SG11201706000RA - Method for reducing defects in an ordered film made of block copolymer - Google Patents
Method for reducing defects in an ordered film made of block copolymerInfo
- Publication number
- SG11201706000RA SG11201706000RA SG11201706000RA SG11201706000RA SG11201706000RA SG 11201706000R A SG11201706000R A SG 11201706000RA SG 11201706000R A SG11201706000R A SG 11201706000RA SG 11201706000R A SG11201706000R A SG 11201706000RA SG 11201706000R A SG11201706000R A SG 11201706000RA
- Authority
- SG
- Singapore
- Prior art keywords
- block copolymer
- film made
- reducing defects
- ordered film
- ordered
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G81/00—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
- C08G81/02—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C08G81/021—Block or graft polymers containing only sequences of polymers of C08C or C08F
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1550470A FR3031751B1 (en) | 2015-01-21 | 2015-01-21 | METHOD OF REDUCING DEFECTS IN AN ORDINATED BLOCK COPOLYMER FILM |
| PCT/FR2016/050115 WO2016116707A1 (en) | 2015-01-21 | 2016-01-21 | Method for reducing defects in an ordered film made of block copolymer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201706000RA true SG11201706000RA (en) | 2017-08-30 |
Family
ID=52779891
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201706000RA SG11201706000RA (en) | 2015-01-21 | 2016-01-21 | Method for reducing defects in an ordered film made of block copolymer |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20180011399A1 (en) |
| EP (1) | EP3248062A1 (en) |
| JP (1) | JP6588555B2 (en) |
| KR (1) | KR20170118742A (en) |
| CN (1) | CN107430332A (en) |
| FR (1) | FR3031751B1 (en) |
| SG (1) | SG11201706000RA (en) |
| TW (1) | TW201708288A (en) |
| WO (1) | WO2016116707A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3031748B1 (en) * | 2015-01-21 | 2018-09-28 | Arkema France | METHOD FOR REDUCING THE ASSEMBLY TIME OF ORDINATED BLOCK COPOLYMER FILMS |
| FR3075800B1 (en) * | 2017-12-21 | 2020-10-09 | Arkema France | ANTI-STICK COATS FOR TRANSFER PRINTING PROCESSES |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4127682B2 (en) * | 1999-06-07 | 2008-07-30 | 株式会社東芝 | Pattern formation method |
| US8133534B2 (en) * | 2004-11-22 | 2012-03-13 | Wisconsin Alumni Research Foundation | Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials |
| US8287957B2 (en) * | 2004-11-22 | 2012-10-16 | Wisconsin Alumni Research Foundation | Methods and compositions for forming aperiodic patterned copolymer films |
| US8425982B2 (en) * | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids |
| US20110111170A1 (en) * | 2008-05-30 | 2011-05-12 | Canon Kabushiki Kaisha | Block copolymer film and method of producing the same |
| FR2983773B1 (en) | 2011-12-09 | 2014-10-24 | Arkema France | PROCESS FOR PREPARING SURFACES |
| US8710150B2 (en) * | 2012-02-10 | 2014-04-29 | Rohm And Haas Electronic Materials Llc | Blended block copolymer composition |
| US8513356B1 (en) * | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
| JP5891075B2 (en) * | 2012-03-08 | 2016-03-22 | 東京応化工業株式会社 | Block copolymer-containing composition and pattern reduction method |
| US9159558B2 (en) * | 2013-03-15 | 2015-10-13 | International Business Machines Corporation | Methods of reducing defects in directed self-assembled structures |
| US20140377965A1 (en) * | 2013-06-19 | 2014-12-25 | Globalfoundries Inc. | Directed self-assembly (dsa) formulations used to form dsa-based lithography films |
| EP2829567B1 (en) * | 2013-07-25 | 2017-03-15 | Arkema France | Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks |
| FR3008986B1 (en) * | 2013-07-25 | 2016-12-30 | Arkema France | METHOD OF CONTROLLING THE PERIOD CHARACTERIZING THE MORPHOLOGY OBTAINED FROM A MIXTURE OF BLOCK COPOLYMER AND (CO) POLYMER FROM ONE OF THE BLOCKS |
| JP5865340B2 (en) * | 2013-12-10 | 2016-02-17 | キヤノン株式会社 | Imprint apparatus and article manufacturing method |
| JP5971231B2 (en) * | 2013-12-10 | 2016-08-17 | 株式会社村田製作所 | Common mode choke coil and manufacturing method thereof |
| JP6356096B2 (en) * | 2014-06-27 | 2018-07-11 | ダウ グローバル テクノロジーズ エルエルシー | Process for producing block copolymers and articles produced therefrom |
| JP6122906B2 (en) * | 2014-06-27 | 2017-04-26 | ダウ グローバル テクノロジーズ エルエルシー | Process for producing block copolymers and articles produced therefrom |
-
2015
- 2015-01-21 FR FR1550470A patent/FR3031751B1/en active Active
-
2016
- 2016-01-21 JP JP2017537909A patent/JP6588555B2/en active Active
- 2016-01-21 US US15/545,113 patent/US20180011399A1/en not_active Abandoned
- 2016-01-21 EP EP16703349.7A patent/EP3248062A1/en not_active Withdrawn
- 2016-01-21 KR KR1020177023115A patent/KR20170118742A/en not_active Application Discontinuation
- 2016-01-21 SG SG11201706000RA patent/SG11201706000RA/en unknown
- 2016-01-21 WO PCT/FR2016/050115 patent/WO2016116707A1/en active Application Filing
- 2016-01-21 CN CN201680017316.9A patent/CN107430332A/en active Pending
- 2016-01-21 TW TW105101874A patent/TW201708288A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20170118742A (en) | 2017-10-25 |
| FR3031751B1 (en) | 2018-10-05 |
| JP2018502967A (en) | 2018-02-01 |
| FR3031751A1 (en) | 2016-07-22 |
| EP3248062A1 (en) | 2017-11-29 |
| JP6588555B2 (en) | 2019-10-09 |
| WO2016116707A1 (en) | 2016-07-28 |
| CN107430332A (en) | 2017-12-01 |
| US20180011399A1 (en) | 2018-01-11 |
| TW201708288A (en) | 2017-03-01 |
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