SG11201405526UA - Mask blank, transfer mask, and method for manufacturing mask blank and transfer mask - Google Patents

Mask blank, transfer mask, and method for manufacturing mask blank and transfer mask

Info

Publication number
SG11201405526UA
SG11201405526UA SG11201405526UA SG11201405526UA SG11201405526UA SG 11201405526U A SG11201405526U A SG 11201405526UA SG 11201405526U A SG11201405526U A SG 11201405526UA SG 11201405526U A SG11201405526U A SG 11201405526UA SG 11201405526U A SG11201405526U A SG 11201405526UA
Authority
SG
Singapore
Prior art keywords
mask
transfer
blank
manufacturing
mask blank
Prior art date
Application number
SG11201405526UA
Other languages
English (en)
Inventor
Toshiyuki Suzuki
Shigenori Ishihara
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG11201405526UA publication Critical patent/SG11201405526UA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG11201405526UA 2012-03-23 2013-02-08 Mask blank, transfer mask, and method for manufacturing mask blank and transfer mask SG11201405526UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012066742 2012-03-23
PCT/JP2013/053053 WO2013140887A1 (ja) 2012-03-23 2013-02-08 マスクブランク、転写用マスクおよびこれらの製造方法

Publications (1)

Publication Number Publication Date
SG11201405526UA true SG11201405526UA (en) 2014-11-27

Family

ID=49222352

Family Applications (3)

Application Number Title Priority Date Filing Date
SG11201405526UA SG11201405526UA (en) 2012-03-23 2013-02-08 Mask blank, transfer mask, and method for manufacturing mask blank and transfer mask
SG10201509797RA SG10201509797RA (en) 2012-03-23 2013-02-08 Mask blank, transfer mask, and methods of manufacturing the same
SG10201605431QA SG10201605431QA (en) 2012-03-23 2013-02-08 Mask blank, transfer mask, and methods of manufacturing the same

Family Applications After (2)

Application Number Title Priority Date Filing Date
SG10201509797RA SG10201509797RA (en) 2012-03-23 2013-02-08 Mask blank, transfer mask, and methods of manufacturing the same
SG10201605431QA SG10201605431QA (en) 2012-03-23 2013-02-08 Mask blank, transfer mask, and methods of manufacturing the same

Country Status (6)

Country Link
US (2) US9470970B2 (enrdf_load_stackoverflow)
JP (3) JP5286455B1 (enrdf_load_stackoverflow)
KR (3) KR101922309B1 (enrdf_load_stackoverflow)
SG (3) SG11201405526UA (enrdf_load_stackoverflow)
TW (2) TWI585515B (enrdf_load_stackoverflow)
WO (1) WO2013140887A1 (enrdf_load_stackoverflow)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6266322B2 (ja) * 2013-11-22 2018-01-24 Hoya株式会社 表示装置製造用の位相シフトマスクブランク、表示装置製造用の位相シフトマスク及びその製造方法、並びに表示装置の製造方法
JP6138676B2 (ja) * 2013-12-27 2017-05-31 Hoya株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスクの製造方法
JP6292581B2 (ja) * 2014-03-30 2018-03-14 Hoya株式会社 マスクブランク、転写用マスクの製造方法及び半導体装置の製造方法
JP6313678B2 (ja) * 2014-07-14 2018-04-18 Hoya株式会社 マスクブランクの製造方法、位相シフトマスクの製造方法および半導体デバイスの製造方法
JP6104852B2 (ja) * 2014-07-14 2017-03-29 Hoya株式会社 マスクブランクの製造方法、位相シフトマスクの製造方法および半導体デバイスの製造方法
US10018905B2 (en) * 2015-04-06 2018-07-10 S & S Tech Co., Ltd Phase shift blankmask and photomask
KR101617727B1 (ko) 2015-07-24 2016-05-03 주식회사 에스앤에스텍 블랭크 마스크 및 이를 이용한 포토마스크
JP6621626B2 (ja) * 2015-09-18 2019-12-18 Hoya株式会社 マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法
JP6742184B2 (ja) * 2016-07-26 2020-08-19 アルバック成膜株式会社 位相シフタ膜の製造方法、位相シフトマスクブランクの製造方法、及び、位相シフトマスクの製造方法
JP6677139B2 (ja) * 2016-09-28 2020-04-08 信越化学工業株式会社 ハーフトーン位相シフト型フォトマスクブランクの製造方法
JP6772037B2 (ja) * 2016-11-11 2020-10-21 Hoya株式会社 マスクブランク、転写用マスク、転写用マスクの製造方法および半導体デバイスの製造方法
JP6532919B2 (ja) * 2017-09-07 2019-06-19 Hoya株式会社 表示装置製造用の位相シフトマスクブランク、表示装置製造用の位相シフトマスク、及び表示装置の製造方法
US20200285144A1 (en) * 2017-09-21 2020-09-10 Hoya Corporation Mask blank, transfer mask, and method for manufacturing semiconductor device
SG11202005137VA (en) * 2017-12-26 2020-07-29 Hoya Corp Mask blank, phase shift mask, and method of manufacturing semiconductor device
CN110184655B (zh) * 2019-04-25 2022-01-11 上海新傲科技股份有限公司 晶圆的表面氧化方法
KR102444967B1 (ko) * 2021-04-29 2022-09-16 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102465982B1 (ko) * 2021-07-13 2022-11-09 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102503790B1 (ko) * 2021-10-07 2023-02-23 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
JP7346527B2 (ja) * 2021-11-25 2023-09-19 Hoya株式会社 マスクブランク、転写用マスク、マスクブランクの製造方法、転写用マスクの製造方法、及び表示装置の製造方法
TWI796907B (zh) * 2021-12-28 2023-03-21 宏碁股份有限公司 光固化設備以及顯示裝置的製造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0917712A (ja) * 1995-06-28 1997-01-17 Toppan Printing Co Ltd Ｘ線露光用マスクブランクのｘ線透過支持膜形成方法
JPH0980736A (ja) * 1995-09-18 1997-03-28 Toshiba Corp 露光用マスク及びその製造方法
JP3396431B2 (ja) 1998-08-10 2003-04-14 東京エレクトロン株式会社 酸化処理方法および酸化処理装置
AU4291099A (en) * 1998-09-30 2000-04-17 Nikon Corporation Photomask and exposure method
JP2004318184A (ja) * 2000-09-12 2004-11-11 Hoya Corp 位相シフトマスクブランク、位相シフトマスク
JP2002090978A (ja) 2000-09-12 2002-03-27 Hoya Corp 位相シフトマスクブランクの製造方法、及び位相シフトマスクブランクの製造装置
JP3608654B2 (ja) 2000-09-12 2005-01-12 Ｈｏｙａ株式会社 位相シフトマスクブランク、位相シフトマスク
JP3722029B2 (ja) 2000-09-12 2005-11-30 Ｈｏｙａ株式会社 位相シフトマスクブランクの製造方法、及び位相シフトマスクの製造方法
DE10307545A1 (de) 2002-02-22 2003-11-06 Hoya Corp Zuschnitt für halbtonartige Phasenverschiebungsmaske und zugehörige Phasenverschiebungsmaske
JP3641460B2 (ja) * 2002-02-22 2005-04-20 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク
JP4076989B2 (ja) 2004-10-15 2008-04-16 Ｈｏｙａ株式会社 位相シフトマスクブランクス及び位相シフトマスク
JP4930964B2 (ja) 2005-05-20 2012-05-16 Ｈｏｙａ株式会社 位相シフトマスクブランクの製造方法及び位相シフトマスクの製造方法
KR100818676B1 (ko) * 2006-01-20 2008-04-01 주식회사 에스앤에스텍 하프톤형 위상반전 블랭크 마스크용 스퍼터링 타겟, 이를이용한 하프톤형 위상반전 블랭크 마스크 및 포토마스크,그리고 그 제조방법
KR20070096922A (ko) * 2006-03-24 2007-10-02 주식회사 에스앤에스텍 하프톤형 위상반전 블랭크 마스크 및 이를 이용한 포토마스크
JP5702920B2 (ja) * 2008-06-25 2015-04-15 Hoya株式会社 位相シフトマスクブランク、位相シフトマスクおよび位相シフトマスクブランクの製造方法
KR101656456B1 (ko) * 2009-10-30 2016-09-12 삼성전자주식회사 하프톤형 위상반전 블랭크 포토마스크와 하프톤형 위상반전 포토마스크 및 그의 제조방법
KR102071721B1 (ko) * 2010-04-09 2020-01-30 호야 가부시키가이샤 위상 시프트 마스크 블랭크 및 그 제조 방법, 및 위상 시프트 마스크
US8535855B2 (en) * 2010-05-19 2013-09-17 Hoya Corporation Mask blank manufacturing method, transfer mask manufacturing method, mask blank, and transfer mask
JP4974194B2 (ja) * 2010-06-21 2012-07-11 Ｈｏｙａ株式会社 フォトマスクブランクの製造方法
WO2013172248A1 (ja) 2012-05-16 2013-11-21 Hoya株式会社 マスクブランク、転写用マスクおよびこれらの製造方法

Also Published As

Publication number Publication date
JP5976715B2 (ja) 2016-08-24
KR101430395B1 (ko) 2014-08-13
KR20160009711A (ko) 2016-01-26
JP5530550B2 (ja) 2014-06-25
JP2013225139A (ja) 2013-10-31
KR20140127203A (ko) 2014-11-03
JP2013225109A (ja) 2013-10-31
JP5286455B1 (ja) 2013-09-11
KR101922309B1 (ko) 2018-11-26
US20170010526A1 (en) 2017-01-12
WO2013140887A1 (ja) 2013-09-26
US9470970B2 (en) 2016-10-18
SG10201509797RA (en) 2015-12-30
TW201346434A (zh) 2013-11-16
US20150072273A1 (en) 2015-03-12
KR101588150B1 (ko) 2016-01-25
TW201642021A (zh) 2016-12-01
US9952498B2 (en) 2018-04-24
SG10201605431QA (en) 2016-08-30
TWI610125B (zh) 2018-01-01
KR20140070660A (ko) 2014-06-10
JP2014194547A (ja) 2014-10-09
TWI585515B (zh) 2017-06-01

Similar Documents

Publication Publication Date Title
SG11201405526UA (en) Mask blank, transfer mask, and method for manufacturing mask blank and transfer mask
EP2832526A4 (en) METHOD FOR MANUFACTURING JOINT ELEMENT AND JOINT ELEMENT
EP2921202A4 (en) METHOD FOR MANUFACTURING STRATIFORM STRUCTURE FOR TRANSDERMAL ABSORPTION
EP2833405A4 (en) SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF
SG11201406026TA (en) Magnesium-zinc-calcium alloy, method for production thereof, and use thereof
IL231591A (en) Preserved benzyl indazoles, a process for their preparation and use
GB201223032D0 (en) Method for forming shaped preform
SG11201505421SA (en) Method for manufacturing mask blank substrate, method for manufacturing mask blank and method for manufacturing transfer mask
SG11201504015SA (en) Composite substrate manufacturing method, and composite substrate
SG11201508899TA (en) Reflective mask blank, method for manufacturing reflective mask blank, reflective mask, and method for manufacturing semiconductor device
EP2901797A4 (en) D2D RADIOCOMMUNICATION METHOD
EP3040365A4 (en) ION EXCHANGE FILM, COMPOSITION FOR FORMING THE ION EXCHANGE FILM AND PRODUCTION METHOD FOR THE ION EXCHANGE FILM
SG11201406324PA (en) Mask blank, transfer mask, and methods of manufacturing the same
EP2983241A4 (en) WAVEGUIDE, WAVELINE MANUFACTURING METHOD AND WIRELESS TRANSMISSION SYSTEM
SG10201406183VA (en) Method of manufacturing a mask blank and method of manufacturing a transfer mask
EP2689923A4 (en) METHOD FOR PRODUCING A DRAWING LINE ON A CUTTING, PACKAGING MANUFACTURING METHOD THEREFOR AND PACKING
EP2901645A4 (en) METHOD FOR D2D WIRELESS CONNECTION
EP3045550A4 (en) Method for manufacturing press-molded article, and press-molded article
GB2517220B (en) Method for HIP can manufacture, and can
ZA201502281B (en) Method for manufacturing a coating composition, coating composition and its use
SG11201604500YA (en) Microbial oil, method for manufacturing microbial oil, concentrated microbial oil, and method for manufacturing concentrated microbial oil
EP2823944A4 (en) SINGLE WHEEL AND MANUFACTURING METHOD THEREFOR
SG11201508969QA (en) Method for producing hybrid substrate, and hybrid substrate
SG11201501731UA (en) System and method for manufacturing ophthalmic devices
PL2645384T3 (pl) Transformator i sposób wytwarzania transformatora