SG10201406128XA - Method of manufacturing a mask blank and method of manufacturing a transfer mask - Google Patents

Method of manufacturing a mask blank and method of manufacturing a transfer mask

Info

Publication number
SG10201406128XA
SG10201406128XA SG10201406128XA SG10201406128XA SG10201406128XA SG 10201406128X A SG10201406128X A SG 10201406128XA SG 10201406128X A SG10201406128X A SG 10201406128XA SG 10201406128X A SG10201406128X A SG 10201406128XA SG 10201406128X A SG10201406128X A SG 10201406128XA
Authority
SG
Singapore
Prior art keywords
manufacturing
mask
transfer
mask blank
blank
Prior art date
Application number
SG10201406128XA
Inventor
Umezawa Teiichiro
Original Assignee
Hoya Corp
Hoya Electronics Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Singapore Pte Ltd filed Critical Hoya Corp
Publication of SG10201406128XA publication Critical patent/SG10201406128XA/en

Links

SG10201406128XA 2013-09-26 2014-09-26 Method of manufacturing a mask blank and method of manufacturing a transfer mask SG10201406128XA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013199490A JP6261929B2 (en) 2013-09-26 2013-09-26 Mask blank manufacturing method and transfer mask manufacturing method

Publications (1)

Publication Number Publication Date
SG10201406128XA true SG10201406128XA (en) 2015-04-29

Family

ID=52832442

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201406128XA SG10201406128XA (en) 2013-09-26 2014-09-26 Method of manufacturing a mask blank and method of manufacturing a transfer mask

Country Status (2)

Country Link
JP (1) JP6261929B2 (en)
SG (1) SG10201406128XA (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018095922A (en) * 2016-12-13 2018-06-21 国立大学法人名古屋大学 Film deposition apparatus
JP2019148002A (en) * 2018-02-28 2019-09-05 国立大学法人名古屋大学 Film deposition apparatus
JP7134009B2 (en) * 2018-07-31 2022-09-09 東京エレクトロン株式会社 Film forming apparatus and film forming method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3332839B2 (en) * 1997-02-19 2002-10-07 キヤノン株式会社 Thin film forming apparatus and thin film forming method using the same
JP2002169265A (en) * 2000-12-01 2002-06-14 Hoya Corp Photomask blank and method of manufacturing photomask blank
US20050029091A1 (en) * 2003-07-21 2005-02-10 Chan Park Apparatus and method for reactive sputtering deposition
JP4336206B2 (en) * 2004-01-07 2009-09-30 Ｈｏｙａ株式会社 Mask blank manufacturing method and mask blank manufacturing sputtering target
JP4376637B2 (en) * 2004-01-14 2009-12-02 Ｈｏｙａ株式会社 Sputtering target and mask blank manufacturing method using the same
JP4537479B2 (en) * 2008-11-28 2010-09-01 キヤノンアネルバ株式会社 Sputtering equipment
JP5914035B2 (en) * 2012-02-23 2016-05-11 Hoya株式会社 Mask blank manufacturing method and transfer mask manufacturing method

Also Published As

Publication number Publication date
JP2015064531A (en) 2015-04-09
JP6261929B2 (en) 2018-01-17

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