KR100916986B1 - 알카리 현상액의 농도측정방법 및 현상액 조제방법 - Google Patents
알카리 현상액의 농도측정방법 및 현상액 조제방법 Download PDFInfo
- Publication number
- KR100916986B1 KR100916986B1 KR20030018961A KR20030018961A KR100916986B1 KR 100916986 B1 KR100916986 B1 KR 100916986B1 KR 20030018961 A KR20030018961 A KR 20030018961A KR 20030018961 A KR20030018961 A KR 20030018961A KR 100916986 B1 KR100916986 B1 KR 100916986B1
- Authority
- KR
- South Korea
- Prior art keywords
- concentration
- developer
- measuring
- developing
- alkali
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
- G01N31/162—Determining the equivalent point by means of a discontinuity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
- G01N31/162—Determining the equivalent point by means of a discontinuity
- G01N31/164—Determining the equivalent point by means of a discontinuity by electrical or electrochemical means
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002097479A JP4097973B2 (ja) | 2002-03-29 | 2002-03-29 | アルカリ現像液の濃度測定方法 |
| JPJP-P-2002-00097479 | 2002-03-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20030078694A KR20030078694A (ko) | 2003-10-08 |
| KR100916986B1 true KR100916986B1 (ko) | 2009-09-14 |
Family
ID=29239963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR20030018961A Expired - Fee Related KR100916986B1 (ko) | 2002-03-29 | 2003-03-26 | 알카리 현상액의 농도측정방법 및 현상액 조제방법 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4097973B2 (enExample) |
| KR (1) | KR100916986B1 (enExample) |
| TW (1) | TW200305794A (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4097973B2 (ja) * | 2002-03-29 | 2008-06-11 | 松下環境空調エンジニアリング株式会社 | アルカリ現像液の濃度測定方法 |
| JP4366490B2 (ja) * | 2003-08-22 | 2009-11-18 | 長瀬産業株式会社 | 現像液供給方法及び装置 |
| JP2006189646A (ja) * | 2005-01-06 | 2006-07-20 | Nagase & Co Ltd | レジスト現像液中の炭酸塩の除去方法、除去装置、及びレジスト現像液の濃度管理方法 |
| JP5000246B2 (ja) * | 2005-09-28 | 2012-08-15 | 株式会社半導体エネルギー研究所 | 排液処理方法及び処理装置 |
| JP6721157B2 (ja) * | 2015-07-22 | 2020-07-08 | 株式会社平間理化研究所 | 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置 |
| JP6551784B2 (ja) * | 2015-08-31 | 2019-07-31 | パナソニックIpマネジメント株式会社 | レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置 |
| JP6551787B2 (ja) * | 2015-09-28 | 2019-07-31 | パナソニックIpマネジメント株式会社 | レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置 |
| CN106596840B (zh) * | 2016-12-15 | 2019-01-22 | 深圳市华星光电技术有限公司 | 显影液碱液浓度测量方法及调节方法 |
| JP2018120893A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液の成分濃度測定装置、及び現像液管理装置 |
| JP2018120900A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液管理装置 |
| JP2018120895A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
| JP2018120901A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
| JP6624762B2 (ja) * | 2019-01-30 | 2019-12-25 | 株式会社平間理化研究所 | 現像液の管理方法及び装置 |
| CN120594741B (zh) * | 2025-08-06 | 2025-10-10 | 信联电子材料科技股份有限公司 | 一种tmah显影液碳酸检测方法、装置及系统 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05142781A (ja) * | 1991-11-19 | 1993-06-11 | Konica Corp | 感光材料の現像廃液の処理方法及び該処理方法に用いる自動現像機 |
| JP2001154373A (ja) * | 1999-11-26 | 2001-06-08 | Fuji Photo Film Co Ltd | 感光性平版印刷版の処理方法 |
| JP4097973B2 (ja) * | 2002-03-29 | 2008-06-11 | 松下環境空調エンジニアリング株式会社 | アルカリ現像液の濃度測定方法 |
-
2002
- 2002-03-29 JP JP2002097479A patent/JP4097973B2/ja not_active Expired - Fee Related
-
2003
- 2003-03-26 KR KR20030018961A patent/KR100916986B1/ko not_active Expired - Fee Related
- 2003-03-27 TW TW92106924A patent/TW200305794A/zh not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05142781A (ja) * | 1991-11-19 | 1993-06-11 | Konica Corp | 感光材料の現像廃液の処理方法及び該処理方法に用いる自動現像機 |
| JP2001154373A (ja) * | 1999-11-26 | 2001-06-08 | Fuji Photo Film Co Ltd | 感光性平版印刷版の処理方法 |
| JP4097973B2 (ja) * | 2002-03-29 | 2008-06-11 | 松下環境空調エンジニアリング株式会社 | アルカリ現像液の濃度測定方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200305794A (en) | 2003-11-01 |
| JP2003295470A (ja) | 2003-10-15 |
| TWI313794B (enExample) | 2009-08-21 |
| KR20030078694A (ko) | 2003-10-08 |
| JP4097973B2 (ja) | 2008-06-11 |
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