SG11201407262VA - Radiation source - Google Patents

Radiation source

Info

Publication number
SG11201407262VA
SG11201407262VA SG11201407262VA SG11201407262VA SG11201407262VA SG 11201407262V A SG11201407262V A SG 11201407262VA SG 11201407262V A SG11201407262V A SG 11201407262VA SG 11201407262V A SG11201407262V A SG 11201407262VA SG 11201407262V A SG11201407262V A SG 11201407262VA
Authority
SG
Singapore
Prior art keywords
international
droplets
droplet
laser
pulse
Prior art date
Application number
SG11201407262VA
Other languages
English (en)
Inventor
Schoot Jan Van
Antonius Kempen
Hermanus Kreuwel
Andrei Mikhailovich Yakunin
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG11201407262VA publication Critical patent/SG11201407262VA/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
SG11201407262VA 2012-05-21 2013-04-29 Radiation source SG11201407262VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261649895P 2012-05-21 2012-05-21
PCT/EP2013/058869 WO2013174620A1 (en) 2012-05-21 2013-04-29 Radiation source

Publications (1)

Publication Number Publication Date
SG11201407262VA true SG11201407262VA (en) 2014-12-30

Family

ID=48289135

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201407262VA SG11201407262VA (en) 2012-05-21 2013-04-29 Radiation source

Country Status (7)

Country Link
US (1) US9860966B2 (ja)
EP (1) EP2853139B1 (ja)
JP (1) JP6198816B2 (ja)
KR (1) KR102072064B1 (ja)
CN (1) CN104488362B (ja)
SG (1) SG11201407262VA (ja)
WO (1) WO2013174620A1 (ja)

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NL2011533A (en) * 2012-10-31 2014-05-06 Asml Netherlands Bv Method and apparatus for generating radiation.
JP6426602B2 (ja) * 2013-05-21 2018-11-21 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光の生成方法
US9338870B2 (en) * 2013-12-30 2016-05-10 Asml Netherlands B.V. Extreme ultraviolet light source
US9832854B2 (en) * 2015-08-12 2017-11-28 Asml Netherlands B.V. Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation
US9426872B1 (en) * 2015-08-12 2016-08-23 Asml Netherlands B.V. System and method for controlling source laser firing in an LPP EUV light source
US20170311429A1 (en) 2016-04-25 2017-10-26 Asml Netherlands B.V. Reducing the effect of plasma on an object in an extreme ultraviolet light source
US9778022B1 (en) 2016-09-14 2017-10-03 Asml Netherlands B.V. Determining moving properties of a target in an extreme ultraviolet light source
US10149375B2 (en) 2016-09-14 2018-12-04 Asml Netherlands B.V. Target trajectory metrology in an extreme ultraviolet light source
JP7239491B2 (ja) * 2017-05-30 2023-03-14 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
JP7376468B2 (ja) * 2017-09-20 2023-11-08 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
JP7343511B2 (ja) * 2018-02-28 2023-09-12 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
WO2019186754A1 (ja) * 2018-03-28 2019-10-03 ギガフォトン株式会社 極端紫外光生成システム及び電子デバイスの製造方法
US11153959B2 (en) * 2018-08-17 2021-10-19 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for generating extreme ultraviolet radiation
TW202041103A (zh) 2019-01-30 2020-11-01 荷蘭商Ａｓｍｌ荷蘭公司 判定在極紫外光光源中之目標之移動性質

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US5226948A (en) * 1990-08-30 1993-07-13 University Of Southern California Method and apparatus for droplet stream manufacturing
FR2799667B1 (fr) 1999-10-18 2002-03-08 Commissariat Energie Atomique Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
US7928416B2 (en) 2006-12-22 2011-04-19 Cymer, Inc. Laser produced plasma EUV light source
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US8653437B2 (en) * 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US6664498B2 (en) * 2001-12-04 2003-12-16 General Atomics Method and apparatus for increasing the material removal rate in laser machining
JP3759066B2 (ja) * 2002-04-11 2006-03-22 孝晏 望月 レーザプラズマ発生方法およびその装置
US6855943B2 (en) * 2002-05-28 2005-02-15 Northrop Grumman Corporation Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source
TWI299505B (en) * 2003-04-08 2008-08-01 Cymer Inc Systems and methods for removal of debris on a reflecting surface of an euv collector in an euv light source
DE102004005242B4 (de) 2004-01-30 2006-04-20 Xtreme Technologies Gmbh Verfahren und Vorrichtung zur plasmabasierten Erzeugung intensiver kurzwelliger Strahlung
DE102004036441B4 (de) * 2004-07-23 2007-07-12 Xtreme Technologies Gmbh Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
US7308007B2 (en) * 2004-12-23 2007-12-11 Colorado State University Research Foundation Increased laser output energy and average power at wavelengths below 35 nm
JP4512747B2 (ja) 2005-03-02 2010-07-28 独立行政法人産業技術総合研究所 レーザープラズマから輻射光を発生させる方法、該方法を用いたレーザープラズマ輻射光発生装置
US8158960B2 (en) * 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US7872245B2 (en) 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
JP5454881B2 (ja) * 2008-08-29 2014-03-26 ギガフォトン株式会社 極端紫外光源装置及び極端紫外光の発生方法
JP5612579B2 (ja) * 2009-07-29 2014-10-22 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法、およびそのプログラムを記録した記録媒体
KR101710433B1 (ko) 2010-01-07 2017-02-27 에이에스엠엘 네델란즈 비.브이. 액적 가속기를 포함하는 ｅｕｖ 방사선 소스 및 리소그래피 장치
US9265136B2 (en) * 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US9072153B2 (en) * 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target
CN103460018B (zh) * 2011-02-04 2015-09-23 塞通诺米/St有限责任公司 颗粒分选设备和方法
NL2009372A (en) * 2011-09-28 2013-04-02 Asml Netherlands Bv Methods to control euv exposure dose and euv lithographic methods and apparatus using such methods.
DE102013002064A1 (de) * 2012-02-11 2013-08-14 Media Lario S.R.L. Quell-kollektor-module für euv-lithographie unter verwendung eines gic-spiegels und einer lpp-quelle
JP2014078394A (ja) * 2012-10-10 2014-05-01 Gigaphoton Inc 極端紫外光生成システム
US8872123B2 (en) * 2013-01-10 2014-10-28 Asml Netherlands B.V. Method of timing laser beam pulses to regulate extreme ultraviolet light dosing
JP6195474B2 (ja) * 2013-05-31 2017-09-13 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光生成システムにおけるレーザシステムの制御方法

Also Published As

Publication number Publication date
KR102072064B1 (ko) 2020-01-31
CN104488362B (zh) 2017-05-10
KR20150013823A (ko) 2015-02-05
JP6198816B2 (ja) 2017-09-20
JP2015520513A (ja) 2015-07-16
US9860966B2 (en) 2018-01-02
EP2853139B1 (en) 2016-07-13
CN104488362A (zh) 2015-04-01
EP2853139A1 (en) 2015-04-01
WO2013174620A1 (en) 2013-11-28
US20150146182A1 (en) 2015-05-28

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