KR100916986B1 - 알카리 현상액의 농도측정방법 및 현상액 조제방법 - Google Patents
알카리 현상액의 농도측정방법 및 현상액 조제방법 Download PDFInfo
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- KR100916986B1 KR100916986B1 KR20030018961A KR20030018961A KR100916986B1 KR 100916986 B1 KR100916986 B1 KR 100916986B1 KR 20030018961 A KR20030018961 A KR 20030018961A KR 20030018961 A KR20030018961 A KR 20030018961A KR 100916986 B1 KR100916986 B1 KR 100916986B1
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- alkali
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- 239000003513 alkali Substances 0.000 title claims abstract description 101
- 238000000034 method Methods 0.000 title claims abstract description 51
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 46
- 150000005323 carbonate salts Chemical class 0.000 claims description 25
- 239000001569 carbon dioxide Substances 0.000 claims description 23
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 23
- 238000005259 measurement Methods 0.000 claims description 22
- 238000004448 titration Methods 0.000 claims description 17
- 125000005588 carbonic acid salt group Chemical group 0.000 claims description 12
- 238000006386 neutralization reaction Methods 0.000 claims description 12
- 239000000243 solution Substances 0.000 description 33
- 229960004424 carbon dioxide Drugs 0.000 description 21
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 238000011069 regeneration method Methods 0.000 description 10
- -1 hydroxide ions Chemical class 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 230000008929 regeneration Effects 0.000 description 9
- 239000002699 waste material Substances 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- 238000011084 recovery Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000010790 dilution Methods 0.000 description 4
- 239000012895 dilution Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 238000007726 management method Methods 0.000 description 3
- 238000003918 potentiometric titration Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052806 inorganic carbonate Inorganic materials 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000001172 regenerating effect Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000012086 standard solution Substances 0.000 description 2
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 125000005210 alkyl ammonium group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- RKTGAWJWCNLSFX-UHFFFAOYSA-M bis(2-hydroxyethyl)-dimethylazanium;hydroxide Chemical compound [OH-].OCC[N+](C)(C)CCO RKTGAWJWCNLSFX-UHFFFAOYSA-M 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- JQDCIBMGKCMHQV-UHFFFAOYSA-M diethyl(dimethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)CC JQDCIBMGKCMHQV-UHFFFAOYSA-M 0.000 description 1
- MYRLVAHFNOAIAI-UHFFFAOYSA-M diethyl-bis(2-hydroxyethyl)azanium;hydroxide Chemical compound [OH-].OCC[N+](CC)(CC)CCO MYRLVAHFNOAIAI-UHFFFAOYSA-M 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000003113 dilution method Methods 0.000 description 1
- KVFVBPYVNUCWJX-UHFFFAOYSA-M ethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)C KVFVBPYVNUCWJX-UHFFFAOYSA-M 0.000 description 1
- KGVNNTSVYGJCRV-UHFFFAOYSA-M ethyl-tris(2-hydroxyethyl)azanium;hydroxide Chemical compound [OH-].OCC[N+](CC)(CCO)CCO KGVNNTSVYGJCRV-UHFFFAOYSA-M 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- VHLDQAOFSQCOFS-UHFFFAOYSA-M tetrakis(2-hydroxyethyl)azanium;hydroxide Chemical compound [OH-].OCC[N+](CCO)(CCO)CCO VHLDQAOFSQCOFS-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- GRNRCQKEBXQLAA-UHFFFAOYSA-M triethyl(2-hydroxyethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CCO GRNRCQKEBXQLAA-UHFFFAOYSA-M 0.000 description 1
- JAJRRCSBKZOLPA-UHFFFAOYSA-M triethyl(methyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(CC)CC JAJRRCSBKZOLPA-UHFFFAOYSA-M 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
- G01N31/162—Determining the equivalent point by means of a discontinuity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
- G01N31/162—Determining the equivalent point by means of a discontinuity
- G01N31/164—Determining the equivalent point by means of a discontinuity by electrical or electrochemical means
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Molecular Biology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
방치시간 | 중화적정법 | 본법 | |
TMAHwt% | 탄산염wt% | 탄산염wt% | |
0 | 2.379 | 0.013 | 0.003 |
30분 | 2.379 | 0.019 | 0.014 |
Claims (12)
- 삭제
- 알카리 현상성분을 함유하는 현상액의 농도측정방법으로서,현상액중의 모든 알카리 현상성분의 농도를 측정하는 공정; 및현상액중의 탄산계 염류의 농도를 측정하는 공정을 포함하고,상기 모든 알카리 현상성분의 농도로부터 탄산계 염류의 농도를 뺌으로써 현상액중의 유리알카리 현상성분 농도를 구하는 것을 특징으로 하는 알카리 현상액의 농도측정방법.
- 제2항에 있어서, 상기 모든 알카리 현상성분 농도를 측정하는 공정이, 중화적정수단, 전위차 적정수단, 도전율 측정수단, 위상차 측정수단 및 초음파 전파속도 측정수단으로 이루어지는 군에서 선택되는 수단을 사용하여 행해지는 것을 특징으로 하는 알카리 현상액의 농도측정방법.
- 제2항 또는 제3항에 있어서, 상기 탄산계 염류 농도를 측정하는 공정이, 이산화탄소 측정수단을 사용하여 행해지는 것을 특징으로 하는 알카리 현상액의 농도측정방법.
- 제4항에 있어서, 상기 이산화탄소 측정수단은 적외선 탄산가스 검출수단을 포함하는 것을 특징으로 하는 알카리 현상액의 농도측정방법.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2002-00097479 | 2002-03-29 | ||
JP2002097479A JP4097973B2 (ja) | 2002-03-29 | 2002-03-29 | アルカリ現像液の濃度測定方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030078694A KR20030078694A (ko) | 2003-10-08 |
KR100916986B1 true KR100916986B1 (ko) | 2009-09-14 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR20030018961A KR100916986B1 (ko) | 2002-03-29 | 2003-03-26 | 알카리 현상액의 농도측정방법 및 현상액 조제방법 |
Country Status (3)
Country | Link |
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JP (1) | JP4097973B2 (ko) |
KR (1) | KR100916986B1 (ko) |
TW (1) | TW200305794A (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4097973B2 (ja) * | 2002-03-29 | 2008-06-11 | 松下環境空調エンジニアリング株式会社 | アルカリ現像液の濃度測定方法 |
JP4366490B2 (ja) * | 2003-08-22 | 2009-11-18 | 長瀬産業株式会社 | 現像液供給方法及び装置 |
JP2006189646A (ja) * | 2005-01-06 | 2006-07-20 | Nagase & Co Ltd | レジスト現像液中の炭酸塩の除去方法、除去装置、及びレジスト現像液の濃度管理方法 |
JP5000246B2 (ja) * | 2005-09-28 | 2012-08-15 | 株式会社半導体エネルギー研究所 | 排液処理方法及び処理装置 |
JP6721157B2 (ja) * | 2015-07-22 | 2020-07-08 | 株式会社平間理化研究所 | 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置 |
JP6551784B2 (ja) * | 2015-08-31 | 2019-07-31 | パナソニックIpマネジメント株式会社 | レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置 |
JP6551787B2 (ja) * | 2015-09-28 | 2019-07-31 | パナソニックIpマネジメント株式会社 | レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置 |
CN106596840B (zh) * | 2016-12-15 | 2019-01-22 | 深圳市华星光电技术有限公司 | 显影液碱液浓度测量方法及调节方法 |
JP2018120901A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
JP2018120893A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液の成分濃度測定装置、及び現像液管理装置 |
JP2018120895A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
JP2018120900A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液管理装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05142781A (ja) * | 1991-11-19 | 1993-06-11 | Konica Corp | 感光材料の現像廃液の処理方法及び該処理方法に用いる自動現像機 |
JP2001154373A (ja) * | 1999-11-26 | 2001-06-08 | Fuji Photo Film Co Ltd | 感光性平版印刷版の処理方法 |
JP4097973B2 (ja) * | 2002-03-29 | 2008-06-11 | 松下環境空調エンジニアリング株式会社 | アルカリ現像液の濃度測定方法 |
-
2002
- 2002-03-29 JP JP2002097479A patent/JP4097973B2/ja not_active Expired - Fee Related
-
2003
- 2003-03-26 KR KR20030018961A patent/KR100916986B1/ko not_active IP Right Cessation
- 2003-03-27 TW TW92106924A patent/TW200305794A/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05142781A (ja) * | 1991-11-19 | 1993-06-11 | Konica Corp | 感光材料の現像廃液の処理方法及び該処理方法に用いる自動現像機 |
JP2001154373A (ja) * | 1999-11-26 | 2001-06-08 | Fuji Photo Film Co Ltd | 感光性平版印刷版の処理方法 |
JP4097973B2 (ja) * | 2002-03-29 | 2008-06-11 | 松下環境空調エンジニアリング株式会社 | アルカリ現像液の濃度測定方法 |
Also Published As
Publication number | Publication date |
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JP4097973B2 (ja) | 2008-06-11 |
TW200305794A (en) | 2003-11-01 |
TWI313794B (ko) | 2009-08-21 |
KR20030078694A (ko) | 2003-10-08 |
JP2003295470A (ja) | 2003-10-15 |
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