SG11201600564SA - Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks - Google Patents

Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks

Info

Publication number
SG11201600564SA
SG11201600564SA SG11201600564SA SG11201600564SA SG11201600564SA SG 11201600564S A SG11201600564S A SG 11201600564SA SG 11201600564S A SG11201600564S A SG 11201600564SA SG 11201600564S A SG11201600564S A SG 11201600564SA SG 11201600564S A SG11201600564S A SG 11201600564SA
Authority
SG
Singapore
Prior art keywords
blend
polymers
blocks
controlling
block copolymers
Prior art date
Application number
SG11201600564SA
Other languages
English (en)
Inventor
Christophe Navarro
Xavier Chevalier
Celia Nicolet
Original Assignee
Arkema France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France filed Critical Arkema France
Publication of SG11201600564SA publication Critical patent/SG11201600564SA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
    • B05D3/0453—After-treatment
    • B05D3/046—Curing or evaporating the solvent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/001—Multistage polymerisation processes characterised by a change in reactor conditions without deactivating the intermediate polymer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
SG11201600564SA 2013-07-25 2014-07-18 Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks SG11201600564SA (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
FR1357333A FR3008986B1 (fr) 2013-07-25 2013-07-25 Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs
US201361879899P 2013-09-19 2013-09-19
FR1451490A FR3008987B1 (fr) 2013-07-25 2014-02-25 Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs
PCT/EP2014/065468 WO2015011035A1 (en) 2013-07-25 2014-07-18 Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks

Publications (1)

Publication Number Publication Date
SG11201600564SA true SG11201600564SA (en) 2016-03-30

Family

ID=49322637

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201600564SA SG11201600564SA (en) 2013-07-25 2014-07-18 Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks

Country Status (8)

Country Link
US (1) US9296014B2 (ko)
JP (2) JP5911534B2 (ko)
KR (1) KR101540883B1 (ko)
CN (1) CN105579498B (ko)
FR (2) FR3008986B1 (ko)
SG (1) SG11201600564SA (ko)
TW (1) TWI595533B (ko)
WO (1) WO2015011035A1 (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6243213B2 (ja) * 2013-12-13 2017-12-06 東邦化学工業株式会社 ブロック共重合体の製造方法
JP6356096B2 (ja) * 2014-06-27 2018-07-11 ダウ グローバル テクノロジーズ エルエルシー ブロックコポリマーを製造するための方法およびそれから製造される物品
JP6122906B2 (ja) 2014-06-27 2017-04-26 ダウ グローバル テクノロジーズ エルエルシー ブロックコポリマーを製造するための方法およびそれから製造される物品
FR3025616A1 (fr) * 2014-09-10 2016-03-11 Arkema France Procede de controle du taux de defauts dans des films obtenus avec des melanges de copolymeres a blocs et de polymeres
FR3029921B1 (fr) * 2014-12-16 2018-06-29 Arkema France Procede de controle de la synthese d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct.
FR3031751B1 (fr) * 2015-01-21 2018-10-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymere a blocs
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
FR3075800B1 (fr) * 2017-12-21 2020-10-09 Arkema France Couches anti adhesives pour les procedes d'impression par transfert
CN113286833A (zh) * 2019-01-17 2021-08-20 默克专利股份有限公司 在低Tg低聚物的存在下用于形成图案的增强定向自组装
FR3101355A1 (fr) * 2019-10-01 2021-04-02 Arkema France Sous-couche neutre pour copolymère à blocs et empilement polymérique comprenant une telle sous-couche recouverte d’un film de copolymère à blocs
FR3101354A1 (fr) * 2019-10-01 2021-04-02 Arkema France Sous-couche neutre pour copolymère à blocs et empilement polymérique comprenant une telle sous-couche recouverte d’un film de copolymère à blocs

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) * 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
FR2773158B1 (fr) * 1997-12-30 2000-02-04 Atochem Elf Sa Procede de polymerisation radicalaire controlee faisant intervenir une faible quantite de radical libre stable
US6734256B1 (en) * 1998-12-29 2004-05-11 3M Innovative Properties Company Block copolymer hot-melt processable adhesives, methods of their preparation, and articles therefrom
WO2009151834A2 (en) 2008-05-08 2009-12-17 The Regents Of The University Of California Supramolecular block copolymer compositions for sub-micron lithography
FR2809829B1 (fr) * 2000-06-05 2002-07-26 Rhodia Chimie Sa Nouvelle composition photosensible pour la fabrication de photoresist
JP2002137321A (ja) * 2000-11-01 2002-05-14 Ube Ind Ltd 複合体薄膜とその製造方法
KR100595336B1 (ko) * 2001-07-18 2006-06-30 아사히 가세이 케미칼즈 가부시키가이샤 개질 블록 공중합체
US6991741B2 (en) 2001-11-30 2006-01-31 University Of Maryland Controlled room temperature synthesis of magnetic metal oxide nanoclusters within a diblock copolymer matrix
ITMI20021495A1 (it) * 2002-07-09 2002-10-08 Polimeri Europa Spa Procedimento per la preparazione di copolimeri a blocchi.
US8133534B2 (en) * 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
US8287957B2 (en) * 2004-11-22 2012-10-16 Wisconsin Alumni Research Foundation Methods and compositions for forming aperiodic patterned copolymer films
JP5136999B2 (ja) * 2005-11-18 2013-02-06 国立大学法人京都大学 パターン基板の製造方法、パターン転写体、磁気記録用パターン媒体、及び高分子薄膜
US7347953B2 (en) * 2006-02-02 2008-03-25 International Business Machines Corporation Methods for forming improved self-assembled patterns of block copolymers
JP5414011B2 (ja) * 2006-05-23 2014-02-12 国立大学法人京都大学 微細構造体、パターン媒体、及びそれらの製造方法
US7723009B2 (en) * 2006-06-02 2010-05-25 Micron Technology, Inc. Topography based patterning
US7964107B2 (en) 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
US7790350B2 (en) * 2007-07-30 2010-09-07 International Business Machines Corporation Method and materials for patterning a neutral surface
US7521094B1 (en) 2008-01-14 2009-04-21 International Business Machines Corporation Method of forming polymer features by directed self-assembly of block copolymers
US8426313B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
EP2151457A1 (en) * 2008-07-28 2010-02-10 Total Petrochemicals France Process to make a diblock copolymer having a monovinylaromatic polymer block
CA2776672A1 (en) * 2008-10-03 2010-04-08 Chamelic Ltd Ab diblock copolymers and applications for their use
JP5281386B2 (ja) * 2008-12-22 2013-09-04 株式会社日立製作所 高分子薄膜及びパターン媒体並びにこれらの製造方法
US8551566B2 (en) * 2009-02-19 2013-10-08 Massachusetts Institute Of Technology Directed material assembly
JP2010234703A (ja) * 2009-03-31 2010-10-21 Fujifilm Corp 積層体
US8834956B2 (en) * 2009-06-22 2014-09-16 Micron Technology, Inc. Methods of utilizing block copolymer to form patterns
US9299381B2 (en) 2011-02-07 2016-03-29 Wisconsin Alumni Research Foundation Solvent annealing block copolymers on patterned substrates
FR2974094A1 (fr) 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
US8513356B1 (en) 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
WO2013120052A1 (en) * 2012-02-10 2013-08-15 E. I. Du Pont De Nemours And Company Preparation, purification and use of high-x diblock copolymers
US20130209755A1 (en) 2012-02-15 2013-08-15 Phillip Dene Hustad Self-assembled structures, method of manufacture thereof and articles comprising the same
US9372398B2 (en) * 2012-03-02 2016-06-21 Wisconsin Alumni Research Foundation Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
JP5752655B2 (ja) * 2012-09-10 2015-07-22 株式会社東芝 パターン形成方法
JP5640099B2 (ja) * 2013-01-07 2014-12-10 株式会社日立製作所 微細構造を有する高分子薄膜およびパターン基板の製造方法
TWI645254B (zh) * 2013-01-14 2018-12-21 美國加利福尼亞大學董事會 具經控制之總成及提升排序之含矽嵌段共聚物之組合物

Also Published As

Publication number Publication date
US20150030971A1 (en) 2015-01-29
JP5911534B2 (ja) 2016-04-27
TW201517117A (zh) 2015-05-01
FR3008987A1 (fr) 2015-01-30
TWI595533B (zh) 2017-08-11
JP2015044981A (ja) 2015-03-12
FR3008986A1 (fr) 2015-01-30
CN105579498A (zh) 2016-05-11
JP2015187273A (ja) 2015-10-29
FR3008987B1 (fr) 2017-06-16
KR20150013070A (ko) 2015-02-04
WO2015011035A1 (en) 2015-01-29
CN105579498B (zh) 2019-06-04
US9296014B2 (en) 2016-03-29
FR3008986B1 (fr) 2016-12-30
KR101540883B1 (ko) 2015-07-30

Similar Documents

Publication Publication Date Title
SG11201600564SA (en) Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks
IL252277B (en) New polymers and methods for their preparation
TWI563007B (en) Block copolymer
IL249419B (en) Porous polymers with a nanoporous compound for water treatment
IL259867B (en) Block-copolymers that form a polyelectrolyte layer and preparations and their uses
GB201308978D0 (en) Method for producing polymers and block copolymers
GB201905378D0 (en) Polymers and process for their manufacture
ZA201601337B (en) Poly(ethylenefuranoate) copolymers and methods
ZA201605210B (en) Thermoassociative and exchangeable copolymers, and compositions comprising same
SG11201608454XA (en) Methods of controlling nanowire morphology
EP3095127A4 (en) High-chi block copolymers for directed self-assembly
AP2015008864A0 (en) Scale-inhibiting polymers and methods for controlling scale formation
GB201704242D0 (en) Fluoro-alcohol additives for orientation control of block copolymers
SG11201608076RA (en) Process for the production of polyoxymethylene block copolymers
SG11201601694XA (en) Process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers
GB201503393D0 (en) Polymers and uses thereof
GB201514506D0 (en) Multi-block copolymers
ZA201602832B (en) Process for modifying ethylene-based polymers and copolymers
ZA201701489B (en) Block copolymers which can be used as plasticisers
GB201513819D0 (en) Polymers, and methods for their production
IL247910A0 (en) New polymers and a process for preparing membranes
EP2966107A4 (en) BLOCK COPOLYMER AND MANUFACTURING METHOD THEREFOR
SG11201706512SA (en) Methods for modifying the rheology of polymers
EP2875033A4 (en) ELECTROCHROME COPOLYMERS FROM PRECURSORS, METHOD FOR THEIR PRODUCTION AND THEIR USE
PL3074435T3 (pl) Cząstki prokatalizatora i proces polimeryzacji kopolimerów udarowych