TW200304455A - Polyether and its production method - Google Patents

Polyether and its production method Download PDF

Info

Publication number
TW200304455A
TW200304455A TW092104429A TW92104429A TW200304455A TW 200304455 A TW200304455 A TW 200304455A TW 092104429 A TW092104429 A TW 092104429A TW 92104429 A TW92104429 A TW 92104429A TW 200304455 A TW200304455 A TW 200304455A
Authority
TW
Taiwan
Prior art keywords
substituted
carbons
group
groups
polyether
Prior art date
Application number
TW092104429A
Other languages
English (en)
Chinese (zh)
Inventor
Akira Yokota
Original Assignee
Sumijomo Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumijomo Chem Co Ltd filed Critical Sumijomo Chem Co Ltd
Publication of TW200304455A publication Critical patent/TW200304455A/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/38Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
    • C08G65/40Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/38Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
    • C08G65/40Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
    • C08G65/4006(I) or (II) containing elements other than carbon, oxygen, hydrogen or halogen as leaving group (X)
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/28Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
    • C08G2650/60Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing acetylenic group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polyethers (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
TW092104429A 2002-03-15 2003-03-03 Polyether and its production method TW200304455A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002071631A JP2003268101A (ja) 2002-03-15 2002-03-15 ポリエーテル樹脂及びその製造方法

Publications (1)

Publication Number Publication Date
TW200304455A true TW200304455A (en) 2003-10-01

Family

ID=28449065

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092104429A TW200304455A (en) 2002-03-15 2003-03-03 Polyether and its production method

Country Status (4)

Country Link
US (1) US6815523B2 (ja)
JP (1) JP2003268101A (ja)
KR (1) KR20030074391A (ja)
TW (1) TW200304455A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103946271A (zh) * 2012-02-09 2014-07-23 日产化学工业株式会社 包含具有碳碳多重键的树脂的钝化膜形成用组合物

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4576952B2 (ja) * 2003-09-25 2010-11-10 住友化学株式会社 ポリアリーレンオキサイドおよびその製造方法
US20090159699A1 (en) 2007-12-24 2009-06-25 Dynamics Inc. Payment cards and devices operable to receive point-of-sale actions before point-of-sale and forward actions at point-of-sale

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6423811B1 (en) 2000-07-19 2002-07-23 Honeywell International Inc. Low dielectric constant materials with polymeric networks
JP5011600B2 (ja) 2000-09-13 2012-08-29 住友化学株式会社 ポリエーテル樹脂、その製造方法および絶縁材料

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103946271A (zh) * 2012-02-09 2014-07-23 日产化学工业株式会社 包含具有碳碳多重键的树脂的钝化膜形成用组合物

Also Published As

Publication number Publication date
JP2003268101A (ja) 2003-09-25
US6815523B2 (en) 2004-11-09
US20030187177A1 (en) 2003-10-02
KR20030074391A (ko) 2003-09-19

Similar Documents

Publication Publication Date Title
TWI402282B (zh) 聚合物、包括該聚合物之薄膜形成組成物、用該組成物形成之絕緣膜及電子裝置
JP2006233128A (ja) カゴ構造を有する重合体、それを含む膜形成用組成物、絶縁膜および電子デバイス
JP2007311732A (ja) 低誘電材料
JP2005041938A (ja) 有機絶縁膜形成用組成物
JP4734055B2 (ja) アセチレン性三重結合を有するモノマーの重合体、これを用いる膜形成用組成物、絶縁膜および電子デバイス
JP4935196B2 (ja) ベンゾオキサゾール前駆体、樹脂組成物およびそれを用いたコーティングワニス、樹脂膜並びに半導体装置
JP2002356551A (ja) 新規ポリアリーレンエーテル、その製造方法及びその用途
TW200304455A (en) Polyether and its production method
JP2003041184A (ja) 耐熱性ポリエーテル、熱硬化性ポリエーテル、およびポリエーテル膜形成用塗布液。
JP4935195B2 (ja) ベンゾオキサゾール前駆体、樹脂組成物およびそれを用いたコーティングワニス、樹脂膜並びに半導体装置
TWI665231B (zh) 聚伸芳基樹脂
JP2006241239A (ja) 重合体の製造法、膜形成用組成物、絶縁膜および電子デバイス
JP6606063B2 (ja) 芳香族ポリエーテルケトンとその製造方法
JP2001019724A (ja) 膜形成用組成物、電子材料、膜の形成方法及び膜
JPWO2004083278A1 (ja) 芳香環系重合体及び低誘電材料
JP2005272352A (ja) 環状アミノフェノール化合物、環状熱硬化性樹脂、その製造法、絶縁膜用材料、絶縁膜用コーティングワニス、及び、これらを用いた絶縁膜並びに半導体装置
JP2012033700A (ja) 絶縁膜およびその製造方法
JP2007211138A (ja) 脂環式ポリエーテル、その製造方法及びその用途
JP5011600B2 (ja) ポリエーテル樹脂、その製造方法および絶縁材料
TW200823229A (en) Insulating film formation process
JPWO2005092946A1 (ja) ナフチレン系重合体及びその合成方法、並びにその用途
JP2006249255A (ja) 膜形成用組成物、それを用いた絶縁膜および電子デバイス
JP2004217677A (ja) 低誘電率ポリマー
TW200303323A (en) Coating solution for forming insulating film
JP2007005394A (ja) 絶縁膜の製造方法