) 2006-09-28
CN1611430A (en) 2005-05-04

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees