SG11201804695VA - Process for reducing the structuring time of ordered films of block copolymer - Google Patents

Process for reducing the structuring time of ordered films of block copolymer

Info

Publication number
SG11201804695VA
SG11201804695VA SG11201804695VA SG11201804695VA SG11201804695VA SG 11201804695V A SG11201804695V A SG 11201804695VA SG 11201804695V A SG11201804695V A SG 11201804695VA SG 11201804695V A SG11201804695V A SG 11201804695VA SG 11201804695V A SG11201804695V A SG 11201804695VA
Authority
SG
Singapore
Prior art keywords
reducing
block copolymer
ordered films
structuring time
structuring
Prior art date
Application number
SG11201804695VA
Inventor
Christophe Navarro
Celia Nicolet
Xavier Chevalier
Original Assignee
Arkema France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France filed Critical Arkema France
Publication of SG11201804695VA publication Critical patent/SG11201804695VA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/04—Polymerisation in solution
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00—Polymerisation catalysts
    • C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
    • C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
    • C08F4/60—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides together with refractory metals, iron group metals, platinum group metals, manganese, rhenium technetium or compounds thereof
    • C08F4/607—Catalysts containing a specific non-metal or metal-free compound
    • C08F4/609—Catalysts containing a specific non-metal or metal-free compound organic
    • C08F4/6097—Catalysts containing a specific non-metal or metal-free compound organic containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00—Applications
    • C08L2203/16—Applications used for films
SG11201804695VA 2015-12-18 2016-12-16 Process for reducing the structuring time of ordered films of block copolymer SG11201804695VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1562776A FR3045642A1 (en) 2015-12-18 2015-12-18 METHOD FOR REDUCING THE STRUCTURING TIME OF ORDINATED BLOCK COPOLYMER FILMS
PCT/EP2016/081373 WO2017103062A1 (en) 2015-12-18 2016-12-16 Process for reducing the structuring time of ordered films of block copolymer

Publications (1)

Publication Number Publication Date
SG11201804695VA true SG11201804695VA (en) 2018-07-30

Family

ID=55451375

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201804695VA SG11201804695VA (en) 2015-12-18 2016-12-16 Process for reducing the structuring time of ordered films of block copolymer

Country Status (9)

Country Link
US (1) US20190002684A1 (en)
EP (1) EP3391142A1 (en)
JP (1) JP2019500457A (en)
KR (1) KR20180096711A (en)
CN (1) CN108475009A (en)
FR (1) FR3045642A1 (en)
SG (1) SG11201804695VA (en)
TW (1) TW201736451A (en)
WO (1) WO2017103062A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3045644A1 (en) * 2015-12-18 2017-06-23 Arkema France PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER
FR3045645B1 (en) * 2015-12-18 2019-07-05 Arkema France METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM
FR3045643A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR ENHANCING THE CRITICAL DIMENSIONAL UNIFORMITY OF ORDINATED BLOCK COPOLYMER FILMS

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8193285B2 (en) * 2006-05-16 2012-06-05 Nippon Soda Co., Ltd. Block copolymers
US8398868B2 (en) * 2009-05-19 2013-03-19 International Business Machines Corporation Directed self-assembly of block copolymers using segmented prepatterns
JP2010283928A (en) * 2009-06-02 2010-12-16 Kuraray Co Ltd Polymer transducer
US8349203B2 (en) * 2009-09-04 2013-01-08 International Business Machines Corporation Method of forming self-assembled patterns using block copolymers, and articles thereof
US8304493B2 (en) * 2010-08-20 2012-11-06 Micron Technology, Inc. Methods of forming block copolymers
US9580534B2 (en) * 2011-07-29 2017-02-28 Wisconsin Alumni Research Foundation Block copolymer materials for directed assembly of thin films
FR2983773B1 (en) * 2011-12-09 2014-10-24 Arkema France PROCESS FOR PREPARING SURFACES
JP5894445B2 (en) * 2012-01-23 2016-03-30 東京エレクトロン株式会社 Etching method and etching apparatus
US8513356B1 (en) * 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
US9005877B2 (en) * 2012-05-15 2015-04-14 Tokyo Electron Limited Method of forming patterns using block copolymers and articles thereof
US9012545B2 (en) * 2012-08-31 2015-04-21 Rohm And Haas Electronic Materials Llc Composition and method for preparing pattern on a substrate
CN104918984A (en) * 2012-10-31 2015-09-16 陶氏环球技术有限责任公司 Nanocomposites of copolymers and dielectric materials
FR3008413B1 (en) * 2013-07-11 2015-08-07 Arkema France PROCESS FOR PERPENDICULAR ORIENTATION OF NANODOMAINES OF BLOCK COPOLYMERS USING STATISTICAL OR GRADIENT COPOLYMERS WHERE THE MONOMERS ARE AT LEAST DIFFERENT FROM THOSE PRESENT SPECIFICALLY IN EACH BLOCK OF BLOCK COPOLYMER
FR3008986B1 (en) * 2013-07-25 2016-12-30 Arkema France METHOD OF CONTROLLING THE PERIOD CHARACTERIZING THE MORPHOLOGY OBTAINED FROM A MIXTURE OF BLOCK COPOLYMER AND (CO) POLYMER FROM ONE OF THE BLOCKS
FR3014877B1 (en) * 2013-12-17 2017-03-31 Arkema France METHOD FOR NANOSTRUCTURING A BLOCK COPOLYMER FILM FROM A NON-STRUCTURED BLOCK COPOLYMER BASED ON STYRENE AND METHYL METHACRYLATE, AND NANOSTRUCTURE BLOCK COPOLYMER FILM
KR102364329B1 (en) * 2014-01-16 2022-02-17 브레우어 사이언스, 인코포레이션 High-chi block copolymers for directed self-assembly
FR3022249B1 (en) * 2014-06-11 2018-01-19 Arkema France METHOD FOR CONTROLLING THE PERIOD OF A NANOSTRUCTUE BLOCK COPOLYMER FILM BASED ON STYRENE AND METHYL METHACRYLATE, AND NANOSTRUCTURE BLOCK COPOLYMER FILM
FR3045645B1 (en) * 2015-12-18 2019-07-05 Arkema France METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM
FR3045644A1 (en) * 2015-12-18 2017-06-23 Arkema France PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER
FR3045643A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR ENHANCING THE CRITICAL DIMENSIONAL UNIFORMITY OF ORDINATED BLOCK COPOLYMER FILMS

Also Published As

Publication number Publication date
CN108475009A (en) 2018-08-31
KR20180096711A (en) 2018-08-29
WO2017103062A1 (en) 2017-06-22
US20190002684A1 (en) 2019-01-03
FR3045642A1 (en) 2017-06-23
JP2019500457A (en) 2019-01-10
EP3391142A1 (en) 2018-10-24
TW201736451A (en) 2017-10-16

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