SG10201601758XA - Mask Blank And Making Method - Google Patents

Mask Blank And Making Method

Info

Publication number
SG10201601758XA
SG10201601758XA SG10201601758XA SG10201601758XA SG10201601758XA SG 10201601758X A SG10201601758X A SG 10201601758XA SG 10201601758X A SG10201601758X A SG 10201601758XA SG 10201601758X A SG10201601758X A SG 10201601758XA SG 10201601758X A SG10201601758X A SG 10201601758XA
Authority
SG
Singapore
Prior art keywords
mask blank
making method
blank
mask
making
Prior art date
Application number
SG10201601758XA
Inventor
Yukio Inazuki
Hideo Kaneko
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of SG10201601758XA publication Critical patent/SG10201601758XA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
SG10201601758XA 2015-03-13 2016-03-07 Mask Blank And Making Method SG10201601758XA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015050806A JP6428400B2 (en) 2015-03-13 2015-03-13 Mask blanks and manufacturing method thereof

Publications (1)

Publication Number Publication Date
SG10201601758XA true SG10201601758XA (en) 2016-10-28

Family

ID=56887636

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201601758XA SG10201601758XA (en) 2015-03-13 2016-03-07 Mask Blank And Making Method

Country Status (5)

Country Link
US (1) US10488750B2 (en)
JP (1) JP6428400B2 (en)
KR (1) KR102173679B1 (en)
SG (1) SG10201601758XA (en)
TW (1) TWI684061B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7354032B2 (en) * 2020-03-19 2023-10-02 Hoya株式会社 Mask blank, transfer mask, and semiconductor device manufacturing method
US20220390825A1 (en) * 2021-05-27 2022-12-08 AGC Inc. Electroconductive-film-coated substrate and reflective mask blank

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5568627A (en) 1978-11-16 1980-05-23 Pioneer Electronic Corp Mask for manufucturing integrated circuit and production thereof
JPS593437A (en) * 1982-06-30 1984-01-10 Fujitsu Ltd Substrate for manufacturing semiconductor device
JPH04371952A (en) * 1991-06-21 1992-12-24 Nec Corp Hard mask
JP2863131B2 (en) 1996-05-08 1999-03-03 ホーヤ株式会社 Method of manufacturing photomask blanks
US6472107B1 (en) 1999-09-30 2002-10-29 Photronics, Inc. Disposable hard mask for photomask plasma etching
JP2002090977A (en) * 2000-09-12 2002-03-27 Hoya Corp Phase shift mask blank, photomask blank as well as manufacturing apparatus and manufacturing method for the same
US6440879B1 (en) * 2001-01-05 2002-08-27 Integrated Device Technology, Inc. Physical vapor deposition apparatus with modified shutter disk and cover ring
JPWO2004051369A1 (en) * 2002-12-03 2006-04-06 Hoya株式会社 Photomask blank and photomask
KR101161450B1 (en) 2003-04-09 2012-07-20 호야 가부시키가이샤 Method of producing photomask and photomask blank
JP5028437B2 (en) * 2009-01-27 2012-09-19 Ｈｏｙａ株式会社 Manufacturing method of glass substrate for mask blank, manufacturing method of mask blank, and manufacturing method of photomask for exposure
JP4853685B2 (en) * 2009-03-31 2012-01-11 信越化学工業株式会社 Inspection method and pass / fail judgment method for photomask blank or manufacturing intermediate thereof
US9017902B2 (en) 2009-06-18 2015-04-28 Hoya Corporation Mask blank, transfer mask, and method of manufacturing a transfer mask
JP5368392B2 (en) * 2010-07-23 2013-12-18 信越化学工業株式会社 Processed substrate in which resist film for electron beam and organic conductive film are laminated, method for manufacturing the processed substrate, and method for forming resist pattern
JP5629240B2 (en) * 2011-05-31 2014-11-19 信越化学工業株式会社 Flash irradiation device
JP4930737B2 (en) 2011-09-21 2012-05-16 信越化学工業株式会社 Photomask blank and binary mask manufacturing method
JP2013140236A (en) * 2011-12-29 2013-07-18 Hoya Corp Mask blank and method for manufacturing phase shift mask
KR102110845B1 (en) * 2012-07-31 2020-05-14 호야 가부시키가이샤 Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device
JP6100096B2 (en) * 2013-05-29 2017-03-22 Hoya株式会社 Mask blank, phase shift mask, manufacturing method thereof, and manufacturing method of semiconductor device
KR102211544B1 (en) 2013-01-15 2021-02-02 호야 가부시키가이샤 Mask blank, phase-shift mask, and method for manufacturing semiconductor device

Also Published As

Publication number Publication date
JP2016170320A (en) 2016-09-23
US10488750B2 (en) 2019-11-26
TWI684061B (en) 2020-02-01
US20160266485A1 (en) 2016-09-15
JP6428400B2 (en) 2018-11-28
KR20160110174A (en) 2016-09-21
KR102173679B1 (en) 2020-11-03
TW201702734A (en) 2017-01-16

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