SG11201709707TA - Method for reducing the defectivity of a block copolymer film - Google Patents

Method for reducing the defectivity of a block copolymer film

Info

Publication number
SG11201709707TA
SG11201709707TA SG11201709707TA SG11201709707TA SG11201709707TA SG 11201709707T A SG11201709707T A SG 11201709707TA SG 11201709707T A SG11201709707T A SG 11201709707TA SG 11201709707T A SG11201709707T A SG 11201709707TA SG 11201709707T A SG11201709707T A SG 11201709707TA
Authority
SG
Singapore
Prior art keywords
defectivity
reducing
block copolymer
copolymer film
film
Prior art date
Application number
SG11201709707TA
Inventor
Xavier Chevalier
Celia Nicolet
Christophe Navarro
Georges Hadziioannou
Original Assignee
Arkema France
Inst Polytechnique Bordeaux
Univ Bordeaux
Centre Nat Rech Scient
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France, Inst Polytechnique Bordeaux, Univ Bordeaux, Centre Nat Rech Scient filed Critical Arkema France
Publication of SG11201709707TA publication Critical patent/SG11201709707TA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/005—Modified block copolymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10—Definition of the polymer structure
    • C08G2261/12—Copolymers
    • C08G2261/126—Copolymers block
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10—Definition of the polymer structure
    • C08G2261/13—Morphological aspects
    • C08G2261/136—Comb-like structures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10—Definition of the polymer structure
    • C08G2261/14—Side-groups
    • C08G2261/142—Side-chains containing oxygen
    • C08G2261/1426—Side-chains containing oxygen containing carboxy groups (COOH) and/or -C(=O)O-moieties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10—Definition of the polymer structure
    • C08G2261/14—Side-groups
    • C08G2261/146—Side-chains containing halogens
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00—Applications
    • C08L2203/16—Applications used for films
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/20—Arrangements or instruments for measuring magnetic variables involving magnetic resonance
    • G01R33/44—Arrangements or instruments for measuring magnetic variables involving magnetic resonance using nuclear magnetic resonance [NMR]
    • G01R33/46—NMR spectroscopy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Laminated Bodies (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
SG11201709707TA 2015-06-02 2016-05-26 Method for reducing the defectivity of a block copolymer film SG11201709707TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1554983A FR3037071B1 (en) 2015-06-02 2015-06-02 METHOD FOR REDUCING THE DEFECTIVITY OF A BLOCK COPOLYMER FILM
PCT/FR2016/051251 WO2016193581A1 (en) 2015-06-02 2016-05-26 Method for reducing the defectivity of a block copolymer film

Publications (1)

Publication Number Publication Date
SG11201709707TA true SG11201709707TA (en) 2017-12-28

Family

ID=54007853

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201709707TA SG11201709707TA (en) 2015-06-02 2016-05-26 Method for reducing the defectivity of a block copolymer film

Country Status (9)

Country Link
US (1) US20180171134A1 (en)
EP (1) EP3304200A1 (en)
JP (1) JP2018516301A (en)
KR (1) KR20180005224A (en)
CN (1) CN107850836A (en)
FR (1) FR3037071B1 (en)
SG (1) SG11201709707TA (en)
TW (1) TW201702077A (en)
WO (1) WO2016193581A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG194779A1 (en) 2011-05-04 2013-12-30 Univ Cornell Multiblock copolymer films, methods of making same, and uses thereof
KR102308085B1 (en) 2016-04-28 2021-10-06 테라포어 테크놀로지스, 인코포레이티드 Charged Isoporous Materials for Electrostatic Separation
US11401411B2 (en) 2016-11-17 2022-08-02 Terapore Technologies, Inc. Isoporous self-assembled block copolymer films containing high molecular weight hydrophilic additives and methods of making the same
WO2018156731A1 (en) 2017-02-22 2018-08-30 Dorin Rachel M Ligand bound mbp membranes, uses and method of manufacturing
CA3062637A1 (en) 2017-05-12 2018-11-15 Terapore Technologies, Inc. Chemically resistant fluorinated multiblock polymer structures, methods of manufacturing and use
FR3069339B1 (en) * 2017-07-21 2021-05-14 Arkema France METHOD OF CHECKING THE ORIENTATION OF THE NANO-DOMAINS OF A BLOCK COPOLYMER
SG11202002333SA (en) 2017-09-19 2020-04-29 Terapore Tech Inc Chemically resistant isoporous crosslinked block copolymer structure
FR3074180B1 (en) 2017-11-24 2021-01-01 Arkema France METHOD OF CHECKING THE FLATNESS OF A POLYMERIC STACK
FR3074179B1 (en) 2017-11-24 2021-01-01 Arkema France METHOD OF CHECKING THE FLATNESS OF A POLYMERIC STACK
SG11202008678TA (en) 2018-03-12 2020-10-29 Terapore Tech Inc Isoporous mesoporous asymmetric block copolymer materials with macrovoids and method of making the same
FR3096281A1 (en) 2019-05-20 2020-11-27 Université De Bordeaux process for preparing a block copolymer film for creating a nanolithography mask

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2735480B1 (en) 1995-06-15 1997-07-18 Atochem Elf Sa CONTINUOUS ANIONIC POLYMERIZATION PROCESS OF AT LEAST ONE (METH) ACRYLIC MONOMER FOR THE OBTAINING OF POLYMERS WITH A HIGH SOLID RATE
US20130208497A1 (en) 2010-04-05 2013-08-15 University Of Utah Research Foundation Infusion line identification lighting system
CN101837950B (en) * 2010-05-24 2012-09-05 山东大学 Device and method for assembling nanostructure directly by using two-block copolymer
KR101963924B1 (en) * 2011-07-29 2019-03-29 위스콘신 얼럼나이 리서어치 화운데이션 Block copolymer materials for directed assembly of thin films
WO2013040483A1 (en) * 2011-09-15 2013-03-21 Wisconsin Alumni Research Foundation Directed assembly of block copolymer films between a chemically patterned surface and a second surface
CN104303103B (en) * 2012-02-10 2019-04-26 得克萨斯大学体系董事会 The finishing coat of the acid anhydride copolymer of tropism control for film block copolymer
US20140065379A1 (en) * 2012-08-31 2014-03-06 Wisconsin Alumni Research Foundation Topcoat surfaces for directing the assembly of block copolymer films on chemically patterned surfaces
JP5758363B2 (en) * 2012-09-07 2015-08-05 株式会社東芝 Pattern formation method
JP6027912B2 (en) * 2013-02-22 2016-11-16 東京応化工業株式会社 Method of manufacturing structure including phase separation structure, pattern forming method, and topcoat material
WO2014169102A1 (en) * 2013-04-10 2014-10-16 Kla-Tencor Corporation Direct self assembly in target design and production
US9153457B2 (en) * 2013-06-14 2015-10-06 Tokyo Electron Limited Etch process for reducing directed self assembly pattern defectivity using direct current positioning
US9382444B2 (en) * 2013-06-24 2016-07-05 Dow Global Technologies Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same
US9802400B2 (en) * 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
CN104370274B (en) * 2014-11-10 2016-09-28 中国科学院长春应用化学研究所 The guiding assemble method of nanostructured

Also Published As

Publication number Publication date
KR20180005224A (en) 2018-01-15
FR3037071A1 (en) 2016-12-09
FR3037071B1 (en) 2019-06-21
CN107850836A (en) 2018-03-27
US20180171134A1 (en) 2018-06-21
WO2016193581A1 (en) 2016-12-08
TW201702077A (en) 2017-01-16
EP3304200A1 (en) 2018-04-11
JP2018516301A (en) 2018-06-21

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