SG11202106610PA - Quartz glass crucible, method for producing silicon single crystal using same, method for measuring infrared transmittance of quartz glass crucible, and method for manufacturing quartz glass crucible - Google Patents
Quartz glass crucible, method for producing silicon single crystal using same, method for measuring infrared transmittance of quartz glass crucible, and method for manufacturing quartz glass crucibleInfo
- Publication number
- SG11202106610PA SG11202106610PA SG11202106610PA SG11202106610PA SG11202106610PA SG 11202106610P A SG11202106610P A SG 11202106610PA SG 11202106610P A SG11202106610P A SG 11202106610PA SG 11202106610P A SG11202106610P A SG 11202106610PA SG 11202106610P A SG11202106610P A SG 11202106610PA
- Authority
- SG
- Singapore
- Prior art keywords
- quartz glass
- glass crucible
- single crystal
- silicon single
- same
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title 3
- 238000004519 manufacturing process Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 239000013078 crystal Substances 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 238000002834 transmittance Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/004—Coating the inside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/005—Coating the outside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/10—Compositions for glass with special properties for infrared transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B14/10—Crucibles
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/38—Concrete; Lime; Mortar; Gypsum; Bricks; Ceramics; Glass
- G01N33/386—Glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- Immunology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
- Crucibles And Fluidized-Bed Furnaces (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018244361 | 2018-12-27 | ||
| JP2018244362 | 2018-12-27 | ||
| PCT/JP2019/049120 WO2020137648A1 (ja) | 2018-12-27 | 2019-12-16 | 石英ガラスルツボ及びこれを用いたシリコン単結晶の製造方法並びに石英ガラスルツボの赤外線透過率測定方法及び製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202106610PA true SG11202106610PA (en) | 2021-07-29 |
Family
ID=71129027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202106610PA SG11202106610PA (en) | 2018-12-27 | 2019-12-16 | Quartz glass crucible, method for producing silicon single crystal using same, method for measuring infrared transmittance of quartz glass crucible, and method for manufacturing quartz glass crucible |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US11939695B2 (zh) |
| JP (1) | JP7279722B2 (zh) |
| KR (1) | KR102559418B1 (zh) |
| CN (2) | CN117904703A (zh) |
| DE (1) | DE112019006417B4 (zh) |
| SG (1) | SG11202106610PA (zh) |
| TW (1) | TWI732388B (zh) |
| WO (1) | WO2020137648A1 (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112019006492T5 (de) | 2018-12-27 | 2021-11-11 | Sumco Corporation | Quarzglastiegel |
| CN115504653B (zh) * | 2022-09-15 | 2024-01-12 | 德清三明坩埚有限公司 | 一种抗热震开裂的粘土坩埚的制备工艺 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0753295Y2 (ja) | 1988-11-25 | 1995-12-06 | 富士通テン株式会社 | アンテナアンプの電源回路 |
| JP2962976B2 (ja) | 1993-08-10 | 1999-10-12 | 東芝セラミックス株式会社 | 石英ガラスルツボ |
| JP3136533B2 (ja) | 1995-04-28 | 2001-02-19 | 三菱マテリアルクォーツ株式会社 | シリコン単結晶引上げ用石英ルツボ |
| JP2936392B2 (ja) | 1995-12-12 | 1999-08-23 | 三菱マテリアルクォーツ株式会社 | シリコン単結晶引上げ用石英ルツボ |
| JP2000159593A (ja) * | 1998-11-24 | 2000-06-13 | Toshiba Ceramics Co Ltd | 石英ガラスるつぼの製造方法 |
| JP4454059B2 (ja) | 1999-01-29 | 2010-04-21 | 信越石英株式会社 | シリコン単結晶引き上げ用大口径石英ガラスるつぼ |
| US6302957B1 (en) * | 1999-10-05 | 2001-10-16 | Sumitomo Metal Industries, Ltd. | Quartz crucible reproducing method |
| JP2002326889A (ja) | 2001-04-27 | 2002-11-12 | Toshiba Ceramics Co Ltd | シリコン単結晶引上げ用石英ガラスルツボ |
| JP4076416B2 (ja) | 2002-09-20 | 2008-04-16 | コバレントマテリアル株式会社 | 石英ルツボとその製造方法 |
| JP5229778B2 (ja) | 2007-09-28 | 2013-07-03 | 株式会社Ｓｕｍｃｏ | シリコン単結晶引き上げ用石英ガラスルツボの製造方法 |
| JP5069663B2 (ja) * | 2008-10-31 | 2012-11-07 | ジャパンスーパークォーツ株式会社 | 多層構造を有する石英ガラスルツボ |
| JP4987029B2 (ja) * | 2009-04-02 | 2012-07-25 | ジャパンスーパークォーツ株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
| JP5618409B2 (ja) | 2010-12-01 | 2014-11-05 | 株式会社Sumco | シリカガラスルツボ |
| JP6351534B2 (ja) | 2015-04-01 | 2018-07-04 | クアーズテック株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
| CN106868583B (zh) | 2015-12-10 | 2019-06-14 | 有研半导体材料有限公司 | 一种石英坩埚 |
| JP6759020B2 (ja) | 2016-09-08 | 2020-09-23 | グローバルウェーハズ・ジャパン株式会社 | シリコン単結晶の製造方法及び改質処理後のシリコン単結晶製造用石英ルツボ |
| JP6658421B2 (ja) | 2016-09-14 | 2020-03-04 | 株式会社Sumco | シリコン単結晶の製造方法 |
| DE112019006492T5 (de) | 2018-12-27 | 2021-11-11 | Sumco Corporation | Quarzglastiegel |
-
2019
- 2019-12-16 CN CN202410082199.0A patent/CN117904703A/zh active Pending
- 2019-12-16 WO PCT/JP2019/049120 patent/WO2020137648A1/ja active Application Filing
- 2019-12-16 CN CN201980086251.7A patent/CN113348275B/zh active Active
- 2019-12-16 DE DE112019006417.7T patent/DE112019006417B4/de active Active
- 2019-12-16 KR KR1020217019743A patent/KR102559418B1/ko active IP Right Grant
- 2019-12-16 SG SG11202106610PA patent/SG11202106610PA/en unknown
- 2019-12-16 US US17/413,929 patent/US11939695B2/en active Active
- 2019-12-16 JP JP2020563095A patent/JP7279722B2/ja active Active
- 2019-12-18 TW TW108146392A patent/TWI732388B/zh active
-
2024
- 2024-02-16 US US18/443,722 patent/US20240183062A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR102559418B1 (ko) | 2023-07-25 |
| JPWO2020137648A1 (ja) | 2021-10-21 |
| CN117904703A (zh) | 2024-04-19 |
| US20240183062A1 (en) | 2024-06-06 |
| TWI732388B (zh) | 2021-07-01 |
| CN113348275B (zh) | 2024-01-12 |
| CN113348275A (zh) | 2021-09-03 |
| DE112019006417T5 (de) | 2021-09-09 |
| KR20210095674A (ko) | 2021-08-02 |
| US11939695B2 (en) | 2024-03-26 |
| DE112019006417B4 (de) | 2024-03-21 |
| TW202030383A (zh) | 2020-08-16 |
| JP7279722B2 (ja) | 2023-05-23 |
| WO2020137648A1 (ja) | 2020-07-02 |
| US20220090291A1 (en) | 2022-03-24 |
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