SG11202106610PA - Quartz glass crucible, method for producing silicon single crystal using same, method for measuring infrared transmittance of quartz glass crucible, and method for manufacturing quartz glass crucible - Google Patents
Quartz glass crucible, method for producing silicon single crystal using same, method for measuring infrared transmittance of quartz glass crucible, and method for manufacturing quartz glass crucibleInfo
- Publication number
- SG11202106610PA SG11202106610PA SG11202106610PA SG11202106610PA SG11202106610PA SG 11202106610P A SG11202106610P A SG 11202106610PA SG 11202106610P A SG11202106610P A SG 11202106610PA SG 11202106610P A SG11202106610P A SG 11202106610PA SG 11202106610P A SG11202106610P A SG 11202106610PA
- Authority
- SG
- Singapore
- Prior art keywords
- quartz glass
- glass crucible
- single crystal
- silicon single
- same
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title 3
- 238000004519 manufacturing process Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 239000013078 crystal Substances 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 238000002834 transmittance Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/004—Coating the inside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/005—Coating the outside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/10—Compositions for glass with special properties for infrared transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B14/10—Crucibles
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/38—Concrete; Lime; Mortar; Gypsum; Bricks; Ceramics; Glass
- G01N33/386—Glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- Immunology (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
- Crucibles And Fluidized-Bed Furnaces (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018244361 | 2018-12-27 | ||
| JP2018244362 | 2018-12-27 | ||
| PCT/JP2019/049120 WO2020137648A1 (en) | 2018-12-27 | 2019-12-16 | Quartz glass crucible, method for producing silicon single crystal using same, method for measuring infrared transmittance of quartz glass crucible, and method for manufacturing quartz glass crucible |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202106610PA true SG11202106610PA (en) | 2021-07-29 |
Family
ID=71129027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202106610PA SG11202106610PA (en) | 2018-12-27 | 2019-12-16 | Quartz glass crucible, method for producing silicon single crystal using same, method for measuring infrared transmittance of quartz glass crucible, and method for manufacturing quartz glass crucible |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US11939695B2 (en) |
| JP (1) | JP7279722B2 (en) |
| KR (1) | KR102559418B1 (en) |
| CN (2) | CN113348275B (en) |
| DE (1) | DE112019006417B4 (en) |
| SG (1) | SG11202106610PA (en) |
| TW (1) | TWI732388B (en) |
| WO (1) | WO2020137648A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115504653B (en) * | 2022-09-15 | 2024-01-12 | 德清三明坩埚有限公司 | Preparation process of clay crucible with thermal shock cracking resistance |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0753295Y2 (en) | 1988-11-25 | 1995-12-06 | 富士通テン株式会社 | Antenna amplifier power supply circuit |
| JP2962976B2 (en) | 1993-08-10 | 1999-10-12 | 東芝セラミックス株式会社 | Quartz glass crucible |
| JP3136533B2 (en) | 1995-04-28 | 2001-02-19 | 三菱マテリアルクォーツ株式会社 | Quartz crucible for pulling silicon single crystal |
| JP2936392B2 (en) * | 1995-12-12 | 1999-08-23 | 三菱マテリアルクォーツ株式会社 | Quartz crucible for pulling silicon single crystal |
| JP2000159593A (en) * | 1998-11-24 | 2000-06-13 | Toshiba Ceramics Co Ltd | Production of silica glass crucible |
| JP4454059B2 (en) * | 1999-01-29 | 2010-04-21 | 信越石英株式会社 | Large diameter quartz glass crucible for pulling silicon single crystal |
| US6302957B1 (en) * | 1999-10-05 | 2001-10-16 | Sumitomo Metal Industries, Ltd. | Quartz crucible reproducing method |
| JP2002326889A (en) | 2001-04-27 | 2002-11-12 | Toshiba Ceramics Co Ltd | Crucible of quartz glass for pulling silicon single crystal |
| JP4076416B2 (en) | 2002-09-20 | 2008-04-16 | コバレントマテリアル株式会社 | Quartz crucible and its manufacturing method |
| JP5229778B2 (en) * | 2007-09-28 | 2013-07-03 | 株式会社Ｓｕｍｃｏ | Method for producing quartz glass crucible for pulling silicon single crystal |
| JP5069663B2 (en) * | 2008-10-31 | 2012-11-07 | ジャパンスーパークォーツ株式会社 | Quartz glass crucible with multilayer structure |
| JP4987029B2 (en) * | 2009-04-02 | 2012-07-25 | ジャパンスーパークォーツ株式会社 | Silica glass crucible for pulling silicon single crystals |
| JP5618409B2 (en) | 2010-12-01 | 2014-11-05 | 株式会社Sumco | Silica glass crucible |
| JP6351534B2 (en) * | 2015-04-01 | 2018-07-04 | クアーズテック株式会社 | Silica glass crucible for pulling silicon single crystals |
| CN106868583B (en) | 2015-12-10 | 2019-06-14 | 有研半导体材料有限公司 | A kind of silica crucible |
| JP6759020B2 (en) | 2016-09-08 | 2020-09-23 | グローバルウェーハズ・ジャパン株式会社 | Silicon single crystal manufacturing method and quartz crucible for silicon single crystal manufacturing after modification treatment |
| JP6658421B2 (en) | 2016-09-14 | 2020-03-04 | 株式会社Sumco | Method for producing silicon single crystal |
| KR102512033B1 (en) | 2018-12-27 | 2023-03-20 | 가부시키가이샤 사무코 | quartz glass crucible |
-
2019
- 2019-12-16 US US17/413,929 patent/US11939695B2/en active Active
- 2019-12-16 SG SG11202106610PA patent/SG11202106610PA/en unknown
- 2019-12-16 WO PCT/JP2019/049120 patent/WO2020137648A1/en active Application Filing
- 2019-12-16 KR KR1020217019743A patent/KR102559418B1/en active IP Right Grant
- 2019-12-16 CN CN201980086251.7A patent/CN113348275B/en active Active
- 2019-12-16 DE DE112019006417.7T patent/DE112019006417B4/en active Active
- 2019-12-16 CN CN202410082199.0A patent/CN117904703A/en active Pending
- 2019-12-16 JP JP2020563095A patent/JP7279722B2/en active Active
- 2019-12-18 TW TW108146392A patent/TWI732388B/en active
-
2024
- 2024-02-16 US US18/443,722 patent/US20240183062A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TW202030383A (en) | 2020-08-16 |
| JP7279722B2 (en) | 2023-05-23 |
| KR20210095674A (en) | 2021-08-02 |
| WO2020137648A1 (en) | 2020-07-02 |
| US20220090291A1 (en) | 2022-03-24 |
| JPWO2020137648A1 (en) | 2021-10-21 |
| KR102559418B1 (en) | 2023-07-25 |
| TWI732388B (en) | 2021-07-01 |
| DE112019006417T5 (en) | 2021-09-09 |
| US11939695B2 (en) | 2024-03-26 |
| CN113348275B (en) | 2024-01-12 |
| US20240183062A1 (en) | 2024-06-06 |
| CN113348275A (en) | 2021-09-03 |
| DE112019006417B4 (en) | 2024-03-21 |
| CN117904703A (en) | 2024-04-19 |
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