TW200305794A - Method for determining the concentration of alkaline developer and method for preparing developer - Google Patents

Method for determining the concentration of alkaline developer and method for preparing developer Download PDF

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Publication number
TW200305794A
TW200305794A TW92106924A TW92106924A TW200305794A TW 200305794 A TW200305794 A TW 200305794A TW 92106924 A TW92106924 A TW 92106924A TW 92106924 A TW92106924 A TW 92106924A TW 200305794 A TW200305794 A TW 200305794A
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TW
Taiwan
Prior art keywords
concentration
imaging
solution
liquid
alkaline
Prior art date
Application number
TW92106924A
Other languages
English (en)
Chinese (zh)
Other versions
TWI313794B (enExample
Inventor
Norio Yamaguchi
Michio Igarashi
Takeshi Inoue
Original Assignee
Matsushita Environmental & Air Conditioning Engineering Co Ltd
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Filing date
Publication date
Application filed by Matsushita Environmental & Air Conditioning Engineering Co Ltd filed Critical Matsushita Environmental & Air Conditioning Engineering Co Ltd
Publication of TW200305794A publication Critical patent/TW200305794A/zh
Application granted granted Critical
Publication of TWI313794B publication Critical patent/TWI313794B/zh

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3504Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/16Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
    • G01N31/162Determining the equivalent point by means of a discontinuity
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/16Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
    • G01N31/162Determining the equivalent point by means of a discontinuity
    • G01N31/164Determining the equivalent point by means of a discontinuity by electrical or electrochemical means

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  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW92106924A 2002-03-29 2003-03-27 Method for determining the concentration of alkaline developer and method for preparing developer TW200305794A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002097479A JP4097973B2 (ja) 2002-03-29 2002-03-29 アルカリ現像液の濃度測定方法

Publications (2)

Publication Number Publication Date
TW200305794A true TW200305794A (en) 2003-11-01
TWI313794B TWI313794B (enExample) 2009-08-21

Family

ID=29239963

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92106924A TW200305794A (en) 2002-03-29 2003-03-27 Method for determining the concentration of alkaline developer and method for preparing developer

Country Status (3)

Country Link
JP (1) JP4097973B2 (enExample)
KR (1) KR100916986B1 (enExample)
TW (1) TW200305794A (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4097973B2 (ja) * 2002-03-29 2008-06-11 松下環境空調エンジニアリング株式会社 アルカリ現像液の濃度測定方法
JP4366490B2 (ja) * 2003-08-22 2009-11-18 長瀬産業株式会社 現像液供給方法及び装置
JP2006189646A (ja) * 2005-01-06 2006-07-20 Nagase & Co Ltd レジスト現像液中の炭酸塩の除去方法、除去装置、及びレジスト現像液の濃度管理方法
JP5000246B2 (ja) * 2005-09-28 2012-08-15 株式会社半導体エネルギー研究所 排液処理方法及び処理装置
JP6721157B2 (ja) * 2015-07-22 2020-07-08 株式会社平間理化研究所 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置
JP6551784B2 (ja) * 2015-08-31 2019-07-31 パナソニックIpマネジメント株式会社 レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置
JP6551787B2 (ja) * 2015-09-28 2019-07-31 パナソニックIpマネジメント株式会社 レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置
CN106596840B (zh) * 2016-12-15 2019-01-22 深圳市华星光电技术有限公司 显影液碱液浓度测量方法及调节方法
JP2018120893A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の成分濃度測定装置、及び現像液管理装置
JP2018120900A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液管理装置
JP2018120895A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
JP2018120901A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
JP6624762B2 (ja) * 2019-01-30 2019-12-25 株式会社平間理化研究所 現像液の管理方法及び装置
CN120594741B (zh) * 2025-08-06 2025-10-10 信联电子材料科技股份有限公司 一种tmah显影液碳酸检测方法、装置及系统

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05142781A (ja) * 1991-11-19 1993-06-11 Konica Corp 感光材料の現像廃液の処理方法及び該処理方法に用いる自動現像機
JP2001154373A (ja) * 1999-11-26 2001-06-08 Fuji Photo Film Co Ltd 感光性平版印刷版の処理方法
JP4097973B2 (ja) * 2002-03-29 2008-06-11 松下環境空調エンジニアリング株式会社 アルカリ現像液の濃度測定方法

Also Published As

Publication number Publication date
JP2003295470A (ja) 2003-10-15
TWI313794B (enExample) 2009-08-21
KR20030078694A (ko) 2003-10-08
KR100916986B1 (ko) 2009-09-14
JP4097973B2 (ja) 2008-06-11

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