SG112978A1 - Apparatus method for control, pumping and abatement for vacuum process chambers - Google Patents

Apparatus method for control, pumping and abatement for vacuum process chambers

Info

Publication number
SG112978A1
SG112978A1 SG200407451A SG200407451A SG112978A1 SG 112978 A1 SG112978 A1 SG 112978A1 SG 200407451 A SG200407451 A SG 200407451A SG 200407451 A SG200407451 A SG 200407451A SG 112978 A1 SG112978 A1 SG 112978A1
Authority
SG
Singapore
Prior art keywords
abatement
pumping
control
process chambers
vacuum process
Prior art date
Application number
SG200407451A
Other languages
English (en)
Inventor
M Bailey Christopher
S Boger Michael
Original Assignee
Boc Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34592545&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SG112978(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Boc Group Inc filed Critical Boc Group Inc
Publication of SG112978A1 publication Critical patent/SG112978A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D25/00—Pumping installations or systems
    • F04D25/16—Combinations of two or more pumps ; Producing two or more separate gas flows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
SG200407451A 2003-12-31 2004-11-22 Apparatus method for control, pumping and abatement for vacuum process chambers SG112978A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/750,309 US7278831B2 (en) 2003-12-31 2003-12-31 Apparatus and method for control, pumping and abatement for vacuum process chambers

Publications (1)

Publication Number Publication Date
SG112978A1 true SG112978A1 (en) 2005-07-28

Family

ID=34592545

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200407451A SG112978A1 (en) 2003-12-31 2004-11-22 Apparatus method for control, pumping and abatement for vacuum process chambers

Country Status (7)

Country Link
US (1) US7278831B2 (zh)
EP (1) EP1553303B2 (zh)
JP (1) JP4732750B2 (zh)
KR (1) KR101099854B1 (zh)
CN (1) CN1637283B (zh)
SG (1) SG112978A1 (zh)
TW (1) TWI377291B (zh)

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JP6368458B2 (ja) * 2013-05-24 2018-08-01 株式会社荏原製作所 除害機能付真空ポンプ
CN103758733A (zh) * 2014-01-29 2014-04-30 储继国 大型中、高真空抽气机组及其抽气工艺
JP6441660B2 (ja) * 2014-03-17 2018-12-19 株式会社荏原製作所 除害機能付真空ポンプ
JP5808454B1 (ja) 2014-04-25 2015-11-10 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラムおよび記録媒体
CN105047581A (zh) * 2014-04-25 2015-11-11 株式会社日立国际电气 衬底处理装置及半导体器件的制造方法
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US11077401B2 (en) 2018-05-16 2021-08-03 Highvac Corporation Separated gas stream point of use abatement device
KR102125367B1 (ko) * 2018-06-21 2020-06-22 주식회사 포스코 코크스 오븐 가스 처리 장치
KR102098312B1 (ko) 2018-07-27 2020-04-10 (주)아이솔루션 배출 효율 개선 구조의 공정 챔버 배출 장치
JP2020056373A (ja) * 2018-10-03 2020-04-09 株式会社荏原製作所 真空排気システム
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GB2584603B (en) * 2019-04-11 2021-10-13 Edwards Ltd Vacuum chamber module
KR102329548B1 (ko) * 2019-10-17 2021-11-24 무진전자 주식회사 챔버 배기량 자동 조절 시스템
KR102424601B1 (ko) * 2021-02-04 2022-07-25 에스케이실트론 주식회사 웨이퍼 제조장치 및 상기 웨이퍼 제조장치의 운영방법
GB2610156A (en) * 2021-04-29 2023-03-01 Edwards Ltd Semiconductor processing system
KR102583557B1 (ko) * 2021-05-26 2023-10-10 세메스 주식회사 기판 처리 설비의 배기 장치 및 배기 방법
CN113606949A (zh) * 2021-07-29 2021-11-05 北京北方华创真空技术有限公司 多工位除气炉的抽真空系统

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Also Published As

Publication number Publication date
TWI377291B (en) 2012-11-21
TW200532108A (en) 2005-10-01
US20050147509A1 (en) 2005-07-07
EP1553303B2 (en) 2020-02-26
EP1553303A3 (en) 2009-12-30
CN1637283A (zh) 2005-07-13
EP1553303A2 (en) 2005-07-13
JP2005207419A (ja) 2005-08-04
KR101099854B1 (ko) 2011-12-28
EP1553303B1 (en) 2013-08-28
CN1637283B (zh) 2010-05-26
US7278831B2 (en) 2007-10-09
KR20050071354A (ko) 2005-07-07
JP4732750B2 (ja) 2011-07-27

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