SG11201601694XA - Process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers - Google Patents

Process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers

Info

Publication number
SG11201601694XA
SG11201601694XA SG11201601694XA SG11201601694XA SG11201601694XA SG 11201601694X A SG11201601694X A SG 11201601694XA SG 11201601694X A SG11201601694X A SG 11201601694XA SG 11201601694X A SG11201601694X A SG 11201601694XA SG 11201601694X A SG11201601694X A SG 11201601694XA
Authority
SG
Singapore
Prior art keywords
nanostructured
assemblage
blend
period
controlling
Prior art date
Application number
SG11201601694XA
Inventor
Christophe Navarro
Xavier Chevalier
Celia Nicolet
Ilias Iliopoulos
Raluca Tiron
Guillaume Fleury
Georges Hadziioannou
Original Assignee
Arkema France
Centre Nat Rech Scient
Univ Bordeaux
Inst Polytechnique Bordeaux
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR1358625A external-priority patent/FR3010411B1/en
Application filed by Arkema France, Centre Nat Rech Scient, Univ Bordeaux, Inst Polytechnique Bordeaux filed Critical Arkema France
Publication of SG11201601694XA publication Critical patent/SG11201601694XA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/007—After-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/003—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor characterised by the choice of material
    • B29C39/006—Monomers or prepolymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2025/00—Use of polymers of vinyl-aromatic compounds or derivatives thereof as moulding material
    • B29K2025/04—Polymers of styrene
    • B29K2025/08—Copolymers of styrene, e.g. AS or SAN, i.e. acrylonitrile styrene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2033/00—Use of polymers of unsaturated acids or derivatives thereof as moulding material
    • B29K2033/04—Polymers of esters
    • B29K2033/12—Polymers of methacrylic acid esters, e.g. PMMA, i.e. polymethylmethacrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2096/00—Use of specified macromolecular materials not provided for in a single one of main groups B29K2001/00 - B29K2095/00, as moulding material
    • B29K2096/04—Block polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0085—Copolymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
    • B29K2995/0037—Other properties
    • B29K2995/0088—Molecular weight
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2007/00—Flat articles, e.g. films or sheets
    • B29L2007/008—Wide strips, e.g. films, webs
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend
SG11201601694XA 2013-09-09 2014-09-05 Process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers SG11201601694XA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1358625A FR3010411B1 (en) 2013-09-09 2013-09-09 METHOD FOR CONTROLLING THE PERIOD OF A NANO-STRUCTURE ASSEMBLY COMPRISING A MIXTURE OF BLOCK COPOLYMERS
FR1451491A FR3010413B1 (en) 2013-09-09 2014-02-25 METHOD FOR CONTROLLING THE PERIOD OF A NANO-STRUCTURE ASSEMBLY COMPRISING A MIXTURE OF BLOCK COPOLYMERS
PCT/EP2014/068928 WO2015032890A1 (en) 2013-09-09 2014-09-05 Process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers

Publications (1)

Publication Number Publication Date
SG11201601694XA true SG11201601694XA (en) 2016-04-28

Family

ID=51483329

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201601694XA SG11201601694XA (en) 2013-09-09 2014-09-05 Process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers

Country Status (10)

Country Link
US (1) US20150073096A1 (en)
EP (1) EP2845887B1 (en)
JP (2) JP6419494B2 (en)
KR (1) KR20150029600A (en)
CN (1) CN105722927B (en)
ES (1) ES2894835T3 (en)
FR (1) FR3010413B1 (en)
SG (1) SG11201601694XA (en)
TW (1) TWI622610B (en)
WO (1) WO2015032890A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3032712A1 (en) * 2015-02-18 2016-08-19 Arkema France PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER
FR3032714A1 (en) * 2015-02-18 2016-08-19 Arkema France METHOD FOR REDUCING THE TIME OF ASSEMBLY OF ORDERED BLOCK COPOLYMER FILMS
FR3032713A1 (en) * 2015-02-18 2016-08-19 Arkema France METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM
WO2016149394A1 (en) * 2015-03-17 2016-09-22 President And Fellows Of Harvard College Automated membrane fabrication system
JP6974459B2 (en) * 2016-11-30 2021-12-01 エルジー・ケム・リミテッド Polymer composition
WO2018101741A1 (en) 2016-11-30 2018-06-07 주식회사 엘지화학 Laminate
KR102088444B1 (en) * 2016-11-30 2020-03-12 주식회사 엘지화학 Polymer copolymer
CN111341658A (en) * 2020-02-05 2020-06-26 中国科学院微电子研究所 Layer patterning method, semiconductor device, integrated circuit, and electronic apparatus
CN113736207B (en) * 2021-08-17 2023-05-02 复旦大学 Multi-component surface organic-inorganic composite nano particle, preparation method and application

Family Cites Families (17)

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Publication number Priority date Publication date Assignee Title
FR2679237B1 (en) 1991-07-19 1994-07-22 Atochem PRIMING SYSTEM FOR THE ANIONIC POLYMERIZATION OF (METH) ACRYLIC MONOMERS.
FR2735480B1 (en) 1995-06-15 1997-07-18 Atochem Elf Sa CONTINUOUS ANIONIC POLYMERIZATION PROCESS OF AT LEAST ONE (METH) ACRYLIC MONOMER FOR THE OBTAINING OF POLYMERS WITH A HIGH SOLID RATE
FR2773158B1 (en) * 1997-12-30 2000-02-04 Atochem Elf Sa METHOD OF CONTROLLED RADICAL POLYMERIZATION INVOLVING A LOW QUANTITY OF STABLE FREE RADICAL
WO2009151834A2 (en) * 2008-05-08 2009-12-17 The Regents Of The University Of California Supramolecular block copolymer compositions for sub-micron lithography
US20110097559A1 (en) * 1999-03-30 2011-04-28 Hawker Craig J Supramolecular block copolymer compositions for sub-micron lithography
US6991741B2 (en) * 2001-11-30 2006-01-31 University Of Maryland Controlled room temperature synthesis of magnetic metal oxide nanoclusters within a diblock copolymer matrix
WO2006112887A2 (en) * 2004-11-22 2006-10-26 Wisconsin Alumni Research Foundation Methods and compositions for forming aperiodic patterned copolymer films
US20080312377A1 (en) * 2005-12-16 2008-12-18 Arkema, Inc. Low Surface Energy Block Copolymer Preparation Methods and Applications
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
US7732533B2 (en) * 2007-08-31 2010-06-08 Micron Technology, Inc. Zwitterionic block copolymers and methods
US7521094B1 (en) * 2008-01-14 2009-04-21 International Business Machines Corporation Method of forming polymer features by directed self-assembly of block copolymers
JP5281386B2 (en) * 2008-12-22 2013-09-04 株式会社日立製作所 Polymer thin film, patterned medium, and production method thereof
US9299381B2 (en) * 2011-02-07 2016-03-29 Wisconsin Alumni Research Foundation Solvent annealing block copolymers on patterned substrates
FR2974072B1 (en) 2011-04-15 2014-06-13 Oreal DEVICE FOR STORING AND DISTRIBUTING PRODUCTS WITH SEVERAL COMPARTMENTS
US8710150B2 (en) * 2012-02-10 2014-04-29 Rohm And Haas Electronic Materials Llc Blended block copolymer composition
US8961918B2 (en) * 2012-02-10 2015-02-24 Rohm And Haas Electronic Materials Llc Thermal annealing process
US8513356B1 (en) * 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition

Also Published As

Publication number Publication date
KR20150029600A (en) 2015-03-18
US20150073096A1 (en) 2015-03-12
ES2894835T3 (en) 2022-02-16
FR3010413A1 (en) 2015-03-13
JP6419494B2 (en) 2018-11-07
JP2018066005A (en) 2018-04-26
TW201522441A (en) 2015-06-16
WO2015032890A1 (en) 2015-03-12
CN105722927B (en) 2020-12-22
JP2015061905A (en) 2015-04-02
TWI622610B (en) 2018-05-01
FR3010413B1 (en) 2015-09-25
EP2845887A1 (en) 2015-03-11
CN105722927A (en) 2016-06-29
EP2845887B1 (en) 2021-07-28

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