SG10201509797RA - Mask blank, transfer mask, and methods of manufacturing the same - Google Patents
Mask blank, transfer mask, and methods of manufacturing the sameInfo
- Publication number
- SG10201509797RA SG10201509797RA SG10201509797RA SG10201509797RA SG10201509797RA SG 10201509797R A SG10201509797R A SG 10201509797RA SG 10201509797R A SG10201509797R A SG 10201509797RA SG 10201509797R A SG10201509797R A SG 10201509797RA SG 10201509797R A SG10201509797R A SG 10201509797RA
- Authority
- SG
- Singapore
- Prior art keywords
- mask
- manufacturing
- methods
- same
- transfer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Physical Vapour Deposition (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012066742 | 2012-03-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201509797RA true SG10201509797RA (en) | 2015-12-30 |
Family
ID=49222352
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201405526UA SG11201405526UA (en) | 2012-03-23 | 2013-02-08 | Mask blank, transfer mask, and method for manufacturing mask blank and transfer mask |
| SG10201605431QA SG10201605431QA (en) | 2012-03-23 | 2013-02-08 | Mask blank, transfer mask, and methods of manufacturing the same |
| SG10201509797RA SG10201509797RA (en) | 2012-03-23 | 2013-02-08 | Mask blank, transfer mask, and methods of manufacturing the same |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201405526UA SG11201405526UA (en) | 2012-03-23 | 2013-02-08 | Mask blank, transfer mask, and method for manufacturing mask blank and transfer mask |
| SG10201605431QA SG10201605431QA (en) | 2012-03-23 | 2013-02-08 | Mask blank, transfer mask, and methods of manufacturing the same |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9470970B2 (en) |
| JP (3) | JP5286455B1 (en) |
| KR (3) | KR101430395B1 (en) |
| SG (3) | SG11201405526UA (en) |
| TW (2) | TWI610125B (en) |
| WO (1) | WO2013140887A1 (en) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6266322B2 (en) * | 2013-11-22 | 2018-01-24 | Hoya株式会社 | Phase shift mask blank for manufacturing display device, phase shift mask for manufacturing display device, method for manufacturing the same, and method for manufacturing display device |
| JP6138676B2 (en) * | 2013-12-27 | 2017-05-31 | Hoya株式会社 | Phase shift mask blank, method for manufacturing the same, and method for manufacturing the phase shift mask |
| JP6292581B2 (en) * | 2014-03-30 | 2018-03-14 | Hoya株式会社 | Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method |
| JP6104852B2 (en) * | 2014-07-14 | 2017-03-29 | Hoya株式会社 | Mask blank manufacturing method, phase shift mask manufacturing method, and semiconductor device manufacturing method |
| JP6313678B2 (en) * | 2014-07-14 | 2018-04-18 | Hoya株式会社 | Mask blank manufacturing method, phase shift mask manufacturing method, and semiconductor device manufacturing method |
| US10018905B2 (en) * | 2015-04-06 | 2018-07-10 | S & S Tech Co., Ltd | Phase shift blankmask and photomask |
| KR101617727B1 (en) | 2015-07-24 | 2016-05-03 | 주식회사 에스앤에스텍 | Blankmask and Photomask using the same |
| JP6621626B2 (en) * | 2015-09-18 | 2019-12-18 | Hoya株式会社 | Mask blank, phase shift mask, and semiconductor device manufacturing method |
| JP6742184B2 (en) * | 2016-07-26 | 2020-08-19 | アルバック成膜株式会社 | Method of manufacturing phase shifter film, method of manufacturing phase shift mask blank, and method of manufacturing phase shift mask |
| JP6677139B2 (en) * | 2016-09-28 | 2020-04-08 | 信越化学工業株式会社 | Manufacturing method of halftone phase shift type photomask blank |
| JP6772037B2 (en) * | 2016-11-11 | 2020-10-21 | Hoya株式会社 | Mask blank, transfer mask, transfer mask manufacturing method and semiconductor device manufacturing method |
| JP6532919B2 (en) * | 2017-09-07 | 2019-06-19 | Hoya株式会社 | Phase shift mask blank for manufacturing display device, phase shift mask for manufacturing display device, and method of manufacturing display device |
| SG11202002544SA (en) * | 2017-09-21 | 2020-04-29 | Hoya Corp | Mask blank, transfer mask, and method for manufacturing semiconductor device |
| SG11202005137VA (en) * | 2017-12-26 | 2020-07-29 | Hoya Corp | Mask blank, phase shift mask, and method of manufacturing semiconductor device |
| CN110184655B (en) * | 2019-04-25 | 2022-01-11 | 上海新傲科技股份有限公司 | Surface oxidation method of wafer |
| KR102444967B1 (en) * | 2021-04-29 | 2022-09-16 | 에스케이씨솔믹스 주식회사 | Blank mask and photomask using the same |
| KR102465982B1 (en) * | 2021-07-13 | 2022-11-09 | 에스케이씨솔믹스 주식회사 | Blank mask and photomask using the same |
| KR102503790B1 (en) * | 2021-10-07 | 2023-02-23 | 에스케이엔펄스 주식회사 | Blank mask and photomask using the same |
| TWI796907B (en) * | 2021-12-28 | 2023-03-21 | 宏碁股份有限公司 | Light curing apparatus and method for manufacturing display device |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0917712A (en) * | 1995-06-28 | 1997-01-17 | Toppan Printing Co Ltd | Method for forming x-ray transmission support film of mask blank for x-ray exposure |
| JPH0980736A (en) * | 1995-09-18 | 1997-03-28 | Toshiba Corp | Mask for exposure and its production |
| JP3396431B2 (en) | 1998-08-10 | 2003-04-14 | 東京エレクトロン株式会社 | Oxidation treatment method and oxidation treatment device |
| AU4291099A (en) * | 1998-09-30 | 2000-04-17 | Nikon Corporation | Photomask and exposure method |
| JP2002090978A (en) | 2000-09-12 | 2002-03-27 | Hoya Corp | Method of manufacturing phase shift mask blank and apparatus for manufacturing phase shift mask blank |
| JP3608654B2 (en) | 2000-09-12 | 2005-01-12 | Ｈｏｙａ株式会社 | Phase shift mask blank, phase shift mask |
| JP2004318184A (en) * | 2000-09-12 | 2004-11-11 | Hoya Corp | Phase shift mask blank and phase shift mask |
| JP3722029B2 (en) | 2000-09-12 | 2005-11-30 | Ｈｏｙａ株式会社 | Phase shift mask blank manufacturing method and phase shift mask manufacturing method |
| JP3641460B2 (en) * | 2002-02-22 | 2005-04-20 | Ｈｏｙａ株式会社 | Halftone phase shift mask blank and halftone phase shift mask |
| DE10307545A1 (en) | 2002-02-22 | 2003-11-06 | Hoya Corp | Crop for halftone phase shift mask and associated phase shift mask |
| JP4076989B2 (en) | 2004-10-15 | 2008-04-16 | Ｈｏｙａ株式会社 | Phase shift mask blanks and phase shift masks |
| JP4930964B2 (en) | 2005-05-20 | 2012-05-16 | Ｈｏｙａ株式会社 | Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask |
| KR100818676B1 (en) * | 2006-01-20 | 2008-04-01 | 주식회사 에스앤에스텍 | Sputtering target for half-tone phase shift blankmask, half-tone phase shift blankmask and photomask and manufacturing method thereof |
| KR20070096922A (en) * | 2006-03-24 | 2007-10-02 | 주식회사 에스앤에스텍 | Half-tone phase shift blankmask and photomask using the same |
| JP5702920B2 (en) | 2008-06-25 | 2015-04-15 | Hoya株式会社 | Phase shift mask blank, phase shift mask, and method of manufacturing phase shift mask blank |
| KR101656456B1 (en) * | 2009-10-30 | 2016-09-12 | 삼성전자주식회사 | Half-tone phase shift photomask blank and half-tone phase shift photomask and methods of fabricating the same |
| US8999609B2 (en) * | 2010-04-09 | 2015-04-07 | Hoya Corporation | Phase shift mask blank, method of manufacturing the same, and phase shift mask |
| US8535855B2 (en) * | 2010-05-19 | 2013-09-17 | Hoya Corporation | Mask blank manufacturing method, transfer mask manufacturing method, mask blank, and transfer mask |
| JP4974194B2 (en) * | 2010-06-21 | 2012-07-11 | Ｈｏｙａ株式会社 | Photomask blank manufacturing method |
| SG11201406324PA (en) | 2012-05-16 | 2014-11-27 | Hoya Corp | Mask blank, transfer mask, and methods of manufacturing the same |
-
2013
- 2013-01-30 JP JP2013015458A patent/JP5286455B1/en active Active
- 2013-02-08 SG SG11201405526UA patent/SG11201405526UA/en unknown
- 2013-02-08 WO PCT/JP2013/053053 patent/WO2013140887A1/en active Application Filing
- 2013-02-08 KR KR1020147012378A patent/KR101430395B1/en active IP Right Grant
- 2013-02-08 SG SG10201605431QA patent/SG10201605431QA/en unknown
- 2013-02-08 US US14/385,205 patent/US9470970B2/en active Active
- 2013-02-08 SG SG10201509797RA patent/SG10201509797RA/en unknown
- 2013-02-08 KR KR1020167001064A patent/KR101922309B1/en active IP Right Grant
- 2013-02-08 KR KR1020147012501A patent/KR101588150B1/en active IP Right Grant
- 2013-02-21 TW TW105125497A patent/TWI610125B/en active
- 2013-02-21 TW TW102106075A patent/TWI585515B/en active
- 2013-06-03 JP JP2013116620A patent/JP5530550B2/en active Active
-
2014
- 2014-04-18 JP JP2014086232A patent/JP5976715B2/en active Active
-
2016
- 2016-09-21 US US15/271,743 patent/US9952498B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW201346434A (en) | 2013-11-16 |
| JP5286455B1 (en) | 2013-09-11 |
| KR20140070660A (en) | 2014-06-10 |
| JP5530550B2 (en) | 2014-06-25 |
| SG11201405526UA (en) | 2014-11-27 |
| WO2013140887A1 (en) | 2013-09-26 |
| JP2013225139A (en) | 2013-10-31 |
| KR101588150B1 (en) | 2016-01-25 |
| KR101922309B1 (en) | 2018-11-26 |
| KR20160009711A (en) | 2016-01-26 |
| JP2014194547A (en) | 2014-10-09 |
| KR101430395B1 (en) | 2014-08-13 |
| KR20140127203A (en) | 2014-11-03 |
| US20170010526A1 (en) | 2017-01-12 |
| JP2013225109A (en) | 2013-10-31 |
| SG10201605431QA (en) | 2016-08-30 |
| TWI610125B (en) | 2018-01-01 |
| JP5976715B2 (en) | 2016-08-24 |
| US20150072273A1 (en) | 2015-03-12 |
| TW201642021A (en) | 2016-12-01 |
| US9470970B2 (en) | 2016-10-18 |
| US9952498B2 (en) | 2018-04-24 |
| TWI585515B (en) | 2017-06-01 |
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