SG10201502181TA - Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, and method of manufacturing a transfer mask - Google Patents

Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, and method of manufacturing a transfer mask

Info

Publication number
SG10201502181TA
SG10201502181TA SG10201502181TA SG10201502181TA SG10201502181TA SG 10201502181T A SG10201502181T A SG 10201502181TA SG 10201502181T A SG10201502181T A SG 10201502181TA SG 10201502181T A SG10201502181T A SG 10201502181TA SG 10201502181T A SG10201502181T A SG 10201502181TA
Authority
SG
Singapore
Prior art keywords
manufacturing
mask
mask blank
transfer
substrate
Prior art date
Application number
SG10201502181TA
Inventor
Yamada Takeyuki
Hanaoka Osamu
Harada Kazuaki
Original Assignee
Hoya Corp
Hoya Electronics Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Singapore Pte Ltd filed Critical Hoya Corp
Publication of SG10201502181TA publication Critical patent/SG10201502181TA/en

Links

SG10201502181TA 2014-03-25 2015-03-20 Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, and method of manufacturing a transfer mask SG10201502181TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014061500A JP6411046B2 (en) 2014-03-25 2014-03-25 Mask blank substrate manufacturing method, mask blank manufacturing method, and transfer mask manufacturing method

Publications (1)

Publication Number Publication Date
SG10201502181TA true SG10201502181TA (en) 2015-10-29

Family

ID=54351105

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201502181TA SG10201502181TA (en) 2014-03-25 2015-03-20 Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, and method of manufacturing a transfer mask

Country Status (2)

Country Link
JP (1) JP6411046B2 (en)
SG (1) SG10201502181TA (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI675905B (en) * 2015-11-14 2019-11-01 日商東京威力科創股份有限公司 Method of treating a microelectronic substrate using dilute tmah
KR102041309B1 (en) * 2017-10-16 2019-11-06 세메스 주식회사 Method for washing mask

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0837143A (en) * 1994-07-25 1996-02-06 Fuji Xerox Co Ltd Semiconductor treatmnt apparatus
JP4318209B2 (en) * 2004-02-09 2009-08-19 Ｈｏｙａ株式会社 Photomask blank manufacturing method and photomask manufacturing method
US20070068558A1 (en) * 2005-09-06 2007-03-29 Applied Materials, Inc. Apparatus and methods for mask cleaning

Also Published As

Publication number Publication date
JP2015184523A (en) 2015-10-22
JP6411046B2 (en) 2018-10-24

Similar Documents

Publication Publication Date Title
SG11201610771SA (en) Method of manufacturing a substrate
EP3168862A4 (en) Semiconductor substrate and semiconductor substrate production method
SG10201911774WA (en) Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
SG11201800548TA (en) Mask blank, phase shift mask, and method for manufacturing semiconductor device
SG10201406183VA (en) Method of manufacturing a mask blank and method of manufacturing a transfer mask
SG11201705165QA (en) Photomask blank, method for manufacturing photomask, and mask pattern formation method
SG11201505421SA (en) Method for manufacturing mask blank substrate, method for manufacturing mask blank and method for manufacturing transfer mask
SG10202007863UA (en) Mask blank, transfer mask, and method of manufacturing semiconductor device
SG10201607715RA (en) Photomask Blank, Making Method, and Photomask
GB2541146B (en) Method of manufacturing a germanium-on-insulator substrate
IL249047A0 (en) Lithographic apparatus, method of transferring a substrate and device manufacturing method
HK1208301A2 (en) Mask and manufacturing method thereof
PL3227194T3 (en) A package assembly, a blank and a method of manufacturing a package assembly
EP3101160A4 (en) Semiconductor substrate manufacturing method
HUE047589T2 (en) Method for producing a substrate adapter, substrate adapter and method for contacting a semiconductor element
PL3135645T3 (en) Coating film-equipped glass substrate, and method for producing coating film-equipped glass substrate
GB201901741D0 (en) Method of manufacturing a tampon
SG10201912471WA (en) Annular glass blank, method for manufacturing annular glass blank, method for manufacturing annular glass substrate, and method for manufacturing magnetic-disk glass substrate
SG10201406128XA (en) Method of manufacturing a mask blank and method of manufacturing a transfer mask
SG10201502181TA (en) Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, and method of manufacturing a transfer mask
PL3152503T3 (en) An air disperser for spray-drying, and a method for manufacturing an air disperser comprising metal forming
GB2566706B (en) A method of manufacturing a security sheet
SG10201605276WA (en) Inorganic material film, photomask blank, and method for manufacturing photomask
SG10201601758XA (en) Mask Blank And Making Method
PL3221068T3 (en) Method for manufacturing a rotationally symmetrical shaped article