SG11201504939RA - Microcontroller - Google Patents

Microcontroller

Info

Publication number
SG11201504939RA
SG11201504939RA SG11201504939RA SG11201504939RA SG11201504939RA SG 11201504939R A SG11201504939R A SG 11201504939RA SG 11201504939R A SG11201504939R A SG 11201504939RA SG 11201504939R A SG11201504939R A SG 11201504939RA SG 11201504939R A SG11201504939R A SG 11201504939RA
Authority
SG
Singapore
Prior art keywords
microcontroller
Prior art date
Application number
SG11201504939RA
Inventor
Tatsuji Nishijima
Hidetomo Kobayashi
Tomoaki Atsumi
Kiyoshi Kato
Original Assignee
Semiconductor Energy Lab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Lab filed Critical Semiconductor Energy Lab
Publication of SG11201504939RA publication Critical patent/SG11201504939RA/en

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/26—Power supply means, e.g. regulation thereof
    • G06F1/32—Means for saving power
    • G06F1/3203—Power management, i.e. event-based initiation of a power-saving mode
    • G06F1/3234—Power saving characterised by the action undertaken
    • G06F1/3243—Power saving in microcontroller unit
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/26—Power supply means, e.g. regulation thereof
    • G06F1/32—Means for saving power
    • G06F1/3203—Power management, i.e. event-based initiation of a power-saving mode
    • G06F1/3234—Power saving characterised by the action undertaken
    • G06F1/3287—Power saving characterised by the action undertaken by switching off individual functional units in the computer system
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/405—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with three charge-transfer gates, e.g. MOS transistors, per cell
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C5/00—Details of stores covered by group G11C11/00
    • G11C5/14—Power supply arrangements, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels
    • G11C5/148—Details of power up or power down circuits, standby circuits or recovery circuits
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02D—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN INFORMATION AND COMMUNICATION TECHNOLOGIES [ICT], I.E. INFORMATION AND COMMUNICATION TECHNOLOGIES AIMING AT THE REDUCTION OF THEIR OWN ENERGY USE
    • Y02D10/00—Energy efficient computing, e.g. low power processors, power management or thermal management

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Computing Systems (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Power Sources (AREA)
  • Thin Film Transistor (AREA)
  • Microcomputers (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
SG11201504939RA 2012-09-03 2013-08-23 Microcontroller SG11201504939RA (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2012192956 2012-09-03
JP2012229765 2012-10-17
JP2013008407 2013-01-21
JP2013063267 2013-03-26
PCT/JP2013/073239 WO2014034820A1 (en) 2012-09-03 2013-08-23 Microcontroller

Publications (1)

Publication Number Publication Date
SG11201504939RA true SG11201504939RA (en) 2015-07-30

Family

ID=50183625

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201504939RA SG11201504939RA (en) 2012-09-03 2013-08-23 Microcontroller

Country Status (6)

Country Link
US (1) US9423860B2 (en)
JP (1) JP6189140B2 (en)
KR (1) KR102088865B1 (en)
SG (1) SG11201504939RA (en)
TW (1) TWI576691B (en)
WO (1) WO2014034820A1 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112013005029T5 (en) * 2012-10-17 2015-07-30 Semiconductor Energy Laboratory Co., Ltd. Microcontroller and manufacturing process for it
JP6495698B2 (en) 2014-03-20 2019-04-03 株式会社半導体エネルギー研究所 Semiconductor device, electronic component, and electronic device
JP2016015475A (en) 2014-06-13 2016-01-28 株式会社半導体エネルギー研究所 Semiconductor device and electronic apparatus
KR20170023813A (en) * 2014-06-20 2017-03-06 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Semiconductor device
US9971535B2 (en) 2014-11-05 2018-05-15 Industrial Technology Research Institute Conversion method for reducing power consumption and computing apparatus using the same
US9443564B2 (en) * 2015-01-26 2016-09-13 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, electronic component, and electronic device
TWI753908B (en) 2016-05-20 2022-02-01 日商半導體能源硏究所股份有限公司 Semiconductor device, display device, and electronic device
CN109478883A (en) 2016-07-19 2019-03-15 株式会社半导体能源研究所 Semiconductor device
US10120470B2 (en) 2016-07-22 2018-11-06 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, display device and electronic device
JP7044495B2 (en) 2016-07-27 2022-03-30 株式会社半導体エネルギー研究所 Semiconductor device
US10797706B2 (en) 2016-12-27 2020-10-06 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
CN106648033A (en) * 2017-01-03 2017-05-10 深圳市博巨兴实业发展有限公司 Low-power-consumption microcontroller SOC
US10686011B2 (en) 2018-03-01 2020-06-16 United Microelectronics Corp. Semiconductor device integrated with memory device and fabrication method thereof
JPWO2020229917A1 (en) * 2019-05-10 2020-11-19
WO2020245688A1 (en) * 2019-06-04 2020-12-10 株式会社半導体エネルギー研究所 Semiconductor device, semiconductor wafer, and electronic equipment
US20200388319A1 (en) 2019-06-07 2020-12-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, electronic component, and electronic device
US20210391470A1 (en) * 2020-06-15 2021-12-16 Taiwan Semiconductor Manufacturing Company, Ltd. Layered structure, semiconductor device including the same, and manufacturing method thereof
JP2023040578A (en) * 2021-09-10 2023-03-23 キオクシア株式会社 Memory system and control method

Family Cites Families (143)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60198861A (en) 1984-03-23 1985-10-08 Fujitsu Ltd Thin film transistor
JPH0244256B2 (en) 1987-01-28 1990-10-03 Kagaku Gijutsucho Mukizaishitsu Kenkyushocho INGAZN2O5DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHO
JPH0244260B2 (en) 1987-02-24 1990-10-03 Kagaku Gijutsucho Mukizaishitsu Kenkyushocho INGAZN5O8DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHO
JPS63210023A (en) 1987-02-24 1988-08-31 Natl Inst For Res In Inorg Mater Compound having laminar structure of hexagonal crystal system expressed by ingazn4o7 and its production
JPH0244258B2 (en) 1987-02-24 1990-10-03 Kagaku Gijutsucho Mukizaishitsu Kenkyushocho INGAZN3O6DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHO
JPH0244262B2 (en) 1987-02-27 1990-10-03 Kagaku Gijutsucho Mukizaishitsu Kenkyushocho INGAZN6O9DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHO
JPH0244263B2 (en) 1987-04-22 1990-10-03 Kagaku Gijutsucho Mukizaishitsu Kenkyushocho INGAZN7O10DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHO
JPH05251705A (en) 1992-03-04 1993-09-28 Fuji Xerox Co Ltd Thin-film transistor
JPH05282214A (en) 1992-04-03 1993-10-29 Hitachi Ltd System restart method and its device
JPH06348361A (en) * 1993-06-14 1994-12-22 Fuji Xerox Co Ltd Back-up type computer device
JP3479375B2 (en) 1995-03-27 2003-12-15 科学技術振興事業団 Metal oxide semiconductor device in which a pn junction is formed with a thin film transistor made of a metal oxide semiconductor such as cuprous oxide, and methods for manufacturing the same
WO1997006554A2 (en) 1995-08-03 1997-02-20 Philips Electronics N.V. Semiconductor device provided with transparent switching element
JP3625598B2 (en) 1995-12-30 2005-03-02 三星電子株式会社 Manufacturing method of liquid crystal display device
JPH10301659A (en) 1997-04-28 1998-11-13 Hitachi Ltd Microprocessor
JP4170454B2 (en) 1998-07-24 2008-10-22 Ｈｏｙａ株式会社 Article having transparent conductive oxide thin film and method for producing the same
JP2000150861A (en) 1998-11-16 2000-05-30 Tdk Corp Oxide thin film
JP3276930B2 (en) 1998-11-17 2002-04-22 科学技術振興事業団 Transistor and semiconductor device
TW460731B (en) 1999-09-03 2001-10-21 Ind Tech Res Inst Electrode structure and production method of wide viewing angle LCD
EP1164460A4 (en) 2000-01-13 2008-12-10 Access Co Ltd Computer system and power saving control method therefor
US6665802B1 (en) * 2000-02-29 2003-12-16 Infineon Technologies North America Corp. Power management and control for a microcontroller
JP4089858B2 (en) 2000-09-01 2008-05-28 国立大学法人東北大学 Semiconductor device
KR20020038482A (en) 2000-11-15 2002-05-23 모리시타 요이찌 Thin film transistor array, method for producing the same, and display panel using the same
JP3997731B2 (en) 2001-03-19 2007-10-24 富士ゼロックス株式会社 Method for forming a crystalline semiconductor thin film on a substrate
JP2002289859A (en) 2001-03-23 2002-10-04 Minolta Co Ltd Thin-film transistor
JP4090716B2 (en) 2001-09-10 2008-05-28 雅司 川崎 Thin film transistor and matrix display device
JP2003084993A (en) * 2001-09-10 2003-03-20 Seiko Epson Corp Processor with flash memory and debug device
JP3925839B2 (en) 2001-09-10 2007-06-06 シャープ株式会社 Semiconductor memory device and test method thereof
JP2003132683A (en) 2001-10-23 2003-05-09 Hitachi Ltd Semiconductor device
US7061014B2 (en) 2001-11-05 2006-06-13 Japan Science And Technology Agency Natural-superlattice homologous single crystal thin film, method for preparation thereof, and device using said single crystal thin film
JP4164562B2 (en) 2002-09-11 2008-10-15 独立行政法人科学技術振興機構 Transparent thin film field effect transistor using homologous thin film as active layer
JP4083486B2 (en) 2002-02-21 2008-04-30 独立行政法人科学技術振興機構 Method for producing LnCuO (S, Se, Te) single crystal thin film
CN1445821A (en) 2002-03-15 2003-10-01 三洋电机株式会社 Forming method of ZnO film and ZnO semiconductor layer, semiconductor element and manufacturing method thereof
JP3933591B2 (en) 2002-03-26 2007-06-20 淳二 城戸 Organic electroluminescent device
US7339187B2 (en) 2002-05-21 2008-03-04 State Of Oregon Acting By And Through The Oregon State Board Of Higher Education On Behalf Of Oregon State University Transistor structures
JP2004013404A (en) 2002-06-05 2004-01-15 Sharp Corp Electronic equipment, laser pointer and power source control method
JP2004022625A (en) 2002-06-13 2004-01-22 Murata Mfg Co Ltd Manufacturing method of semiconductor device and its manufacturing method
US7105868B2 (en) 2002-06-24 2006-09-12 Cermet, Inc. High-electron mobility transistor with zinc oxide
US7067843B2 (en) 2002-10-11 2006-06-27 E. I. Du Pont De Nemours And Company Transparent oxide semiconductor thin film transistors
JP3567160B2 (en) 2003-01-30 2004-09-22 株式会社ルネサステクノロジ Semiconductor integrated circuit
JP4166105B2 (en) 2003-03-06 2008-10-15 シャープ株式会社 Semiconductor device and manufacturing method thereof
JP2004273732A (en) 2003-03-07 2004-09-30 Sharp Corp Active matrix substrate and its producing process
JP4108633B2 (en) 2003-06-20 2008-06-25 シャープ株式会社 THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF, AND ELECTRONIC DEVICE
US7262463B2 (en) 2003-07-25 2007-08-28 Hewlett-Packard Development Company, L.P. Transistor including a deposited channel region having a doped portion
US7297977B2 (en) 2004-03-12 2007-11-20 Hewlett-Packard Development Company, L.P. Semiconductor device
JP4620046B2 (en) 2004-03-12 2011-01-26 独立行政法人科学技術振興機構 Thin film transistor and manufacturing method thereof
US7145174B2 (en) 2004-03-12 2006-12-05 Hewlett-Packard Development Company, Lp. Semiconductor device
US7282782B2 (en) 2004-03-12 2007-10-16 Hewlett-Packard Development Company, L.P. Combined binary oxide semiconductor device
US7211825B2 (en) 2004-06-14 2007-05-01 Yi-Chi Shih Indium oxide-based thin film transistors and circuits
JP4421390B2 (en) * 2004-06-21 2010-02-24 富士通マイクロエレクトロニクス株式会社 Semiconductor integrated circuit
JP2006100760A (en) 2004-09-02 2006-04-13 Casio Comput Co Ltd Thin-film transistor and its manufacturing method
US7285501B2 (en) 2004-09-17 2007-10-23 Hewlett-Packard Development Company, L.P. Method of forming a solution processed device
US7298084B2 (en) 2004-11-02 2007-11-20 3M Innovative Properties Company Methods and displays utilizing integrated zinc oxide row and column drivers in conjunction with organic light emitting diodes
DE102004053159A1 (en) * 2004-11-03 2006-05-04 Robert Bosch Gmbh microcontroller system
CA2708335A1 (en) 2004-11-10 2006-05-18 Canon Kabushiki Kaisha Amorphous oxide and field effect transistor
AU2005302963B2 (en) 2004-11-10 2009-07-02 Cannon Kabushiki Kaisha Light-emitting device
US7829444B2 (en) 2004-11-10 2010-11-09 Canon Kabushiki Kaisha Field effect transistor manufacturing method
US7863611B2 (en) 2004-11-10 2011-01-04 Canon Kabushiki Kaisha Integrated circuits utilizing amorphous oxides
WO2006051995A1 (en) 2004-11-10 2006-05-18 Canon Kabushiki Kaisha Field effect transistor employing an amorphous oxide
US7791072B2 (en) 2004-11-10 2010-09-07 Canon Kabushiki Kaisha Display
US7453065B2 (en) 2004-11-10 2008-11-18 Canon Kabushiki Kaisha Sensor and image pickup device
JP3846504B2 (en) * 2005-01-07 2006-11-15 オンキヨー株式会社 Low power consumption device
US7579224B2 (en) 2005-01-21 2009-08-25 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a thin film semiconductor device
TWI562380B (en) 2005-01-28 2016-12-11 Semiconductor Energy Lab Co Ltd Semiconductor device, electronic device, and method of manufacturing semiconductor device
US7608531B2 (en) 2005-01-28 2009-10-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, electronic device, and method of manufacturing semiconductor device
US7858451B2 (en) 2005-02-03 2010-12-28 Semiconductor Energy Laboratory Co., Ltd. Electronic device, semiconductor device and manufacturing method thereof
US7948171B2 (en) 2005-02-18 2011-05-24 Semiconductor Energy Laboratory Co., Ltd. Light emitting device
US20060197092A1 (en) 2005-03-03 2006-09-07 Randy Hoffman System and method for forming conductive material on a substrate
US8681077B2 (en) 2005-03-18 2014-03-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, and display device, driving method and electronic apparatus thereof
WO2006105077A2 (en) 2005-03-28 2006-10-05 Massachusetts Institute Of Technology Low voltage thin film transistor with high-k dielectric material
US7645478B2 (en) 2005-03-31 2010-01-12 3M Innovative Properties Company Methods of making displays
US8300031B2 (en) 2005-04-20 2012-10-30 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device comprising transistor having gate and drain connected through a current-voltage conversion element
JP2006344849A (en) 2005-06-10 2006-12-21 Casio Comput Co Ltd Thin film transistor
US7691666B2 (en) 2005-06-16 2010-04-06 Eastman Kodak Company Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby
US7402506B2 (en) 2005-06-16 2008-07-22 Eastman Kodak Company Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby
US7507618B2 (en) 2005-06-27 2009-03-24 3M Innovative Properties Company Method for making electronic devices using metal oxide nanoparticles
KR100711890B1 (en) 2005-07-28 2007-04-25 삼성에스디아이 주식회사 Organic Light Emitting Display and Fabrication Method for the same
JP2007059128A (en) 2005-08-23 2007-03-08 Canon Inc Organic electroluminescent display device and manufacturing method thereof
JP4896625B2 (en) * 2005-08-26 2012-03-14 株式会社半導体エネルギー研究所 Display device
US7986287B2 (en) 2005-08-26 2011-07-26 Semiconductor Energy Laboratory Co., Ltd. Display device and method of driving the same
JP2007073705A (en) 2005-09-06 2007-03-22 Canon Inc Oxide-semiconductor channel film transistor and its method of manufacturing same
JP4850457B2 (en) 2005-09-06 2012-01-11 キヤノン株式会社 Thin film transistor and thin film diode
JP5116225B2 (en) 2005-09-06 2013-01-09 キヤノン株式会社 Manufacturing method of oxide semiconductor device
JP4280736B2 (en) 2005-09-06 2009-06-17 キヤノン株式会社 Semiconductor element
EP3614442A3 (en) 2005-09-29 2020-03-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having oxide semiconductor layer and manufactoring method thereof
US7441131B2 (en) * 2005-09-30 2008-10-21 Silicon Laboratories Inc. MCU with power saving mode
JP5037808B2 (en) 2005-10-20 2012-10-03 キヤノン株式会社 Field effect transistor using amorphous oxide, and display device using the transistor
US8533439B2 (en) 2005-11-07 2013-09-10 Atmel Corporation Elastic shared RAM array including contiguous instruction and data portions distinct from each other
KR101117948B1 (en) 2005-11-15 2012-02-15 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Method of Manufacturing a Liquid Crystal Display Device
TWI292281B (en) 2005-12-29 2008-01-01 Ind Tech Res Inst Pixel structure of active organic light emitting diode and method of fabricating the same
US7867636B2 (en) 2006-01-11 2011-01-11 Murata Manufacturing Co., Ltd. Transparent conductive film and method for manufacturing the same
JP4977478B2 (en) 2006-01-21 2012-07-18 三星電子株式会社 ZnO film and method of manufacturing TFT using the same
US7576394B2 (en) 2006-02-02 2009-08-18 Kochi Industrial Promotion Center Thin film transistor including low resistance conductive thin films and manufacturing method thereof
US7977169B2 (en) 2006-02-15 2011-07-12 Kochi Industrial Promotion Center Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof
KR20070101595A (en) 2006-04-11 2007-10-17 삼성전자주식회사 Zno thin film transistor
US20070252928A1 (en) 2006-04-28 2007-11-01 Toppan Printing Co., Ltd. Structure, transmission type liquid crystal display, reflection type display and manufacturing method thereof
JP5028033B2 (en) 2006-06-13 2012-09-19 キヤノン株式会社 Oxide semiconductor film dry etching method
JP4531020B2 (en) * 2006-08-01 2010-08-25 ルネサスエレクトロニクス株式会社 Semiconductor integrated circuit
JP4999400B2 (en) 2006-08-09 2012-08-15 キヤノン株式会社 Oxide semiconductor film dry etching method
JP4609797B2 (en) 2006-08-09 2011-01-12 Ｎｅｃ液晶テクノロジー株式会社 Thin film device and manufacturing method thereof
JP4332545B2 (en) 2006-09-15 2009-09-16 キヤノン株式会社 Field effect transistor and manufacturing method thereof
JP5164357B2 (en) 2006-09-27 2013-03-21 キヤノン株式会社 Semiconductor device and manufacturing method of semiconductor device
JP4274219B2 (en) 2006-09-27 2009-06-03 セイコーエプソン株式会社 Electronic devices, organic electroluminescence devices, organic thin film semiconductor devices
US7536570B2 (en) * 2006-10-02 2009-05-19 Silicon Laboratories Inc. Microcontroller unit (MCU) with suspend mode
US7622371B2 (en) 2006-10-10 2009-11-24 Hewlett-Packard Development Company, L.P. Fused nanocrystal thin film semiconductor and method
US7772021B2 (en) 2006-11-29 2010-08-10 Samsung Electronics Co., Ltd. Flat panel displays comprising a thin-film transistor having a semiconductive oxide in its channel and methods of fabricating the same for use in flat panel displays
JP2008140684A (en) 2006-12-04 2008-06-19 Toppan Printing Co Ltd Color el display, and its manufacturing method
US8117475B2 (en) 2006-12-15 2012-02-14 Microchip Technology Incorporated Direct memory access controller
KR101303578B1 (en) 2007-01-05 2013-09-09 삼성전자주식회사 Etching method of thin film
US8207063B2 (en) 2007-01-26 2012-06-26 Eastman Kodak Company Process for atomic layer deposition
KR100851215B1 (en) 2007-03-14 2008-08-07 삼성에스디아이 주식회사 Thin film transistor and organic light-emitting dislplay device having the thin film transistor
JP5198785B2 (en) 2007-03-30 2013-05-15 ルネサスエレクトロニクス株式会社 Semiconductor device
US7795613B2 (en) 2007-04-17 2010-09-14 Toppan Printing Co., Ltd. Structure with transistor
KR101325053B1 (en) 2007-04-18 2013-11-05 삼성디스플레이 주식회사 Thin film transistor substrate and manufacturing method thereof
KR20080094300A (en) 2007-04-19 2008-10-23 삼성전자주식회사 Thin film transistor and method of manufacturing the same and flat panel display comprising the same
KR101334181B1 (en) 2007-04-20 2013-11-28 삼성전자주식회사 Thin Film Transistor having selectively crystallized channel layer and method of manufacturing the same
WO2008133345A1 (en) 2007-04-25 2008-11-06 Canon Kabushiki Kaisha Oxynitride semiconductor
KR101345376B1 (en) 2007-05-29 2013-12-24 삼성전자주식회사 Fabrication method of ZnO family Thin film transistor
US7868479B2 (en) 2007-06-27 2011-01-11 Qualcomm Incorporated Power gating for multimedia processing power management
US20100207776A1 (en) 2007-09-21 2010-08-19 Shinji Takuno Communication device
US7873854B2 (en) * 2007-10-01 2011-01-18 Silicon Laboratories Inc. System for monitoring power supply voltage
JP5215158B2 (en) 2007-12-17 2013-06-19 富士フイルム株式会社 Inorganic crystalline alignment film, method for manufacturing the same, and semiconductor device
JP5198110B2 (en) 2008-03-26 2013-05-15 ニッタン株式会社 Fire alarm
JP5568850B2 (en) * 2008-09-17 2014-08-13 セイコーエプソン株式会社 Recording device
JP4623179B2 (en) 2008-09-18 2011-02-02 ソニー株式会社 Thin film transistor and manufacturing method thereof
JP4464451B2 (en) * 2008-10-07 2010-05-19 Ｎｅｃエレクトロニクス株式会社 Microcontroller
JP5451280B2 (en) 2008-10-09 2014-03-26 キヤノン株式会社 Wurtzite crystal growth substrate, manufacturing method thereof, and semiconductor device
JP2010267136A (en) 2009-05-15 2010-11-25 Rohm Co Ltd Data processor
KR101945306B1 (en) 2009-11-28 2019-02-07 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device
WO2011078373A1 (en) 2009-12-25 2011-06-30 Semiconductor Energy Laboratory Co., Ltd. Memory device, semiconductor device, and electronic device
WO2011089847A1 (en) 2010-01-20 2011-07-28 Semiconductor Energy Laboratory Co., Ltd. Signal processing circuit and method for driving the same
EP2550747A1 (en) 2010-03-22 2013-01-30 Freescale Semiconductor, Inc. Power gating control module, integrated circuit device, signal processing system, electronic device, and method therefor
US9473714B2 (en) 2010-07-01 2016-10-18 Semiconductor Energy Laboratory Co., Ltd. Solid-state imaging device and semiconductor display device
TWI615920B (en) 2010-08-06 2018-02-21 半導體能源研究所股份有限公司 Semiconductor device and method for manufacturing the same
KR101872926B1 (en) 2010-09-13 2018-06-29 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Semiconductor device
TWI590249B (en) 2010-12-03 2017-07-01 半導體能源研究所股份有限公司 Integrated circuit, method for driving the same, and semiconductor device
US8531114B2 (en) * 2010-12-31 2013-09-10 The United States Of America As Represented By The Secretary Of The Navy Illumination beacon
TWI525614B (en) 2011-01-05 2016-03-11 半導體能源研究所股份有限公司 Storage element, storage device, and signal processing circuit
US8543856B2 (en) * 2011-08-20 2013-09-24 Freescale Semiconductor Inc Semiconductor device with wake-up unit
US9021284B2 (en) * 2011-09-08 2015-04-28 Infineon Technologies Ag Standby operation with additional micro-controller
WO2013111757A1 (en) 2012-01-23 2013-08-01 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP6050721B2 (en) * 2012-05-25 2016-12-21 株式会社半導体エネルギー研究所 Semiconductor device
KR20150023547A (en) 2012-06-01 2015-03-05 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Semiconductor device and alarm device
US9054678B2 (en) 2012-07-06 2015-06-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and driving method thereof

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US20140068300A1 (en) 2014-03-06
TWI576691B (en) 2017-04-01
WO2014034820A1 (en) 2014-03-06
KR102088865B1 (en) 2020-03-13
KR20150052154A (en) 2015-05-13
US9423860B2 (en) 2016-08-23
TW201432433A (en) 2014-08-16
JP2014209306A (en) 2014-11-06

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