TW200508583A - Pattern substrate defect correction method and apparatus and pattern substrate manufacturing method - Google Patents

Pattern substrate defect correction method and apparatus and pattern substrate manufacturing method

Info

Publication number
TW200508583A
TW200508583A TW093108259A TW93108259A TW200508583A TW 200508583 A TW200508583 A TW 200508583A TW 093108259 A TW093108259 A TW 093108259A TW 93108259 A TW93108259 A TW 93108259A TW 200508583 A TW200508583 A TW 200508583A
Authority
TW
Taiwan
Prior art keywords
substrate
film
pattern substrate
pattern
laser light
Prior art date
Application number
TW093108259A
Other languages
Chinese (zh)
Other versions
TWI262306B (en
Inventor
Haruhiko Kusunose
Naoki Awamura
Akira Hatase
Takuji Ishikawa
Kiyoshi Ogawa
Original Assignee
Lasertec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lasertec Corp filed Critical Lasertec Corp
Publication of TW200508583A publication Critical patent/TW200508583A/en
Application granted granted Critical
Publication of TWI262306B publication Critical patent/TWI262306B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects

Abstract

Pattern substrate defect correction method and apparatus capable of stably correcting defects and a pattern substrate manufacturing method are provided. The pattern defect correction apparatus of this invention is one for correcting defects on a patterned substrate, comprising a stage (7) for loading a substrate (6), a short pulse laser light source (1), a beam forming mechanism (2) for forming the short pulse laser light from the short pulse laser light source (1), and an air jet means (13) for making a film (5) to approach the substrate (6). The film (5) and the defect are removed at the same time by irradiating the film (5) with the laser light. A film reel (8) is then moved to make a film 5 having a colored layer (51) to approach the substrate (6) so as to transfer a pattern to the substrate.
TW093108259A 2003-08-20 2004-03-26 Pattern substrate defect correction method and apparatus and pattern substrate manufacturing method TWI262306B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003296113 2003-08-20
JP2003361453A JP3580550B1 (en) 2003-08-20 2003-10-22 Pattern substrate defect correcting method, defect correcting apparatus, and pattern substrate manufacturing method

Publications (2)

Publication Number Publication Date
TW200508583A true TW200508583A (en) 2005-03-01
TWI262306B TWI262306B (en) 2006-09-21

Family

ID=33422230

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093108259A TWI262306B (en) 2003-08-20 2004-03-26 Pattern substrate defect correction method and apparatus and pattern substrate manufacturing method

Country Status (3)

Country Link
JP (1) JP3580550B1 (en)
KR (1) KR100616719B1 (en)
TW (1) TWI262306B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
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US8505389B2 (en) 2009-09-11 2013-08-13 Samsung Display Co., Ltd. Mask defect testing apparatus
CN112197322A (en) * 2020-11-15 2021-01-08 追信数字科技有限公司 Movable range hood filter screen system

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005275013A (en) * 2004-03-25 2005-10-06 Toppan Printing Co Ltd Method and device for repairing color filter
JP4793852B2 (en) * 2005-08-05 2011-10-12 レーザーテック株式会社 Pattern substrate defect correction apparatus, defect correction method, and pattern substrate manufacturing method
WO2007052715A1 (en) * 2005-11-01 2007-05-10 Sharp Kabushiki Kaisha Color filter substrate and production method thereof
JP5228272B2 (en) * 2005-11-15 2013-07-03 大日本印刷株式会社 Correction system
JP4953187B2 (en) * 2005-11-25 2012-06-13 レーザーテック株式会社 Pattern substrate defect correction apparatus, defect correction method, and pattern substrate manufacturing method
JP4706490B2 (en) * 2006-01-30 2011-06-22 凸版印刷株式会社 Color correction method
KR101227137B1 (en) * 2006-03-27 2013-01-28 엘지디스플레이 주식회사 Repairing apparatus for liquid crystal display and repairing method using the same
JP4822914B2 (en) * 2006-04-10 2011-11-24 株式会社ブイ・テクノロジー Defect correction method
KR100770260B1 (en) * 2006-04-14 2007-10-25 삼성에스디아이 주식회사 laser induced thermal imaging apparatus, laser induced thermal imaging method using the apparatus and fabrication method of OLED using the apparatus
TWI431380B (en) * 2006-05-12 2014-03-21 Photon Dynamics Inc Deposition repair apparatus and methods
JP5052049B2 (en) * 2006-06-16 2012-10-17 Ｎｔｎ株式会社 Pattern correction method and pattern correction apparatus
JP4860380B2 (en) * 2006-07-07 2012-01-25 Ｎｔｎ株式会社 Pattern correction method and pattern correction apparatus
TWI444732B (en) * 2006-07-07 2014-07-11 Ntn Toyo Bearing Co Ltd A pattern correction method and a pattern correction device
JP4904168B2 (en) * 2007-01-04 2012-03-28 Ｎｔｎ株式会社 Pattern correction method and pattern correction apparatus
JP4987435B2 (en) * 2006-11-15 2012-07-25 Ｎｔｎ株式会社 Defect correction method and defect correction apparatus
TWI421916B (en) * 2006-09-07 2014-01-01 Ntn Toyo Bearing Co Ltd A pattern correction method and a pattern correction device
JP4925780B2 (en) * 2006-09-29 2012-05-09 Ｎｔｎ株式会社 Pattern correction method and pattern correction apparatus
JP4931124B2 (en) * 2006-10-17 2012-05-16 レーザーテック株式会社 Defect correction apparatus, defect correction method, and pattern substrate manufacturing method
KR100756229B1 (en) * 2006-10-26 2007-09-07 주식회사 탑 엔지니어링 Array tester
KR100839031B1 (en) 2006-11-01 2008-06-17 참앤씨(주) Method for repair of plat display panel
US7977602B2 (en) * 2007-03-21 2011-07-12 Photon Dynamics, Inc. Laser ablation using multiple wavelengths
JP5035794B2 (en) * 2007-05-02 2012-09-26 Ｎｔｎ株式会社 Pattern correction method
JP4993495B2 (en) * 2007-05-15 2012-08-08 Ｎｔｎ株式会社 Pattern correction method and pattern correction apparatus
KR100899391B1 (en) 2007-06-28 2009-05-27 주식회사 하이닉스반도체 Apparatus Local exposure and the method for defect repairing photomask using the same
JP5051643B2 (en) * 2007-10-02 2012-10-17 Ｎｔｎ株式会社 Defect correction method
JP5035799B2 (en) * 2007-10-23 2012-09-26 Ｎｔｎ株式会社 Defect correction method
JP5111206B2 (en) * 2008-04-02 2013-01-09 Ｎｔｎ株式会社 Pattern correction method and pattern parts
JP5182754B2 (en) * 2008-09-08 2013-04-17 Ｎｔｎ株式会社 Pattern forming method and pattern forming apparatus
JP2010085967A (en) * 2008-09-08 2010-04-15 Ntn Corp Pattern correction method and pattern correction device
DE102008059756A1 (en) * 2008-12-01 2010-06-10 Tesa Se Method for marking or marking a workpiece
JP2013105077A (en) * 2011-11-15 2013-05-30 Ntn Corp Defect correction method, defect correction device, and program
JP5382826B2 (en) * 2012-07-13 2014-01-08 レーザーテック株式会社 The present invention relates to a linear drive device, a variable shutter device, a beam shaping device, a beam irradiation device, and a beam shaping device. The present invention relates to a defect correction method and a pattern substrate manufacturing method using the above.
JP6768320B2 (en) * 2015-03-26 2020-10-14 学校法人福岡大学 A film sample fixing device, an X-ray analyzer and method having the same, a film manufacturing device and method using the same, and a film manufactured by the method.
CN114594623B (en) * 2022-04-20 2024-04-12 合肥京东方显示技术有限公司 Repairing device and repairing method for liquid crystal panel

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06324295A (en) * 1993-05-11 1994-11-25 Sharp Corp Device for correcting color filter
JP3381911B2 (en) * 1994-10-31 2003-03-04 Ｎｔｎ株式会社 Defect repair method and defect repair device
JPH10268122A (en) * 1997-03-25 1998-10-09 Ntn Corp Defect correcting method for color filter
JPH11142634A (en) * 1997-11-05 1999-05-28 Alps Electric Co Ltd Production of color filter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8505389B2 (en) 2009-09-11 2013-08-13 Samsung Display Co., Ltd. Mask defect testing apparatus
TWI420235B (en) * 2009-09-11 2013-12-21 Samsung Display Co Ltd Mask defect testing apparatus
CN112197322A (en) * 2020-11-15 2021-01-08 追信数字科技有限公司 Movable range hood filter screen system

Also Published As

Publication number Publication date
JP3580550B1 (en) 2004-10-27
KR100616719B1 (en) 2006-08-28
KR20050020574A (en) 2005-03-04
JP2005095971A (en) 2005-04-14
TWI262306B (en) 2006-09-21

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees