SG111234A1 - Lithographic apparatus and device manufacturing method, and measurement system - Google Patents

Lithographic apparatus and device manufacturing method, and measurement system

Info

Publication number
SG111234A1
SG111234A1 SG200406150A SG200406150A SG111234A1 SG 111234 A1 SG111234 A1 SG 111234A1 SG 200406150 A SG200406150 A SG 200406150A SG 200406150 A SG200406150 A SG 200406150A SG 111234 A1 SG111234 A1 SG 111234A1
Authority
SG
Singapore
Prior art keywords
measurement system
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200406150A
Other languages
English (en)
Inventor
Marcel Hendrikus Maria Beems
Der Pasch Engelbertus Anto Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG111234A1 publication Critical patent/SG111234A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG200406150A 2003-10-22 2004-10-19 Lithographic apparatus and device manufacturing method, and measurement system SG111234A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03078338 2003-10-22

Publications (1)

Publication Number Publication Date
SG111234A1 true SG111234A1 (en) 2005-05-30

Family

ID=34639288

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200406150A SG111234A1 (en) 2003-10-22 2004-10-19 Lithographic apparatus and device manufacturing method, and measurement system

Country Status (6)

Country Link
US (1) US20050128461A1 (ko)
JP (2) JP4099472B2 (ko)
KR (1) KR100665749B1 (ko)
CN (3) CN100476588C (ko)
SG (1) SG111234A1 (ko)
TW (1) TWI295408B (ko)

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US8054472B2 (en) 2006-02-21 2011-11-08 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
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TWI425318B (zh) * 2006-06-09 2014-02-01 尼康股份有限公司 移動體裝置、曝光裝置和曝光方法以及元件製造方法
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KR101749442B1 (ko) 2006-08-31 2017-06-20 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
SG10201407395SA (en) * 2006-08-31 2014-12-30 Nikon Corp Movable Body Drive Method And Movable Body Drive System, Pattern Formation Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method
TWI434326B (zh) 2006-09-01 2014-04-11 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, component manufacturing method, and correcting method
EP2993523B1 (en) 2006-09-01 2017-08-30 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
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US8237919B2 (en) * 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US9013681B2 (en) * 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US9256140B2 (en) * 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8422015B2 (en) * 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
CN101680746B (zh) * 2007-12-11 2013-11-20 株式会社尼康 移动体装置、曝光装置及图案形成装置、以及器件制造方法
US8711327B2 (en) * 2007-12-14 2014-04-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8115906B2 (en) * 2007-12-14 2012-02-14 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
NL1036323A1 (nl) * 2007-12-27 2009-06-30 Asml Holding Nv Folded optical encoder and applications for same.
NL1036404A1 (nl) * 2008-01-10 2009-07-13 Asml Netherlands Bv Lithographic apparatus with an encoder arranged for defining a zero level.
CN101796614B (zh) * 2008-02-08 2012-01-18 株式会社尼康 位置测量系统及位置测量方法、移动体装置、移动体驱动方法、曝光装置及曝光方法、图案形成装置、以及组件制造方法
NL1036618A1 (nl) * 2008-03-24 2009-09-25 Asml Netherlands Bv Encoder-type measurement system, lithograpic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system.
US8274639B2 (en) * 2008-04-30 2012-09-25 Nikon Corporation Stage device, pattern formation apparatus, exposure apparatus, stage drive method, exposure method, and device manufacturing method
US8817236B2 (en) * 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US8228482B2 (en) * 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8786829B2 (en) 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8760629B2 (en) * 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8902402B2 (en) * 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
US8514395B2 (en) 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110102761A1 (en) * 2009-09-28 2011-05-05 Nikon Corporation Stage apparatus, exposure apparatus, and device fabricating method
US20110096312A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096318A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096306A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
NL2005414A (en) * 2009-10-28 2011-05-02 Asml Netherlands Bv Lithographic apparatus and patterning device.
US20110128523A1 (en) * 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110123913A1 (en) * 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
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CN102841506B (zh) * 2011-06-22 2014-11-12 上海微电子装备有限公司 一种激光干涉仪测量系统及其测量方法
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CN107024176A (zh) * 2016-02-01 2017-08-08 上海微电子装备有限公司 基于衍射光栅的位移测量系统及方法

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Also Published As

Publication number Publication date
TWI295408B (en) 2008-04-01
TW200519531A (en) 2005-06-16
CN100476588C (zh) 2009-04-08
KR20050039649A (ko) 2005-04-29
CN101398633A (zh) 2009-04-01
CN1609713A (zh) 2005-04-27
CN101398634A (zh) 2009-04-01
CN101398633B (zh) 2011-12-21
JP4099472B2 (ja) 2008-06-11
JP2008182249A (ja) 2008-08-07
JP4961364B2 (ja) 2012-06-27
US20050128461A1 (en) 2005-06-16
CN101398634B (zh) 2012-01-04
JP2005229091A (ja) 2005-08-25
KR100665749B1 (ko) 2007-01-09

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