SG10201503287YA - Method of manufacturing mask blank with resist film, method of manufacturing transfer mask, mask blank with resist film, method of manufacturing mask blank, and mask blank - Google Patents

Method of manufacturing mask blank with resist film, method of manufacturing transfer mask, mask blank with resist film, method of manufacturing mask blank, and mask blank

Info

Publication number
SG10201503287YA
SG10201503287YA SG10201503287YA SG10201503287YA SG10201503287YA SG 10201503287Y A SG10201503287Y A SG 10201503287YA SG 10201503287Y A SG10201503287Y A SG 10201503287YA SG 10201503287Y A SG10201503287Y A SG 10201503287YA SG 10201503287Y A SG10201503287Y A SG 10201503287YA
Authority
SG
Singapore
Prior art keywords
mask blank
manufacturing
resist film
mask
blank
Prior art date
Application number
SG10201503287YA
Inventor
Hashimoto Masahiro
Shiratori Hiroshi
Honma Yusuke
Kondo Mitsuru
Original Assignee
Hoya Corp
Hoya Electronics Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Singapore Pte Ltd filed Critical Hoya Corp
Publication of SG10201503287YA publication Critical patent/SG10201503287YA/en

Links

SG10201503287YA 2014-05-08 2015-04-27 Method of manufacturing mask blank with resist film, method of manufacturing transfer mask, mask blank with resist film, method of manufacturing mask blank, and mask blank SG10201503287YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014096718A JP6381961B2 (en) 2014-05-08 2014-05-08 Manufacturing method of mask blank with resist film, manufacturing method of transfer mask, mask blank with resist film, manufacturing method of mask blank, and mask blank

Publications (1)

Publication Number Publication Date
SG10201503287YA true SG10201503287YA (en) 2015-12-30

Family

ID=54752362

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201503287YA SG10201503287YA (en) 2014-05-08 2015-04-27 Method of manufacturing mask blank with resist film, method of manufacturing transfer mask, mask blank with resist film, method of manufacturing mask blank, and mask blank

Country Status (2)

Country Link
JP (1) JP6381961B2 (en)
SG (1) SG10201503287YA (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3607903B2 (en) * 2001-09-28 2005-01-05 Ｈｏｙａ株式会社 Mask blank, unnecessary film removing method and apparatus, and mask blank and mask manufacturing method
JP4413901B2 (en) * 2006-09-11 2010-02-10 Ｈｏｙａ株式会社 Unnecessary film removing apparatus, unnecessary film removing method, and mask blank manufacturing method
JP5015537B2 (en) * 2006-09-26 2012-08-29 Ｈｏｙａ株式会社 Photomask manufacturing method and pattern transfer method
JP4536804B2 (en) * 2008-06-27 2010-09-01 Ｈｏｙａ株式会社 Photomask manufacturing method
JP5437124B2 (en) * 2010-03-18 2014-03-12 株式会社ニューフレアテクノロジー Charged particle beam drawing method and charged particle beam drawing apparatus

Also Published As

Publication number Publication date
JP6381961B2 (en) 2018-08-29
JP2015215404A (en) 2015-12-03

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