TW200305879A - Conductor structure for a magnetic memory - Google Patents
Conductor structure for a magnetic memory Download PDFInfo
- Publication number
- TW200305879A TW200305879A TW091137056A TW91137056A TW200305879A TW 200305879 A TW200305879 A TW 200305879A TW 091137056 A TW091137056 A TW 091137056A TW 91137056 A TW91137056 A TW 91137056A TW 200305879 A TW200305879 A TW 200305879A
- Authority
- TW
- Taiwan
- Prior art keywords
- conductor
- width
- mentioned
- thickness
- lattice
- Prior art date
Links
- 239000004020 conductor Substances 0.000 title claims abstract description 269
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 138
- 230000005415 magnetization Effects 0.000 claims abstract description 50
- 238000005253 cladding Methods 0.000 claims abstract description 29
- 230000009467 reduction Effects 0.000 claims description 20
- 230000016507 interphase Effects 0.000 claims description 13
- 239000013078 crystal Substances 0.000 claims description 9
- 230000004044 response Effects 0.000 claims description 5
- 230000002195 synergetic effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 96
- 239000000463 material Substances 0.000 description 11
- 230000004888 barrier function Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 239000011247 coating layer Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000002918 waste heat Substances 0.000 description 5
- 238000004891 communication Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000003302 ferromagnetic material Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910001313 Cobalt-iron alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 241000220317 Rosa Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- KGWWEXORQXHJJQ-UHFFFAOYSA-N [Fe].[Co].[Ni] Chemical compound [Fe].[Co].[Ni] KGWWEXORQXHJJQ-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- -1 but not limited to Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 102220047090 rs6152 Human genes 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012549 training Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1653—Address circuits or decoders
- G11C11/1655—Bit-line or column circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
- G11C11/15—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1653—Address circuits or decoders
- G11C11/1657—Word-line or row circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Memories (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Hall/Mr Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/132,998 US6597049B1 (en) | 2002-04-25 | 2002-04-25 | Conductor structure for a magnetic memory |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200305879A true TW200305879A (en) | 2003-11-01 |
Family
ID=22456553
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091137056A TW200305879A (en) | 2002-04-25 | 2002-12-23 | Conductor structure for a magnetic memory |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6597049B1 (enExample) |
| EP (1) | EP1359589A3 (enExample) |
| JP (1) | JP4601913B2 (enExample) |
| KR (1) | KR101010320B1 (enExample) |
| CN (1) | CN1453791A (enExample) |
| TW (1) | TW200305879A (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6891193B1 (en) | 2002-06-28 | 2005-05-10 | Silicon Magnetic Systems | MRAM field-inducing layer configuration |
| US7170706B2 (en) * | 2002-08-29 | 2007-01-30 | Freescale Semiconductor, Inc. | Hard disk system with non-volatile IC based memory for storing data |
| US7006318B2 (en) | 2002-08-29 | 2006-02-28 | Freescale Semiconductor, Inc. | Removable media storage system with memory for storing operational data |
| US7096378B2 (en) * | 2002-08-29 | 2006-08-22 | Freescale Semiconductor, Inc. | Data storage system having a non-volatile IC based memory for storing user data |
| US6924539B2 (en) * | 2002-08-30 | 2005-08-02 | Hewlett-Packard Development Company, L.P. | Magnetic memory cell having an annular data layer and a soft reference layer |
| US6822278B1 (en) * | 2002-09-11 | 2004-11-23 | Silicon Magnetic Systems | Localized field-inducding line and method for making the same |
| JP2004111437A (ja) * | 2002-09-13 | 2004-04-08 | Toshiba Corp | 磁気記憶装置 |
| US7023723B2 (en) * | 2002-11-12 | 2006-04-04 | Nve Corporation | Magnetic memory layers thermal pulse transitions |
| US6740947B1 (en) * | 2002-11-13 | 2004-05-25 | Hewlett-Packard Development Company, L.P. | MRAM with asymmetric cladded conductor |
| JP3906145B2 (ja) * | 2002-11-22 | 2007-04-18 | 株式会社東芝 | 磁気ランダムアクセスメモリ |
| KR100506932B1 (ko) * | 2002-12-10 | 2005-08-09 | 삼성전자주식회사 | 기준 셀들을 갖는 자기 램 소자 및 그 구조체 |
| US6921953B2 (en) * | 2003-04-09 | 2005-07-26 | Micron Technology, Inc. | Self-aligned, low-resistance, efficient MRAM read/write conductors |
| US7264975B1 (en) | 2003-09-25 | 2007-09-04 | Cypress Semiconductor Corp. | Metal profile for increased local magnetic fields in MRAM devices and method for making the same |
| US7071009B2 (en) | 2004-04-01 | 2006-07-04 | Headway Technologies, Inc. | MRAM arrays with reduced bit line resistance and method to make the same |
| US7211874B2 (en) * | 2004-04-06 | 2007-05-01 | Headway Technologies, Inc. | Magnetic random access memory array with free layer locking mechanism |
| JP4492941B2 (ja) * | 2004-06-01 | 2010-06-30 | ルネサスエレクトロニクス株式会社 | 半導体集積回路、半導体集積回路設計方法および半導体集積回路設計システム |
| JP4692805B2 (ja) * | 2004-06-30 | 2011-06-01 | Tdk株式会社 | 磁気検出素子およびその形成方法 |
| US7787289B2 (en) * | 2007-12-03 | 2010-08-31 | Magsil Corporation | MRAM design with local write conductors of reduced cross-sectional area |
| EP2722902B1 (en) * | 2012-10-22 | 2016-11-30 | Crocus Technology S.A. | Self-referenced MRAM element and device having improved magnetic field |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH412010A (de) * | 1963-09-27 | 1966-04-30 | Ibm | Magnetschichtspeicher |
| JPH033255A (ja) * | 1989-05-31 | 1991-01-09 | Toshiba Corp | 半導体集積回路装置 |
| JPH03192759A (ja) * | 1989-12-21 | 1991-08-22 | Fujitsu Ltd | 半導体装置 |
| JPH07263631A (ja) * | 1994-03-17 | 1995-10-13 | Fujitsu Ltd | 半導体集積回路装置の配線構造 |
| US6256222B1 (en) * | 1994-05-02 | 2001-07-03 | Matsushita Electric Industrial Co., Ltd. | Magnetoresistance effect device, and magnetoresistaance effect type head, memory device, and amplifying device using the same |
| US5946228A (en) * | 1998-02-10 | 1999-08-31 | International Business Machines Corporation | Limiting magnetic writing fields to a preferred portion of a changeable magnetic region in magnetic devices |
| JP3891540B2 (ja) * | 1999-10-25 | 2007-03-14 | キヤノン株式会社 | 磁気抵抗効果メモリ、磁気抵抗効果メモリに記録される情報の記録再生方法、およびmram |
| US20020055190A1 (en) * | 2000-01-27 | 2002-05-09 | Anthony Thomas C. | Magnetic memory with structures that prevent disruptions to magnetization in sense layer |
| JP3593652B2 (ja) * | 2000-03-03 | 2004-11-24 | 富士通株式会社 | 磁気ランダムアクセスメモリ装置 |
| US6331944B1 (en) * | 2000-04-13 | 2001-12-18 | International Business Machines Corporation | Magnetic random access memory using a series tunnel element select mechanism |
| US6236590B1 (en) | 2000-07-21 | 2001-05-22 | Hewlett-Packard Company | Optimal write conductors layout for improved performance in MRAM |
| JP4020573B2 (ja) * | 2000-07-27 | 2007-12-12 | 富士通株式会社 | 磁性メモリデバイス、および磁性メモリデバイスにおけるデータ読み出し方法 |
| US6331943B1 (en) * | 2000-08-28 | 2001-12-18 | Motorola, Inc. | MTJ MRAM series-parallel architecture |
| US6504221B1 (en) * | 2001-09-25 | 2003-01-07 | Hewlett-Packard Company | Magneto-resistive device including soft reference layer having embedded conductors |
| US6498747B1 (en) * | 2002-02-08 | 2002-12-24 | Infineon Technologies Ag | Magnetoresistive random access memory (MRAM) cross-point array with reduced parasitic effects |
-
2002
- 2002-04-25 US US10/132,998 patent/US6597049B1/en not_active Expired - Lifetime
- 2002-12-23 TW TW091137056A patent/TW200305879A/zh unknown
-
2003
- 2003-04-22 JP JP2003116650A patent/JP4601913B2/ja not_active Expired - Fee Related
- 2003-04-22 EP EP03252507A patent/EP1359589A3/en not_active Withdrawn
- 2003-04-24 KR KR1020030025986A patent/KR101010320B1/ko not_active Expired - Fee Related
- 2003-04-25 CN CN03122470A patent/CN1453791A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP4601913B2 (ja) | 2010-12-22 |
| CN1453791A (zh) | 2003-11-05 |
| KR101010320B1 (ko) | 2011-01-28 |
| JP2004006833A (ja) | 2004-01-08 |
| KR20030084730A (ko) | 2003-11-01 |
| US6597049B1 (en) | 2003-07-22 |
| EP1359589A2 (en) | 2003-11-05 |
| EP1359589A3 (en) | 2003-12-17 |
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