SG11201600564SA - Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks - Google Patents
Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocksInfo
- Publication number
- SG11201600564SA SG11201600564SA SG11201600564SA SG11201600564SA SG11201600564SA SG 11201600564S A SG11201600564S A SG 11201600564SA SG 11201600564S A SG11201600564S A SG 11201600564SA SG 11201600564S A SG11201600564S A SG 11201600564SA SG 11201600564S A SG11201600564S A SG 11201600564SA
- Authority
- SG
- Singapore
- Prior art keywords
- blend
- polymers
- blocks
- controlling
- block copolymers
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
- B05D3/0453—After-treatment
- B05D3/046—Curing or evaporating the solvent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/001—Multistage polymerisation processes characterised by a change in reactor conditions without deactivating the intermediate polymer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Graft Or Block Polymers (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1357333A FR3008986B1 (fr) | 2013-07-25 | 2013-07-25 | Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs |
US201361879899P | 2013-09-19 | 2013-09-19 | |
FR1451490A FR3008987B1 (fr) | 2013-07-25 | 2014-02-25 | Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs |
PCT/EP2014/065468 WO2015011035A1 (fr) | 2013-07-25 | 2014-07-18 | Procédé permettant de régler la période caractérisant la morphologie obtenue à partir d'un mélange de copolymères séquencés et de polymères ou copolymères de l'une des séquences |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201600564SA true SG11201600564SA (en) | 2016-03-30 |
Family
ID=49322637
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201600564SA SG11201600564SA (en) | 2013-07-25 | 2014-07-18 | Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks |
Country Status (8)
Country | Link |
---|---|
US (1) | US9296014B2 (fr) |
JP (2) | JP5911534B2 (fr) |
KR (1) | KR101540883B1 (fr) |
CN (1) | CN105579498B (fr) |
FR (2) | FR3008986B1 (fr) |
SG (1) | SG11201600564SA (fr) |
TW (1) | TWI595533B (fr) |
WO (1) | WO2015011035A1 (fr) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6243213B2 (ja) * | 2013-12-13 | 2017-12-06 | 東邦化学工業株式会社 | ブロック共重合体の製造方法 |
JP6356096B2 (ja) * | 2014-06-27 | 2018-07-11 | ダウ グローバル テクノロジーズ エルエルシー | ブロックコポリマーを製造するための方法およびそれから製造される物品 |
JP6122906B2 (ja) | 2014-06-27 | 2017-04-26 | ダウ グローバル テクノロジーズ エルエルシー | ブロックコポリマーを製造するための方法およびそれから製造される物品 |
FR3025616A1 (fr) * | 2014-09-10 | 2016-03-11 | Arkema France | Procede de controle du taux de defauts dans des films obtenus avec des melanges de copolymeres a blocs et de polymeres |
FR3029921B1 (fr) * | 2014-12-16 | 2018-06-29 | Arkema France | Procede de controle de la synthese d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct. |
FR3031751B1 (fr) * | 2015-01-21 | 2018-10-05 | Arkema France | Procede de reduction des defauts dans un film ordonne de copolymere a blocs |
FR3045642A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs |
FR3045645B1 (fr) * | 2015-12-18 | 2019-07-05 | Arkema France | Procede de reduction des defauts dans un film ordonne de copolymeres a blocs |
FR3045643A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs |
FR3045644A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs |
FR3075800B1 (fr) * | 2017-12-21 | 2020-10-09 | Arkema France | Couches anti adhesives pour les procedes d'impression par transfert |
TWI832955B (zh) * | 2019-01-17 | 2024-02-21 | 德商馬克專利公司 | 在低玻璃轉移溫度(Tg)寡聚物存在下用於形成圖案的增強定向自組裝 |
FR3101355A1 (fr) * | 2019-10-01 | 2021-04-02 | Arkema France | Sous-couche neutre pour copolymère à blocs et empilement polymérique comprenant une telle sous-couche recouverte d’un film de copolymère à blocs |
FR3101354A1 (fr) * | 2019-10-01 | 2021-04-02 | Arkema France | Sous-couche neutre pour copolymère à blocs et empilement polymérique comprenant une telle sous-couche recouverte d’un film de copolymère à blocs |
Family Cites Families (35)
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FR2679237B1 (fr) | 1991-07-19 | 1994-07-22 | Atochem | Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques. |
FR2735480B1 (fr) * | 1995-06-15 | 1997-07-18 | Atochem Elf Sa | Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide |
FR2773158B1 (fr) * | 1997-12-30 | 2000-02-04 | Atochem Elf Sa | Procede de polymerisation radicalaire controlee faisant intervenir une faible quantite de radical libre stable |
US6734256B1 (en) * | 1998-12-29 | 2004-05-11 | 3M Innovative Properties Company | Block copolymer hot-melt processable adhesives, methods of their preparation, and articles therefrom |
WO2009151834A2 (fr) | 2008-05-08 | 2009-12-17 | The Regents Of The University Of California | Compositions de copolymères séquencés supramoléculaires pour lithographie submicronique |
FR2809829B1 (fr) * | 2000-06-05 | 2002-07-26 | Rhodia Chimie Sa | Nouvelle composition photosensible pour la fabrication de photoresist |
JP2002137321A (ja) * | 2000-11-01 | 2002-05-14 | Ube Ind Ltd | 複合体薄膜とその製造方法 |
EP1411066B1 (fr) * | 2001-07-18 | 2011-05-11 | Asahi Kasei Chemicals Corporation | Copolymere sequence modifie |
WO2004009605A2 (fr) | 2001-11-30 | 2004-01-29 | University Of Maryland, College Park | Synthese, a temperature ambiante regulee, de nanoagregats d'oxydes metalliques magnetiques dans une matrice de copolymeres bisequences |
ITMI20021495A1 (it) * | 2002-07-09 | 2002-10-08 | Polimeri Europa Spa | Procedimento per la preparazione di copolimeri a blocchi. |
US8133534B2 (en) * | 2004-11-22 | 2012-03-13 | Wisconsin Alumni Research Foundation | Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials |
EP1827717A4 (fr) * | 2004-11-22 | 2011-11-23 | Wisconsin Alumni Res Found | Procedes et compositions destines a la formation de films copolymeres a motif aperiodique |
JP5136999B2 (ja) * | 2005-11-18 | 2013-02-06 | 国立大学法人京都大学 | パターン基板の製造方法、パターン転写体、磁気記録用パターン媒体、及び高分子薄膜 |
US7347953B2 (en) * | 2006-02-02 | 2008-03-25 | International Business Machines Corporation | Methods for forming improved self-assembled patterns of block copolymers |
JP5414011B2 (ja) * | 2006-05-23 | 2014-02-12 | 国立大学法人京都大学 | 微細構造体、パターン媒体、及びそれらの製造方法 |
US7723009B2 (en) * | 2006-06-02 | 2010-05-25 | Micron Technology, Inc. | Topography based patterning |
US7964107B2 (en) | 2007-02-08 | 2011-06-21 | Micron Technology, Inc. | Methods using block copolymer self-assembly for sub-lithographic patterning |
US7790350B2 (en) * | 2007-07-30 | 2010-09-07 | International Business Machines Corporation | Method and materials for patterning a neutral surface |
US7521094B1 (en) | 2008-01-14 | 2009-04-21 | International Business Machines Corporation | Method of forming polymer features by directed self-assembly of block copolymers |
US8426313B2 (en) * | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference |
EP2151457A1 (fr) * | 2008-07-28 | 2010-02-10 | Total Petrochemicals France | Procédé de fabrication d'un copolymère biséquencé doté d'une séquence de polymère monovinylaromatique |
EP2342246A1 (fr) * | 2008-10-03 | 2011-07-13 | Chamelic Ltd | Copolymères biséquencés ab et applications pour leur utilisation |
JP5281386B2 (ja) * | 2008-12-22 | 2013-09-04 | 株式会社日立製作所 | 高分子薄膜及びパターン媒体並びにこれらの製造方法 |
WO2010141115A2 (fr) * | 2009-02-19 | 2010-12-09 | Massachusetts Institute Of Technology | Assemblage dirigé de matériau |
JP2010234703A (ja) * | 2009-03-31 | 2010-10-21 | Fujifilm Corp | 積層体 |
US8834956B2 (en) * | 2009-06-22 | 2014-09-16 | Micron Technology, Inc. | Methods of utilizing block copolymer to form patterns |
US9299381B2 (en) | 2011-02-07 | 2016-03-29 | Wisconsin Alumni Research Foundation | Solvent annealing block copolymers on patterned substrates |
FR2974094A1 (fr) | 2011-04-15 | 2012-10-19 | Arkema France | Procede de preparation de surfaces |
US8513356B1 (en) | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
CN104105750A (zh) * | 2012-02-10 | 2014-10-15 | 纳幕尔杜邦公司 | 高-x两嵌段共聚物的制备、纯化和使用 |
US20130209755A1 (en) | 2012-02-15 | 2013-08-15 | Phillip Dene Hustad | Self-assembled structures, method of manufacture thereof and articles comprising the same |
US9372398B2 (en) * | 2012-03-02 | 2016-06-21 | Wisconsin Alumni Research Foundation | Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers |
JP5752655B2 (ja) * | 2012-09-10 | 2015-07-22 | 株式会社東芝 | パターン形成方法 |
JP5640099B2 (ja) * | 2013-01-07 | 2014-12-10 | 株式会社日立製作所 | 微細構造を有する高分子薄膜およびパターン基板の製造方法 |
TWI645254B (zh) * | 2013-01-14 | 2018-12-21 | 美國加利福尼亞大學董事會 | 具經控制之總成及提升排序之含矽嵌段共聚物之組合物 |
-
2013
- 2013-07-25 FR FR1357333A patent/FR3008986B1/fr not_active Expired - Fee Related
-
2014
- 2014-02-25 FR FR1451490A patent/FR3008987B1/fr not_active Expired - Fee Related
- 2014-07-18 CN CN201480052279.6A patent/CN105579498B/zh active Active
- 2014-07-18 WO PCT/EP2014/065468 patent/WO2015011035A1/fr active Application Filing
- 2014-07-18 SG SG11201600564SA patent/SG11201600564SA/en unknown
- 2014-07-21 TW TW103124911A patent/TWI595533B/zh active
- 2014-07-22 JP JP2014149212A patent/JP5911534B2/ja active Active
- 2014-07-24 US US14/340,075 patent/US9296014B2/en active Active
- 2014-07-25 KR KR1020140094663A patent/KR101540883B1/ko active IP Right Grant
-
2015
- 2015-04-27 JP JP2015090880A patent/JP2015187273A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
TW201517117A (zh) | 2015-05-01 |
TWI595533B (zh) | 2017-08-11 |
KR101540883B1 (ko) | 2015-07-30 |
FR3008986B1 (fr) | 2016-12-30 |
FR3008987A1 (fr) | 2015-01-30 |
JP2015044981A (ja) | 2015-03-12 |
FR3008986A1 (fr) | 2015-01-30 |
WO2015011035A1 (fr) | 2015-01-29 |
JP2015187273A (ja) | 2015-10-29 |
US20150030971A1 (en) | 2015-01-29 |
KR20150013070A (ko) | 2015-02-04 |
FR3008987B1 (fr) | 2017-06-16 |
CN105579498A (zh) | 2016-05-11 |
CN105579498B (zh) | 2019-06-04 |
JP5911534B2 (ja) | 2016-04-27 |
US9296014B2 (en) | 2016-03-29 |
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