SG10201607848SA - Mask blank, transfer mask, and methods of manufacturing the same - Google Patents

Mask blank, transfer mask, and methods of manufacturing the same

Info

Publication number
SG10201607848SA
SG10201607848SA SG10201607848SA SG10201607848SA SG10201607848SA SG 10201607848S A SG10201607848S A SG 10201607848SA SG 10201607848S A SG10201607848S A SG 10201607848SA SG 10201607848S A SG10201607848S A SG 10201607848SA SG 10201607848S A SG10201607848S A SG 10201607848SA
Authority
SG
Singapore
Prior art keywords
mask
manufacturing
methods
same
transfer
Prior art date
Application number
SG10201607848SA
Inventor
Teiichiro Umezawa
Masafumi Ishiyama
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG10201607848SA publication Critical patent/SG10201607848SA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
SG10201607848SA 2012-05-16 2013-05-09 Mask blank, transfer mask, and methods of manufacturing the same SG10201607848SA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012112333 2012-05-16

Publications (1)

Publication Number Publication Date
SG10201607848SA true SG10201607848SA (en) 2016-11-29

Family

ID=49583654

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201406324PA SG11201406324PA (en) 2012-05-16 2013-05-09 Mask blank, transfer mask, and methods of manufacturing the same
SG10201607848SA SG10201607848SA (en) 2012-05-16 2013-05-09 Mask blank, transfer mask, and methods of manufacturing the same

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG11201406324PA SG11201406324PA (en) 2012-05-16 2013-05-09 Mask blank, transfer mask, and methods of manufacturing the same

Country Status (6)

Country Link
US (2) US9470971B2 (en)
JP (2) JP6173765B2 (en)
KR (1) KR102123702B1 (en)
SG (2) SG11201406324PA (en)
TW (2) TWI615669B (en)
WO (1) WO2013172248A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5286455B1 (en) 2012-03-23 2013-09-11 Ｈｏｙａ株式会社 Mask blank, transfer mask, and manufacturing method thereof
SG11201406324PA (en) * 2012-05-16 2014-11-27 Hoya Corp Mask blank, transfer mask, and methods of manufacturing the same
JP6387245B2 (en) 2014-05-15 2018-09-05 日産自動車株式会社 Engine waste heat utilization device
JP6418035B2 (en) * 2015-03-31 2018-11-07 信越化学工業株式会社 Phase shift mask blanks and phase shift masks
JP6621626B2 (en) * 2015-09-18 2019-12-18 Hoya株式会社 Mask blank, phase shift mask, and semiconductor device manufacturing method
JP6500791B2 (en) * 2016-01-22 2019-04-17 信越化学工業株式会社 Halftone phase shift photomask blank and method of manufacturing the same
JP6947207B2 (en) * 2016-09-28 2021-10-13 信越化学工業株式会社 Halftone phase shift photomask blank and halftone phase shift photomask
JP6677139B2 (en) * 2016-09-28 2020-04-08 信越化学工業株式会社 Manufacturing method of halftone phase shift type photomask blank
JP2021170128A (en) * 2019-10-01 2021-10-28 信越化学工業株式会社 Halftone phase shift photomask blank and halftone phase shift photomask
US11869538B2 (en) 2020-03-06 2024-01-09 Hoya Corporation Method for manufacturing glass spacer, glass spacer, and hard disk drive device
JP7346527B2 (en) 2021-11-25 2023-09-19 Hoya株式会社 Mask blank, transfer mask, mask blank manufacturing method, transfer mask manufacturing method, and display device manufacturing method

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3431313B2 (en) 1994-11-08 2003-07-28 株式会社東芝 Exposure substrate, exposure mask, and method of manufacturing exposure substrate
JPH0980736A (en) * 1995-09-18 1997-03-28 Toshiba Corp Mask for exposure and its production
JP2996613B2 (en) 1995-12-27 2000-01-11 ホーヤ株式会社 Phase shift mask blank and method of manufacturing phase shift mask
JPH11258772A (en) * 1998-03-16 1999-09-24 Toppan Printing Co Ltd Halftone phase shift mask blank and halftone phase shift mask
JP3528042B2 (en) 2000-01-24 2004-05-17 ウシオ電機株式会社 Light heating device
JP2002090978A (en) 2000-09-12 2002-03-27 Hoya Corp Method of manufacturing phase shift mask blank and apparatus for manufacturing phase shift mask blank
JP3722029B2 (en) 2000-09-12 2005-11-30 Ｈｏｙａ株式会社 Phase shift mask blank manufacturing method and phase shift mask manufacturing method
JP4158885B2 (en) 2002-04-22 2008-10-01 Ｈｏｙａ株式会社 Photomask blank manufacturing method
JP4049372B2 (en) 2002-10-23 2008-02-20 Ｈｏｙａ株式会社 Method for manufacturing halftone phase shift mask blanks
US6872496B2 (en) * 2002-10-31 2005-03-29 Taiwan Semiconductor Manufacturing Company AlSixOy as a new bi-layer high transmittance attenuating phase shifting mask material for 193 nanometer lithography
JP4336206B2 (en) 2004-01-07 2009-09-30 Ｈｏｙａ株式会社 Mask blank manufacturing method and mask blank manufacturing sputtering target
JP3828119B2 (en) * 2004-04-19 2006-10-04 大日本印刷株式会社 Method for manufacturing halftone phase shift mask
JP4766507B2 (en) 2005-03-30 2011-09-07 Ｈｏｙａ株式会社 Phase shift mask blank and method of manufacturing phase shift mask
JP4930964B2 (en) * 2005-05-20 2012-05-16 Ｈｏｙａ株式会社 Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask
JP5254581B2 (en) * 2007-08-22 2013-08-07 Ｈｏｙａ株式会社 Photomask and photomask manufacturing method
JP5349819B2 (en) * 2008-03-25 2013-11-20 大日本スクリーン製造株式会社 Heat treatment equipment
JP4489820B2 (en) * 2008-03-31 2010-06-23 Ｈｏｙａ株式会社 Phase shift mask blank manufacturing method and phase shift mask blank manufacturing apparatus
JP5409298B2 (en) * 2009-11-26 2014-02-05 Ｈｏｙａ株式会社 Mask blank, transfer mask, and manufacturing method thereof
SG11201406324PA (en) * 2012-05-16 2014-11-27 Hoya Corp Mask blank, transfer mask, and methods of manufacturing the same

Also Published As

Publication number Publication date
WO2013172248A1 (en) 2013-11-21
KR102123702B1 (en) 2020-06-16
JP6482608B2 (en) 2019-03-13
JP2017173857A (en) 2017-09-28
US9946153B2 (en) 2018-04-17
US20150104735A1 (en) 2015-04-16
TWI615669B (en) 2018-02-21
JP2013257544A (en) 2013-12-26
SG11201406324PA (en) 2014-11-27
US9470971B2 (en) 2016-10-18
TWI600779B (en) 2017-10-01
TW201350596A (en) 2013-12-16
TW201736942A (en) 2017-10-16
JP6173765B2 (en) 2017-08-02
US20170003583A1 (en) 2017-01-05
KR20150013426A (en) 2015-02-05

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