SG148963A1 - Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product - Google Patents

Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product

Info

Publication number
SG148963A1
SG148963A1 SG200804731-8A SG2008047318A SG148963A1 SG 148963 A1 SG148963 A1 SG 148963A1 SG 2008047318 A SG2008047318 A SG 2008047318A SG 148963 A1 SG148963 A1 SG 148963A1
Authority
SG
Singapore
Prior art keywords
support structure
control system
controlling
computer program
program product
Prior art date
Application number
SG200804731-8A
Other languages
English (en)
Inventor
Erik Roelof Loopstra
Der Pasch Engelbertus Antonius Franciscus Van
Der Wijst Marc Wilhelmus Maria Van
Emiel Jozef Melanie Eussen
Koenen Willem Herman Gertruda Anna
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG148963A1 publication Critical patent/SG148963A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200804731-8A 2007-06-21 2008-06-20 Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product SG148963A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/812,817 US7804579B2 (en) 2007-06-21 2007-06-21 Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product

Publications (1)

Publication Number Publication Date
SG148963A1 true SG148963A1 (en) 2009-01-29

Family

ID=39769278

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200804731-8A SG148963A1 (en) 2007-06-21 2008-06-20 Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product

Country Status (7)

Country Link
US (1) US7804579B2 (de)
EP (1) EP2006740B1 (de)
JP (1) JP4778987B2 (de)
KR (1) KR100978096B1 (de)
CN (1) CN101364049B (de)
SG (1) SG148963A1 (de)
TW (1) TWI468873B (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8174671B2 (en) * 2007-06-21 2012-05-08 Asml Netherlands B.V. Lithographic projection apparatus and method for controlling a support structure
CN105301918B (zh) 2007-07-18 2018-02-16 株式会社尼康 曝光装置、曝光方法、及元件制造方法
US8194232B2 (en) * 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
NL1036618A1 (nl) * 2008-03-24 2009-09-25 Asml Netherlands Bv Encoder-type measurement system, lithograpic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system.
US8514395B2 (en) * 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
NL2005719A (en) * 2009-12-18 2011-06-21 Asml Netherlands Bv Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product.
NL2007633A (en) 2010-11-22 2012-05-23 Asml Netherlands Bv A positioning system, a lithographic apparatus and a method for positional control.
CN102566287B (zh) * 2010-12-16 2014-02-19 上海微电子装备有限公司 光刻机的垂向控制装置及方法
DE102011005885A1 (de) 2011-03-22 2012-09-27 Carl Zeiss Smt Gmbh Lithographievorrichtung
JP5922788B2 (ja) * 2011-11-09 2016-05-24 ザイゴ コーポレーションＺｙｇｏ Ｃｏｒｐｏｒａｔｉｏｎ 熱的に安定な光学センサマウント
CN103185548B (zh) * 2011-12-31 2016-03-09 睿励科学仪器（上海）有限公司 测量半导体机台的平台性能参数的辅助装置及方法
CN103309167B (zh) * 2012-03-09 2015-06-17 上海微电子装备有限公司 运动台定位精度的测量系统及测量方法
DE102012204572A1 (de) 2012-03-22 2013-09-26 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung und Anordnung mit einer derartigen Positionsmesseinrichtung
JP6066592B2 (ja) 2012-06-12 2017-01-25 キヤノン株式会社 露光装置及びデバイス製造方法
WO2014048654A1 (en) * 2012-09-28 2014-04-03 Asml Holding N.V. Quantitative reticle distortion measurement system
JP6218459B2 (ja) * 2013-07-02 2017-10-25 キヤノン株式会社 除振装置、除振方法、リソグラフィ装置及びデバイスの製造方法
KR20240010551A (ko) 2015-02-23 2024-01-23 가부시키가이샤 니콘 기판 처리 시스템 및 기판 처리 방법, 그리고 디바이스 제조 방법
CN111158220A (zh) 2015-02-23 2020-05-15 株式会社尼康 测量装置及方法、光刻系统、曝光装置及方法
KR20230107706A (ko) * 2015-02-23 2023-07-17 가부시키가이샤 니콘 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고디바이스 제조 방법
US10866531B2 (en) 2016-10-04 2020-12-15 Asml Netherlands B.V. Athermalization of an alignment system
NL2020344A (en) 2017-02-03 2018-08-14 Asml Netherlands Bv Exposure apparatus
EP3418923A1 (de) * 2017-06-19 2018-12-26 Dassault Systèmes Computerimplementiertes verfahren zum entwurf einer verpackungseinlage für die verpackung eines festkörpers
CN112053985B (zh) * 2020-07-03 2024-02-02 北京华卓精科科技股份有限公司 一种晶圆对准装置及其对准方法
CN111766414B (zh) * 2020-08-14 2020-12-25 强一半导体（苏州）有限公司 面向导引板mems探针结构模板烧刻的探针定位方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5751404A (en) * 1995-07-24 1998-05-12 Canon Kabushiki Kaisha Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
JP4264676B2 (ja) 1998-11-30 2009-05-20 株式会社ニコン 露光装置及び露光方法
JP4194160B2 (ja) * 1998-02-19 2008-12-10 キヤノン株式会社 投影露光装置
TWI231405B (en) * 1999-12-22 2005-04-21 Asml Netherlands Bv Lithographic projection apparatus, position detection device, and method of manufacturing a device using a lithographic projection apparatus
JP2001308003A (ja) 2000-02-15 2001-11-02 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
TW527526B (en) * 2000-08-24 2003-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7289212B2 (en) * 2000-08-24 2007-10-30 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufacturing thereby
US6791664B2 (en) * 2001-01-19 2004-09-14 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufacturing thereby
JP2002367878A (ja) 2001-06-04 2002-12-20 Sony Corp アライメント補正方法及び露光装置
EP1265104A1 (de) 2001-06-06 2002-12-11 ASML Netherlands B.V. Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und dabei erzeugter Artikel
JP2003022948A (ja) 2001-07-05 2003-01-24 Canon Inc 投影露光装置
US7061579B2 (en) * 2003-11-13 2006-06-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4522142B2 (ja) 2004-05-18 2010-08-11 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び基板製造方法
US7515281B2 (en) * 2005-04-08 2009-04-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7348574B2 (en) * 2005-09-02 2008-03-25 Asml Netherlands, B.V. Position measurement system and lithographic apparatus
US7755742B2 (en) * 2005-10-11 2010-07-13 Asml Netherlands B.V. Lithographic apparatus with mounted sensor

Also Published As

Publication number Publication date
EP2006740A1 (de) 2008-12-24
KR20080112988A (ko) 2008-12-26
EP2006740B1 (de) 2015-08-12
TWI468873B (zh) 2015-01-11
CN101364049A (zh) 2009-02-11
JP2009016820A (ja) 2009-01-22
JP4778987B2 (ja) 2011-09-21
KR100978096B1 (ko) 2010-08-25
CN101364049B (zh) 2012-05-30
TW200907600A (en) 2009-02-16
US7804579B2 (en) 2010-09-28
US20080316460A1 (en) 2008-12-25

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