SG141385A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG141385A1
SG141385A1 SG200708777-8A SG2007087778A SG141385A1 SG 141385 A1 SG141385 A1 SG 141385A1 SG 2007087778 A SG2007087778 A SG 2007087778A SG 141385 A1 SG141385 A1 SG 141385A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
substrate
dies
path
Prior art date
Application number
SG200708777-8A
Other languages
English (en)
Inventor
Streefkerk Bob
Dommelen Youri Johannes La Van
Moerman Richard
Cedric Desire Grouwstra
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG141385A1 publication Critical patent/SG141385A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG200708777-8A 2006-09-20 2007-09-13 Lithographic apparatus and device manufacturing method SG141385A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/523,743 US8330936B2 (en) 2006-09-20 2006-09-20 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG141385A1 true SG141385A1 (en) 2008-04-28

Family

ID=38782682

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200708777-8A SG141385A1 (en) 2006-09-20 2007-09-13 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (1) US8330936B2 (https=)
EP (1) EP1903398B1 (https=)
JP (2) JP4839288B2 (https=)
KR (1) KR100933000B1 (https=)
CN (1) CN101221363B (https=)
DE (1) DE602007012032D1 (https=)
SG (1) SG141385A1 (https=)
TW (1) TWI375129B (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5089143B2 (ja) * 2006-11-20 2012-12-05 キヤノン株式会社 液浸露光装置
US8134685B2 (en) * 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US20090310115A1 (en) * 2008-06-12 2009-12-17 Nikon Corporation Apparatus and method for exposing adjacent sites on a substrate
EP2151717A1 (en) * 2008-08-05 2010-02-10 ASML Holding N.V. Full wafer width scanning using step and scan system
NL2003226A (en) * 2008-08-19 2010-03-09 Asml Netherlands Bv Lithographic apparatus, drying device, metrology apparatus and device manufacturing method.
JP5354339B2 (ja) * 2008-12-18 2013-11-27 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
US8953143B2 (en) * 2009-04-24 2015-02-10 Nikon Corporation Liquid immersion member
US8610878B2 (en) * 2010-03-04 2013-12-17 Asml Netherlands B.V. Lithographic apparatus and method
NL2006818A (en) 2010-07-02 2012-01-03 Asml Netherlands Bv A method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus.
NL2008157A (en) * 2011-02-22 2012-08-24 Asml Netherlands Bv Lithographic apparatus and lithographic projection method.
US8906599B2 (en) 2012-05-17 2014-12-09 Taiwan Semiconductor Manufacturing Co., Ltd. Enhanced scanner throughput system and method
US9568828B2 (en) * 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
JP5986538B2 (ja) 2013-06-10 2016-09-06 キヤノン株式会社 露光装置および物品の製造方法
JP2016154241A (ja) * 2013-07-02 2016-08-25 キヤノン株式会社 パターン形成方法、リソグラフィ装置、リソグラフィシステムおよび物品製造方法
JP5960198B2 (ja) 2013-07-02 2016-08-02 キヤノン株式会社 パターン形成方法、リソグラフィ装置、リソグラフィシステムおよび物品製造方法
US9760027B2 (en) * 2013-10-17 2017-09-12 United Microelectronics Corp. Scanner routing method for particle removal
CN104793467B (zh) * 2014-01-20 2017-05-17 中芯国际集成电路制造(上海)有限公司 曝光装置、掩膜板及曝光方法
CN111315473B (zh) 2017-11-21 2022-01-11 诺力昂化学品国际有限公司 由生物基单体制备的可热膨胀微球
JP7504168B2 (ja) * 2022-08-10 2024-06-21 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US6118515A (en) * 1993-12-08 2000-09-12 Nikon Corporation Scanning exposure method
JPH10303126A (ja) * 1997-02-28 1998-11-13 Nikon Corp 移動シーケンスの決定方法
JP4370608B2 (ja) * 1998-03-09 2009-11-25 株式会社ニコン 走査露光方法、走査型露光装置及びその製造方法、並びにデバイス製造方法
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
JP2000021702A (ja) 1998-06-30 2000-01-21 Canon Inc 露光装置ならびにデバイス製造方法
US6734117B2 (en) * 2002-03-12 2004-05-11 Nikon Corporation Periodic clamping method and apparatus to reduce thermal stress in a wafer
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7110081B2 (en) * 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100585476B1 (ko) * 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1420299B1 (en) 2002-11-12 2011-01-05 ASML Netherlands B.V. Immersion lithographic apparatus and device manufacturing method
CN101872135B (zh) * 2002-12-10 2013-07-31 株式会社尼康 曝光设备和器件制造法
JP2005072132A (ja) 2003-08-21 2005-03-17 Nikon Corp 露光装置及びデバイス製造方法
EP1860506B1 (en) 2003-10-16 2009-04-08 ASML Netherlands B.V. Device manufacturing method
KR100585108B1 (ko) * 2003-11-14 2006-06-01 삼성전자주식회사 스캔 방식의 노광 장치를 이용한 웨이퍼 노광 방법
US7244534B2 (en) 2004-04-23 2007-07-17 Asml Netherlands B.V. Device manufacturing method
WO2005106930A1 (ja) 2004-04-27 2005-11-10 Nikon Corporation 露光方法、露光装置及びデバイス製造方法
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4003885B2 (ja) * 2004-08-23 2007-11-07 Ｔｄｋ株式会社 露光方法および露光装置
JP4625673B2 (ja) 2004-10-15 2011-02-02 株式会社東芝 露光方法及び露光装置
EP1681597B1 (en) 2005-01-14 2010-03-10 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7462429B2 (en) 2005-10-12 2008-12-09 Asml Netherlands B.V. Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7666576B2 (en) * 2006-06-07 2010-02-23 Taiwan Semiconductor Manufacturing Company, Ltd. Exposure scan and step direction optimization
US7656502B2 (en) 2006-06-22 2010-02-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JP2008078648A (ja) 2008-04-03
CN101221363B (zh) 2011-09-28
CN101221363A (zh) 2008-07-16
KR20080026505A (ko) 2008-03-25
TW200821769A (en) 2008-05-16
JP4839288B2 (ja) 2011-12-21
US8330936B2 (en) 2012-12-11
TWI375129B (en) 2012-10-21
DE602007012032D1 (de) 2011-03-03
KR100933000B1 (ko) 2009-12-21
US20080068570A1 (en) 2008-03-20
EP1903398A1 (en) 2008-03-26
JP5214678B2 (ja) 2013-06-19
JP2011018915A (ja) 2011-01-27
EP1903398B1 (en) 2011-01-19

Similar Documents

Publication Publication Date Title
SG141385A1 (en) Lithographic apparatus and device manufacturing method
TW200611082A (en) Exposure system and device production method
SG121847A1 (en) Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
TW200739278A (en) Exposure apparatus
GB2419795B (en) X-ray thin film inspection apparatus and thin film inspection apparatus and method for patterned wafer
TW200509205A (en) Exposure method and device-manufacturing method
EP2264535A3 (en) Exposure apparatus, method for producing device, and method for controlling exposure apparatus
SG121188A1 (en) Method for the removal of deposition on an opticalelement, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic appa ratus
TW200502157A (en) A method of forming stepped structures employing imprint lithography
IL179937A0 (en) Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
SG115693A1 (en) Method for coating a substrate for euv lithography and substrate with photoresist layer
TW200507063A (en) Linking unit, exposure apparatus and method for manufacturing device
WO2010030018A3 (en) Pattern forming method and device production method
GB0423150D0 (en) Pattern-definition device for maskless particle-beam exposure apparatus
SG145780A1 (en) Exposure apparatus and device fabricating method
SG110121A1 (en) Method for exposing a substrate and lithographic projection apparatus
WO2008045520A3 (en) Imprint lithography apparatus and methods
TW200719095A (en) Exposure apparatus, exposure method and device manufacturing method
SG120264A1 (en) Lithographic apparatus method and computer programproduct for generating a mask pattern and device manufacturing method using same
TW200739276A (en) Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method
TW200700932A (en) Lithography process with an enhanced depth-of-depth
EP1605310A3 (en) Exposure system and pattern formation method
TW200625021A (en) Lithographic apparatus and device manufacturing method
TW200622514A (en) Lithographic apparatus and device manufacturing method
SG119277A1 (en) Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus