SG11201804781VA - Process for improving the critical dimension uniformity of ordered films of block copolymer - Google Patents
Process for improving the critical dimension uniformity of ordered films of block copolymerInfo
- Publication number
- SG11201804781VA SG11201804781VA SG11201804781VA SG11201804781VA SG11201804781VA SG 11201804781V A SG11201804781V A SG 11201804781VA SG 11201804781V A SG11201804781V A SG 11201804781VA SG 11201804781V A SG11201804781V A SG 11201804781VA SG 11201804781V A SG11201804781V A SG 11201804781VA
- Authority
- SG
- Singapore
- Prior art keywords
- improving
- block copolymer
- critical dimension
- dimension uniformity
- ordered films
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Graft Or Block Polymers (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1562779A FR3045643A1 (en) | 2015-12-18 | 2015-12-18 | METHOD FOR ENHANCING THE CRITICAL DIMENSIONAL UNIFORMITY OF ORDINATED BLOCK COPOLYMER FILMS |
PCT/EP2016/081386 WO2017103073A1 (en) | 2015-12-18 | 2016-12-16 | Process for improving the critical dimension uniformity of ordered films of block copolymer |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201804781VA true SG11201804781VA (en) | 2018-07-30 |
Family
ID=55451377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201804781VA SG11201804781VA (en) | 2015-12-18 | 2016-12-16 | Process for improving the critical dimension uniformity of ordered films of block copolymer |
Country Status (9)
Country | Link |
---|---|
US (1) | US20180371145A1 (en) |
EP (1) | EP3391141A1 (en) |
JP (1) | JP2019505614A (en) |
KR (1) | KR20180096725A (en) |
CN (1) | CN108369374A (en) |
FR (1) | FR3045643A1 (en) |
SG (1) | SG11201804781VA (en) |
TW (1) | TW201734101A (en) |
WO (1) | WO2017103073A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3045645B1 (en) * | 2015-12-18 | 2019-07-05 | Arkema France | METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM |
FR3045642A1 (en) * | 2015-12-18 | 2017-06-23 | Arkema France | METHOD FOR REDUCING THE STRUCTURING TIME OF ORDINATED BLOCK COPOLYMER FILMS |
FR3045644A1 (en) * | 2015-12-18 | 2017-06-23 | Arkema France | PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101046551B1 (en) * | 2006-05-16 | 2011-07-05 | 닛뽕소다 가부시키가이샤 | Block copolymers |
US8398868B2 (en) * | 2009-05-19 | 2013-03-19 | International Business Machines Corporation | Directed self-assembly of block copolymers using segmented prepatterns |
JP2010283928A (en) * | 2009-06-02 | 2010-12-16 | Kuraray Co Ltd | Polymer transducer |
US8349203B2 (en) * | 2009-09-04 | 2013-01-08 | International Business Machines Corporation | Method of forming self-assembled patterns using block copolymers, and articles thereof |
US8304493B2 (en) * | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
JP6218241B2 (en) * | 2011-07-29 | 2017-10-25 | ウィスコンシン・アルムナイ・リサーチ・ファウンデーションWisconsin Alumni Research Foundation | Method for preparing block copolymer materials for inductive organization of thin films, and compositions and structures having block copolymers |
FR2983773B1 (en) * | 2011-12-09 | 2014-10-24 | Arkema France | PROCESS FOR PREPARING SURFACES |
JP5894445B2 (en) * | 2012-01-23 | 2016-03-30 | 東京エレクトロン株式会社 | Etching method and etching apparatus |
US8513356B1 (en) * | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
US9005877B2 (en) * | 2012-05-15 | 2015-04-14 | Tokyo Electron Limited | Method of forming patterns using block copolymers and articles thereof |
US9012545B2 (en) * | 2012-08-31 | 2015-04-21 | Rohm And Haas Electronic Materials Llc | Composition and method for preparing pattern on a substrate |
WO2014070431A1 (en) * | 2012-10-31 | 2014-05-08 | Dow Global Technologies Llc | Nanocomposites of copolymers and dielectric materials |
FR3008413B1 (en) * | 2013-07-11 | 2015-08-07 | Arkema France | PROCESS FOR PERPENDICULAR ORIENTATION OF NANODOMAINES OF BLOCK COPOLYMERS USING STATISTICAL OR GRADIENT COPOLYMERS WHERE THE MONOMERS ARE AT LEAST DIFFERENT FROM THOSE PRESENT SPECIFICALLY IN EACH BLOCK OF BLOCK COPOLYMER |
FR3008986B1 (en) * | 2013-07-25 | 2016-12-30 | Arkema France | METHOD OF CONTROLLING THE PERIOD CHARACTERIZING THE MORPHOLOGY OBTAINED FROM A MIXTURE OF BLOCK COPOLYMER AND (CO) POLYMER FROM ONE OF THE BLOCKS |
FR3014877B1 (en) * | 2013-12-17 | 2017-03-31 | Arkema France | METHOD FOR NANOSTRUCTURING A BLOCK COPOLYMER FILM FROM A NON-STRUCTURED BLOCK COPOLYMER BASED ON STYRENE AND METHYL METHACRYLATE, AND NANOSTRUCTURE BLOCK COPOLYMER FILM |
CN106104754B (en) * | 2014-01-16 | 2020-07-28 | 布鲁尔科技公司 | High CHI block copolymers for direct self-assembly |
FR3022249B1 (en) * | 2014-06-11 | 2018-01-19 | Arkema France | METHOD FOR CONTROLLING THE PERIOD OF A NANOSTRUCTUE BLOCK COPOLYMER FILM BASED ON STYRENE AND METHYL METHACRYLATE, AND NANOSTRUCTURE BLOCK COPOLYMER FILM |
FR3045644A1 (en) * | 2015-12-18 | 2017-06-23 | Arkema France | PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER |
FR3045642A1 (en) * | 2015-12-18 | 2017-06-23 | Arkema France | METHOD FOR REDUCING THE STRUCTURING TIME OF ORDINATED BLOCK COPOLYMER FILMS |
FR3045645B1 (en) * | 2015-12-18 | 2019-07-05 | Arkema France | METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM |
-
2015
- 2015-12-18 FR FR1562779A patent/FR3045643A1/en active Pending
-
2016
- 2016-12-16 SG SG11201804781VA patent/SG11201804781VA/en unknown
- 2016-12-16 KR KR1020187020749A patent/KR20180096725A/en not_active Application Discontinuation
- 2016-12-16 US US16/062,460 patent/US20180371145A1/en not_active Abandoned
- 2016-12-16 EP EP16809860.6A patent/EP3391141A1/en not_active Withdrawn
- 2016-12-16 JP JP2018530695A patent/JP2019505614A/en active Pending
- 2016-12-16 WO PCT/EP2016/081386 patent/WO2017103073A1/en active Application Filing
- 2016-12-16 TW TW105141869A patent/TW201734101A/en unknown
- 2016-12-16 CN CN201680073958.0A patent/CN108369374A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
FR3045643A1 (en) | 2017-06-23 |
KR20180096725A (en) | 2018-08-29 |
JP2019505614A (en) | 2019-02-28 |
TW201734101A (en) | 2017-10-01 |
CN108369374A (en) | 2018-08-03 |
WO2017103073A1 (en) | 2017-06-22 |
US20180371145A1 (en) | 2018-12-27 |
EP3391141A1 (en) | 2018-10-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IL284877B (en) | Plasma-based films and methods for making and using the same | |
SG10201510078QA (en) | Hardware and process for film uniformity improvement | |
EP3107660A4 (en) | Method and apparatus for forming articles with non-uniform coatings | |
SG11201705983VA (en) | Polymerization process in the presence of antistatic agent | |
SG11201709707TA (en) | Method for reducing the defectivity of a block copolymer film | |
SG10201706631XA (en) | Method for measuring the thickness of flat workpieces | |
HK1244497A1 (en) | Process for Coating of Articles | |
IL249664B (en) | Process for the generation of thin inorganic films | |
IL250145B (en) | Process for the generation of thin inorganic films | |
GB2580236B (en) | Apparatus for treating runoff | |
IL266186A (en) | Process for the generation of thin silicon-containing films | |
SG11201708617YA (en) | Polymerization process | |
IL246810A0 (en) | Process for the generation of thin inorganic films | |
SG11201804782WA (en) | Process for reducing defects in an ordered film of block copolymers | |
HUE064042T2 (en) | Formed films and apparatus for manufacturing same | |
GB201509082D0 (en) | Coating process | |
SG11201803414TA (en) | Olefin polymerization process in the presence of antistatic composition | |
SG11201804781VA (en) | Process for improving the critical dimension uniformity of ordered films of block copolymer | |
IL259109A (en) | Process for the generation of metallic films | |
SG11202000892XA (en) | Polymerization process | |
SG11201804695VA (en) | Process for reducing the structuring time of ordered films of block copolymer | |
SG11201705896UA (en) | Method for improving the critical dimension uniformity of ordered films of block copolymers | |
SG11201708227WA (en) | Process for modifying polymers | |
IL259154B (en) | Process for the generation of thin inorganic films | |
IL259068A (en) | Process for the generation of thin inorganic films |