SG128670A1 - Lithographic apparatus, contaminant trap, and device manufacturing method - Google Patents

Lithographic apparatus, contaminant trap, and device manufacturing method

Info

Publication number
SG128670A1
SG128670A1 SG200604526A SG200604526A SG128670A1 SG 128670 A1 SG128670 A1 SG 128670A1 SG 200604526 A SG200604526 A SG 200604526A SG 200604526 A SG200604526 A SG 200604526A SG 128670 A1 SG128670 A1 SG 128670A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
contaminant trap
contaminant
trap
Prior art date
Application number
SG200604526A
Other languages
English (en)
Inventor
Leonid Aizikovitch Sjmaenok
Vadim Yevgenyevich Banine
Josephus Jacobus Smits
Van Den Lambertus A Wildenberg
Alexander Alexandrovit Schmidt
Arnoud Cornelis Wassink
Paul Peter Anna Antonius Brom
Eric Louis Willem Verpalen
Van De Antonius Johannes Pas
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG128670A1 publication Critical patent/SG128670A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200604526A 2005-07-06 2006-07-04 Lithographic apparatus, contaminant trap, and device manufacturing method SG128670A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/175,036 US7397056B2 (en) 2005-07-06 2005-07-06 Lithographic apparatus, contaminant trap, and device manufacturing method

Publications (1)

Publication Number Publication Date
SG128670A1 true SG128670A1 (en) 2007-01-30

Family

ID=37116128

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200809052-4A SG149006A1 (en) 2005-07-06 2006-07-04 Lithographic apparatus, contaminant trap, and device manufacturing method
SG200604526A SG128670A1 (en) 2005-07-06 2006-07-04 Lithographic apparatus, contaminant trap, and device manufacturing method

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200809052-4A SG149006A1 (en) 2005-07-06 2006-07-04 Lithographic apparatus, contaminant trap, and device manufacturing method

Country Status (8)

Country Link
US (2) US7397056B2 (ko)
EP (1) EP1742110B1 (ko)
JP (1) JP4463243B2 (ko)
KR (1) KR100803741B1 (ko)
CN (1) CN1892441B (ko)
DE (1) DE602006002439D1 (ko)
SG (2) SG149006A1 (ko)
TW (1) TWI341443B (ko)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
CN100476585C (zh) * 2002-12-23 2009-04-08 Asml荷兰有限公司 具有可扩展薄片的杂质屏蔽
US7446329B2 (en) * 2003-08-07 2008-11-04 Intel Corporation Erosion resistance of EUV source electrodes
SG123770A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, radiation system and filt er system
SG123767A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, illumination system and filter system
US7485881B2 (en) * 2004-12-29 2009-02-03 Asml Netherlands B.V. Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system
US7397056B2 (en) * 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
US7453077B2 (en) * 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US7332731B2 (en) * 2005-12-06 2008-02-19 Asml Netherlands, B.V. Radiation system and lithographic apparatus
US7465943B2 (en) * 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
US7468521B2 (en) * 2005-12-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7368733B2 (en) * 2006-03-30 2008-05-06 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7442948B2 (en) * 2006-05-15 2008-10-28 Asml Netherlands B.V. Contamination barrier and lithographic apparatus
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
JP5103976B2 (ja) 2007-03-23 2012-12-19 ウシオ電機株式会社 ホイルトラップ及びこのホイルトラップを用いた極端紫外光光源装置
US7839482B2 (en) * 2007-05-21 2010-11-23 Asml Netherlands B.V. Assembly comprising a radiation source, a reflector and a contaminant barrier
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
US8257902B2 (en) * 2007-11-05 2012-09-04 Deyan Wang Compositons and processes for immersion lithography
CN101960386B (zh) * 2008-02-28 2013-02-06 皇家飞利浦电子股份有限公司 具有旋转箔陷阱和驱动组件的碎片减缓装置
WO2009144609A1 (en) * 2008-05-28 2009-12-03 Philips Intellectual Property & Standards Gmbh Debris mitigation device
US9207548B2 (en) * 2008-08-14 2015-12-08 Asml Netherlands B.V. Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method
KR101697610B1 (ko) * 2008-09-11 2017-01-18 에이에스엠엘 네델란즈 비.브이. 방사선 소스 및 리소그래피 장치
EP2561407B1 (en) * 2010-04-22 2014-12-10 ASML Netherlands B.V. Collector mirror assembly and method for producing extreme ultraviolet radiation
EP2518563A1 (en) 2010-06-25 2012-10-31 ASML Netherlands BV Lithographic apparatus and method
US9268031B2 (en) * 2012-04-09 2016-02-23 Kla-Tencor Corporation Advanced debris mitigation of EUV light source
US9753383B2 (en) * 2012-06-22 2017-09-05 Asml Netherlands B.V. Radiation source and lithographic apparatus
WO2014004453A1 (en) 2012-06-29 2014-01-03 The Procter & Gamble Company System and method for high-speed continuous application of a strip material to a moving sheet-like substrate material
KR20140036538A (ko) * 2012-09-17 2014-03-26 삼성전자주식회사 극자외선 생성 장치, 이를 포함하는 노광 장치 및 이러한 노광 장치를 사용해서 제조된 전자 디바이스
CN103237401A (zh) * 2013-04-01 2013-08-07 哈尔滨工业大学 一种去除毛细管放电极紫外光刻光源中碎屑的除屑系统
KR102115543B1 (ko) * 2013-04-26 2020-05-26 삼성전자주식회사 극자외선 광원 장치
KR102094800B1 (ko) * 2013-07-25 2020-03-31 삼성디스플레이 주식회사 오염 물질 측정 기판, 이를 이용한 기판 제조 장치 및 제조 방법
WO2015124344A1 (en) 2014-02-20 2015-08-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9609731B2 (en) 2014-07-07 2017-03-28 Media Lario Srl Systems and methods for synchronous operation of debris-mitigation devices
WO2019043773A1 (ja) * 2017-08-29 2019-03-07 ギガフォトン株式会社 極端紫外光生成装置
US11307119B2 (en) * 2019-04-23 2022-04-19 Pall Corporation Aircraft air contaminant collector device and method of use
DE102023108743A1 (de) 2023-04-05 2024-10-10 Carl Zeiss Smt Gmbh EUV-Strahlungsquellensystem mit Kontaminationsunterdrückung

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408338A (en) * 1981-12-31 1983-10-04 International Business Machines Corporation Pulsed electromagnetic radiation source having a barrier for discharged debris
US4837794A (en) * 1984-10-12 1989-06-06 Maxwell Laboratories Inc. Filter apparatus for use with an x-ray source
JPH07120267B2 (ja) * 1987-03-04 1995-12-20 日本電信電話株式会社 カウンタ回路
JPH09320792A (ja) 1996-05-27 1997-12-12 Nikon Corp Ｘ線発生装置
US6566667B1 (en) 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US6566668B2 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6459472B1 (en) * 1998-05-15 2002-10-01 Asml Netherlands B.V. Lithographic device
JP2000098098A (ja) 1998-09-21 2000-04-07 Nikon Corp Ｘ線発生装置
JP4329177B2 (ja) 1999-08-18 2009-09-09 株式会社ニコン Ｘ線発生装置及びこれを備えた投影露光装置及び露光方法
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
JP4800472B2 (ja) 2000-11-06 2011-10-26 Ｎｓｋワーナー株式会社 発進クラッチ及び発進クラッチの制御方法
CN1256628C (zh) * 2001-04-17 2006-05-17 皇家菲利浦电子有限公司 远紫外线可透过的界面结构
JP2003022950A (ja) 2001-07-05 2003-01-24 Canon Inc Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置
WO2003034153A2 (en) * 2001-10-12 2003-04-24 Koninklijke Philips Electronics N.V. Lithographic apparatus and device manufacturing method
DE10215469B4 (de) * 2002-04-05 2005-03-17 Xtreme Technologies Gmbh Anordnung zur Unterdrückung von Teilchenemission bei einer Strahlungserzeugung auf Basis eines heißen Plasmas
EP1389747B1 (en) 2002-08-15 2008-10-15 ASML Netherlands B.V. Lithographic projection apparatus and reflector asembly for use in said apparatus
SG108933A1 (en) * 2002-08-23 2005-02-28 Asml Netherlands Bv Lithographic projection apparatus and particle barrier for use in said apparatus
JP4235480B2 (ja) * 2002-09-03 2009-03-11 キヤノン株式会社 差動排気システム及び露光装置
CN100476585C (zh) * 2002-12-23 2009-04-08 Asml荷兰有限公司 具有可扩展薄片的杂质屏蔽
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
SG118268A1 (en) * 2003-06-27 2006-01-27 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
KR100694572B1 (ko) * 2003-11-11 2007-03-13 에이에스엠엘 네델란즈 비.브이. 오염 억제를 위한 리소그래피 장치, 디바이스 제조방법 및 이에 의해 제조된 디바이스
US7307263B2 (en) * 2004-07-14 2007-12-11 Asml Netherlands B.V. Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
KR100576512B1 (ko) * 2004-07-15 2006-05-03 동부일렉트로닉스 주식회사 오염 방지 노광장치
US7145132B2 (en) * 2004-12-27 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, illumination system and debris trapping system
SG123767A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, illumination system and filter system
SG123770A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, radiation system and filt er system
JP4455491B2 (ja) * 2004-12-28 2010-04-21 エーエスエムエル ネザーランズ ビー．ブイ． 放射ビームから粒子をフィルタ除去するように動作可能なフィルタ・システムを提供する方法、フィルタ・システム、装置、及びフィルタ・システムを含むリソグラフィ装置
US7485881B2 (en) * 2004-12-29 2009-02-03 Asml Netherlands B.V. Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system
US7106832B2 (en) * 2005-01-10 2006-09-12 Asml Netherlands B.V. Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source
US7233010B2 (en) * 2005-05-20 2007-06-19 Asml Netherlands B.V. Radiation system and lithographic apparatus
BRPI0520295B1 (pt) 2005-06-13 2019-05-28 Nokia Technologies Oy Método e aparelho para suportar o posicionamento baseado em satélite de um dispositivo móvel usando os dados de assistência
JP4981795B2 (ja) 2005-06-14 2012-07-25 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ ガス分散性が改良された破屑軽減システム
US7397056B2 (en) * 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same

Also Published As

Publication number Publication date
CN1892441A (zh) 2007-01-10
US20070023706A1 (en) 2007-02-01
US7612353B2 (en) 2009-11-03
DE602006002439D1 (de) 2008-10-09
TW200712787A (en) 2007-04-01
TWI341443B (en) 2011-05-01
KR100803741B1 (ko) 2008-02-15
EP1742110A2 (en) 2007-01-10
EP1742110A3 (en) 2007-05-23
JP4463243B2 (ja) 2010-05-19
CN1892441B (zh) 2011-04-06
SG149006A1 (en) 2009-01-29
KR20070005528A (ko) 2007-01-10
US7397056B2 (en) 2008-07-08
US20070018118A1 (en) 2007-01-25
EP1742110B1 (en) 2008-08-27
JP2007019510A (ja) 2007-01-25

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