FR3031751B1 - Procede de reduction des defauts dans un film ordonne de copolymere a blocs - Google Patents

Procede de reduction des defauts dans un film ordonne de copolymere a blocs Download PDF

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Publication number
FR3031751B1
FR3031751B1 FR1550470A FR1550470A FR3031751B1 FR 3031751 B1 FR3031751 B1 FR 3031751B1 FR 1550470 A FR1550470 A FR 1550470A FR 1550470 A FR1550470 A FR 1550470A FR 3031751 B1 FR3031751 B1 FR 3031751B1
Authority
FR
France
Prior art keywords
ordinated
block copolymer
copolymer film
reducing defects
defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1550470A
Other languages
English (en)
Other versions
FR3031751A1 (fr
Inventor
Christophe Navarro
Xavier Chevalier
Celia Nicolet
Raber Inoubli
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arkema France SA
Original Assignee
Arkema France SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1550470A priority Critical patent/FR3031751B1/fr
Application filed by Arkema France SA filed Critical Arkema France SA
Priority to TW105101874A priority patent/TW201708288A/zh
Priority to KR1020177023115A priority patent/KR20170118742A/ko
Priority to US15/545,113 priority patent/US20180011399A1/en
Priority to EP16703349.7A priority patent/EP3248062A1/fr
Priority to SG11201706000RA priority patent/SG11201706000RA/en
Priority to CN201680017316.9A priority patent/CN107430332A/zh
Priority to PCT/FR2016/050115 priority patent/WO2016116707A1/fr
Priority to JP2017537909A priority patent/JP6588555B2/ja
Publication of FR3031751A1 publication Critical patent/FR3031751A1/fr
Application granted granted Critical
Publication of FR3031751B1 publication Critical patent/FR3031751B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G81/00—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
    • C08G81/02—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C08G81/021—Block or graft polymers containing only sequences of polymers of C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
FR1550470A 2015-01-21 2015-01-21 Procede de reduction des defauts dans un film ordonne de copolymere a blocs Active FR3031751B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR1550470A FR3031751B1 (fr) 2015-01-21 2015-01-21 Procede de reduction des defauts dans un film ordonne de copolymere a blocs
KR1020177023115A KR20170118742A (ko) 2015-01-21 2016-01-21 블록 공중합체로 제조된 질서화된 필름의 결함을 감소시키는 방법
US15/545,113 US20180011399A1 (en) 2015-01-21 2016-01-21 Process for Reducing the Defects in an Ordered Film of Block Copolymer
EP16703349.7A EP3248062A1 (fr) 2015-01-21 2016-01-21 Procédé de réduction des défauts dans un film ordonné de copolymère a blocs
TW105101874A TW201708288A (zh) 2015-01-21 2016-01-21 減低嵌段共聚物之有序膜中缺陷的方法
SG11201706000RA SG11201706000RA (en) 2015-01-21 2016-01-21 Method for reducing defects in an ordered film made of block copolymer
CN201680017316.9A CN107430332A (zh) 2015-01-21 2016-01-21 用于减少由嵌段共聚物制成的有序膜中的缺陷的方法
PCT/FR2016/050115 WO2016116707A1 (fr) 2015-01-21 2016-01-21 Procédé de réduction des défauts dans un film ordonné de copolymère a blocs
JP2017537909A JP6588555B2 (ja) 2015-01-21 2016-01-21 ブロックコポリマーの秩序膜中の欠陥を低減させるための方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1550470A FR3031751B1 (fr) 2015-01-21 2015-01-21 Procede de reduction des defauts dans un film ordonne de copolymere a blocs
FR1550470 2015-01-21

Publications (2)

Publication Number Publication Date
FR3031751A1 FR3031751A1 (fr) 2016-07-22
FR3031751B1 true FR3031751B1 (fr) 2018-10-05

Family

ID=52779891

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1550470A Active FR3031751B1 (fr) 2015-01-21 2015-01-21 Procede de reduction des defauts dans un film ordonne de copolymere a blocs

Country Status (9)

Country Link
US (1) US20180011399A1 (fr)
EP (1) EP3248062A1 (fr)
JP (1) JP6588555B2 (fr)
KR (1) KR20170118742A (fr)
CN (1) CN107430332A (fr)
FR (1) FR3031751B1 (fr)
SG (1) SG11201706000RA (fr)
TW (1) TW201708288A (fr)
WO (1) WO2016116707A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3031748B1 (fr) * 2015-01-21 2018-09-28 Arkema France Procede de reduction du temps d'assemblage des films ordones de copolymere a blocs
FR3075800B1 (fr) * 2017-12-21 2020-10-09 Arkema France Couches anti adhesives pour les procedes d'impression par transfert

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4127682B2 (ja) * 1999-06-07 2008-07-30 株式会社東芝 パターン形成方法
US8133534B2 (en) * 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
US8287957B2 (en) * 2004-11-22 2012-10-16 Wisconsin Alumni Research Foundation Methods and compositions for forming aperiodic patterned copolymer films
US8425982B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
US20110111170A1 (en) * 2008-05-30 2011-05-12 Canon Kabushiki Kaisha Block copolymer film and method of producing the same
FR2983773B1 (fr) 2011-12-09 2014-10-24 Arkema France Procede de preparation de surfaces
US8513356B1 (en) * 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
US8710150B2 (en) * 2012-02-10 2014-04-29 Rohm And Haas Electronic Materials Llc Blended block copolymer composition
JP5891075B2 (ja) * 2012-03-08 2016-03-22 東京応化工業株式会社 ブロックコポリマー含有組成物及びパターンの縮小方法
US9159558B2 (en) * 2013-03-15 2015-10-13 International Business Machines Corporation Methods of reducing defects in directed self-assembled structures
US20140377965A1 (en) * 2013-06-19 2014-12-25 Globalfoundries Inc. Directed self-assembly (dsa) formulations used to form dsa-based lithography films
FR3008986B1 (fr) * 2013-07-25 2016-12-30 Arkema France Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs
EP2829567B1 (fr) * 2013-07-25 2017-03-15 Arkema France Procédé pour commander la période de caractérisation de la morphologie obtenue à partir d'un mélange de copolymères séquencés et de (co)polymères d'un des blocs
JP5865340B2 (ja) * 2013-12-10 2016-02-17 キヤノン株式会社 インプリント装置及び物品の製造方法
JP5971231B2 (ja) * 2013-12-10 2016-08-17 株式会社村田製作所 コモンモードチョークコイル及びその製造方法
JP6122906B2 (ja) * 2014-06-27 2017-04-26 ダウ グローバル テクノロジーズ エルエルシー ブロックコポリマーを製造するための方法およびそれから製造される物品
JP6356096B2 (ja) * 2014-06-27 2018-07-11 ダウ グローバル テクノロジーズ エルエルシー ブロックコポリマーを製造するための方法およびそれから製造される物品

Also Published As

Publication number Publication date
TW201708288A (zh) 2017-03-01
SG11201706000RA (en) 2017-08-30
WO2016116707A1 (fr) 2016-07-28
FR3031751A1 (fr) 2016-07-22
US20180011399A1 (en) 2018-01-11
JP2018502967A (ja) 2018-02-01
EP3248062A1 (fr) 2017-11-29
CN107430332A (zh) 2017-12-01
JP6588555B2 (ja) 2019-10-09
KR20170118742A (ko) 2017-10-25

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