SG192259A1 - Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium - Google Patents
Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium Download PDFInfo
- Publication number
- SG192259A1 SG192259A1 SG2013058649A SG2013058649A SG192259A1 SG 192259 A1 SG192259 A1 SG 192259A1 SG 2013058649 A SG2013058649 A SG 2013058649A SG 2013058649 A SG2013058649 A SG 2013058649A SG 192259 A1 SG192259 A1 SG 192259A1
- Authority
- SG
- Singapore
- Prior art keywords
- group
- alloy
- magnetic recording
- elements selected
- elements
- Prior art date
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 14
- 239000013077 target material Substances 0.000 title claims description 25
- 238000005477 sputtering target Methods 0.000 title claims description 16
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 28
- 239000000956 alloy Substances 0.000 claims abstract description 28
- 229910052742 iron Inorganic materials 0.000 claims abstract description 10
- 229910052802 copper Inorganic materials 0.000 claims abstract description 9
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 8
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 8
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 8
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 8
- 239000012535 impurity Substances 0.000 claims abstract description 7
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 7
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 7
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 7
- 229910052796 boron Inorganic materials 0.000 claims abstract description 6
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 6
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 6
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 5
- 230000007797 corrosion Effects 0.000 abstract description 27
- 238000005260 corrosion Methods 0.000 abstract description 27
- 229910001203 Alloy 20 Inorganic materials 0.000 abstract 1
- 230000004907 flux Effects 0.000 description 27
- 239000010408 film Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 239000000523 sample Substances 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 7
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 125000001475 halogen functional group Chemical group 0.000 description 5
- 238000001755 magnetron sputter deposition Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000010079 rubber tapping Methods 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910020674 Co—B Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011436 cob Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 240000000662 Anethum graveolens Species 0.000 description 1
- 241001233887 Ania Species 0.000 description 1
- 241000283690 Bos taurus Species 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000006066 Comins reaction Methods 0.000 description 1
- 229910002483 Cu Ka Inorganic materials 0.000 description 1
- 241000022587 Erebus Species 0.000 description 1
- 240000004770 Eucalyptus longicornis Species 0.000 description 1
- 240000003550 Eusideroxylon zwageri Species 0.000 description 1
- 101000993059 Homo sapiens Hereditary hemochromatosis protein Proteins 0.000 description 1
- 101000848647 Homo sapiens Telomerase RNA component interacting RNase Proteins 0.000 description 1
- 241000252067 Megalops atlanticus Species 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 241000206607 Porphyra umbilicalis Species 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 206010051379 Systemic Inflammatory Response Syndrome Diseases 0.000 description 1
- 102100034592 Telomerase RNA component interacting RNase Human genes 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000003902 lesion Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/02—Amorphous alloys with iron as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011030562A JP5698023B2 (ja) | 2011-02-16 | 2011-02-16 | 磁気記録用軟磁性合金及びスパッタリングターゲット材ならびに磁気記録媒体 |
| PCT/JP2012/053164 WO2012111568A1 (ja) | 2011-02-16 | 2012-02-10 | 磁気記録用軟磁性合金、スパッタリングターゲット材及び磁気記録媒体 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG192259A1 true SG192259A1 (en) | 2013-09-30 |
Family
ID=46672492
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201508695WA SG10201508695WA (en) | 2011-02-16 | 2012-02-10 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
| SG2013058649A SG192259A1 (en) | 2011-02-16 | 2012-02-10 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201508695WA SG10201508695WA (en) | 2011-02-16 | 2012-02-10 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5698023B2 (zh) |
| MY (1) | MY181980A (zh) |
| SG (2) | SG10201508695WA (zh) |
| TW (1) | TWI508114B (zh) |
| WO (1) | WO2012111568A1 (zh) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013183546A1 (ja) * | 2012-06-06 | 2013-12-12 | 日立金属株式会社 | Ｆｅ－Ｃｏ系合金スパッタリングターゲット材およびその製造方法 |
| JP6116928B2 (ja) * | 2013-02-18 | 2017-04-19 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅ系合金およびスパッタリングターゲット材 |
| US9548073B1 (en) * | 2013-03-13 | 2017-01-17 | WD Media, LLC | Systems and methods for providing high performance soft magnetic underlayers for magnetic recording media |
| JP6405261B2 (ja) * | 2014-05-01 | 2018-10-17 | 山陽特殊製鋼株式会社 | 磁気記録用軟磁性合金及びスパッタリングターゲット材並びに磁気記録媒体 |
| SG11201606737UA (en) * | 2014-09-04 | 2016-09-29 | Jx Nippon Mining & Metals Corp | Sputtering target |
| WO2016157922A1 (ja) * | 2015-03-27 | 2016-10-06 | 日立金属株式会社 | 軟磁性膜および軟磁性膜形成用スパッタリングターゲット |
| JP6442460B2 (ja) * | 2016-10-27 | 2018-12-19 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅ系合金およびスパッタリングターゲット材 |
| JPWO2021039710A1 (zh) * | 2019-08-26 | 2021-03-04 | ||
| TWI798580B (zh) * | 2019-08-26 | 2023-04-11 | 日商日立金屬股份有限公司 | Fe-Si-B-Nb系靶材 |
| WO2021039711A1 (ja) * | 2019-08-26 | 2021-03-04 | 日立金属株式会社 | Ｆｅ－Ｃｏ－Ｓｉ－Ｂ－Ｎｂ系ターゲット |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008123602A (ja) * | 2006-11-10 | 2008-05-29 | Hitachi Global Storage Technologies Netherlands Bv | 垂直磁気記録媒体 |
| JP2008135137A (ja) * | 2006-11-29 | 2008-06-12 | Fujitsu Ltd | 磁気記録媒体、磁気記録媒体の製造方法及び磁気記録装置 |
| JP5443065B2 (ja) * | 2009-06-09 | 2014-03-19 | エイチジーエスティーネザーランドビーブイ | 垂直磁気記録媒体 |
| JP5425530B2 (ja) * | 2009-06-10 | 2014-02-26 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅＮｉ系合金およびスパッタリングターゲット材 |
-
2011
- 2011-02-16 JP JP2011030562A patent/JP5698023B2/ja active Active
-
2012
- 2012-02-10 WO PCT/JP2012/053164 patent/WO2012111568A1/ja active Application Filing
- 2012-02-10 SG SG10201508695WA patent/SG10201508695WA/en unknown
- 2012-02-10 SG SG2013058649A patent/SG192259A1/en unknown
- 2012-02-10 MY MYPI2017000858A patent/MY181980A/en unknown
- 2012-02-16 TW TW101105106A patent/TWI508114B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI508114B (zh) | 2015-11-11 |
| JP5698023B2 (ja) | 2015-04-08 |
| TW201239922A (en) | 2012-10-01 |
| SG10201508695WA (en) | 2015-11-27 |
| CN103380458A (zh) | 2013-10-30 |
| JP2012169021A (ja) | 2012-09-06 |
| MY181980A (en) | 2021-01-18 |
| WO2012111568A1 (ja) | 2012-08-23 |
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