TWI313794B - - Google Patents
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- Publication number
- TWI313794B TWI313794B TW92106924A TW92106924A TWI313794B TW I313794 B TWI313794 B TW I313794B TW 92106924 A TW92106924 A TW 92106924A TW 92106924 A TW92106924 A TW 92106924A TW I313794 B TWI313794 B TW I313794B
- Authority
- TW
- Taiwan
- Prior art keywords
- concentration
- developing
- imaging
- measuring
- alkaline
- Prior art date
Links
- 238000003384 imaging method Methods 0.000 claims description 79
- 238000000034 method Methods 0.000 claims description 41
- 239000007788 liquid Substances 0.000 claims description 39
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 32
- 238000004448 titration Methods 0.000 claims description 21
- 125000005588 carbonic acid salt group Chemical group 0.000 claims description 19
- 239000001569 carbon dioxide Substances 0.000 claims description 16
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 16
- 239000002699 waste material Substances 0.000 claims description 8
- 238000006386 neutralization reaction Methods 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 3
- 238000003918 potentiometric titration Methods 0.000 claims description 3
- 239000012458 free base Substances 0.000 claims description 2
- 230000001568 sexual effect Effects 0.000 claims description 2
- 230000001172 regenerating effect Effects 0.000 claims 1
- 239000004576 sand Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 description 38
- 229960004424 carbon dioxide Drugs 0.000 description 16
- 150000003839 salts Chemical class 0.000 description 16
- 238000005259 measurement Methods 0.000 description 14
- 238000012360 testing method Methods 0.000 description 14
- 239000002253 acid Substances 0.000 description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- 229910052799 carbon Inorganic materials 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 8
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 6
- 238000011084 recovery Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 239000003513 alkali Substances 0.000 description 4
- 238000010790 dilution Methods 0.000 description 4
- 239000012895 dilution Substances 0.000 description 4
- 238000007726 management method Methods 0.000 description 4
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 235000013399 edible fruits Nutrition 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000005323 carbonate salts Chemical class 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000002059 diagnostic imaging Methods 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000012086 standard solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910021653 sulphate ion Inorganic materials 0.000 description 2
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 206010003645 Atopy Diseases 0.000 description 1
- -1 Hydroxyl ions Chemical class 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- OAUXSBFJNWOKFV-UHFFFAOYSA-N [C].OS(O)(=O)=O Chemical compound [C].OS(O)(=O)=O OAUXSBFJNWOKFV-UHFFFAOYSA-N 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000003708 ampul Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001767 cationic compounds Chemical class 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052806 inorganic carbonate Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000010808 liquid waste Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000012085 test solution Substances 0.000 description 1
- HLZKNKRTKFSKGZ-UHFFFAOYSA-N tetradecan-1-ol Chemical compound CCCCCCCCCCCCCCO HLZKNKRTKFSKGZ-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
- G01N31/162—Determining the equivalent point by means of a discontinuity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
- G01N31/162—Determining the equivalent point by means of a discontinuity
- G01N31/164—Determining the equivalent point by means of a discontinuity by electrical or electrochemical means
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002097479A JP4097973B2 (ja) | 2002-03-29 | 2002-03-29 | アルカリ現像液の濃度測定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200305794A TW200305794A (en) | 2003-11-01 |
| TWI313794B true TWI313794B (enExample) | 2009-08-21 |
Family
ID=29239963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW92106924A TW200305794A (en) | 2002-03-29 | 2003-03-27 | Method for determining the concentration of alkaline developer and method for preparing developer |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4097973B2 (enExample) |
| KR (1) | KR100916986B1 (enExample) |
| TW (1) | TW200305794A (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4097973B2 (ja) * | 2002-03-29 | 2008-06-11 | 松下環境空調エンジニアリング株式会社 | アルカリ現像液の濃度測定方法 |
| JP4366490B2 (ja) * | 2003-08-22 | 2009-11-18 | 長瀬産業株式会社 | 現像液供給方法及び装置 |
| JP2006189646A (ja) * | 2005-01-06 | 2006-07-20 | Nagase & Co Ltd | レジスト現像液中の炭酸塩の除去方法、除去装置、及びレジスト現像液の濃度管理方法 |
| JP5000246B2 (ja) * | 2005-09-28 | 2012-08-15 | 株式会社半導体エネルギー研究所 | 排液処理方法及び処理装置 |
| JP6721157B2 (ja) * | 2015-07-22 | 2020-07-08 | 株式会社平間理化研究所 | 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置 |
| JP6551784B2 (ja) * | 2015-08-31 | 2019-07-31 | パナソニックＩｐマネジメント株式会社 | レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置 |
| JP6551787B2 (ja) * | 2015-09-28 | 2019-07-31 | パナソニックＩｐマネジメント株式会社 | レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置 |
| CN106596840B (zh) * | 2016-12-15 | 2019-01-22 | 深圳市华星光电技术有限公司 | 显影液碱液浓度测量方法及调节方法 |
| JP2018120901A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
| JP2018120893A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液の成分濃度測定装置、及び現像液管理装置 |
| JP2018120900A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液管理装置 |
| JP2018120895A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
| JP6624762B2 (ja) * | 2019-01-30 | 2019-12-25 | 株式会社平間理化研究所 | 現像液の管理方法及び装置 |
| CN120594741B (zh) * | 2025-08-06 | 2025-10-10 | 信联电子材料科技股份有限公司 | 一种tmah显影液碳酸检测方法、装置及系统 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05142781A (ja) * | 1991-11-19 | 1993-06-11 | Konica Corp | 感光材料の現像廃液の処理方法及び該処理方法に用いる自動現像機 |
| JP2001154373A (ja) * | 1999-11-26 | 2001-06-08 | Fuji Photo Film Co Ltd | 感光性平版印刷版の処理方法 |
| JP4097973B2 (ja) * | 2002-03-29 | 2008-06-11 | 松下環境空調エンジニアリング株式会社 | アルカリ現像液の濃度測定方法 |
-
2002
- 2002-03-29 JP JP2002097479A patent/JP4097973B2/ja not_active Expired - Fee Related
-
2003
- 2003-03-26 KR KR20030018961A patent/KR100916986B1/ko not_active Expired - Fee Related
- 2003-03-27 TW TW92106924A patent/TW200305794A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP4097973B2 (ja) | 2008-06-11 |
| KR100916986B1 (ko) | 2009-09-14 |
| TW200305794A (en) | 2003-11-01 |
| JP2003295470A (ja) | 2003-10-15 |
| KR20030078694A (ko) | 2003-10-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |