SG102525A1 - Radiation sensitive composition - Google Patents

Radiation sensitive composition

Info

Publication number
SG102525A1
SG102525A1 SG9703757A SG1997003757A SG102525A1 SG 102525 A1 SG102525 A1 SG 102525A1 SG 9703757 A SG9703757 A SG 9703757A SG 1997003757 A SG1997003757 A SG 1997003757A SG 102525 A1 SG102525 A1 SG 102525A1
Authority
SG
Singapore
Prior art keywords
radiation sensitive
sensitive composition
composition
radiation
sensitive
Prior art date
Application number
SG9703757A
Other languages
English (en)
Inventor
Takeda Takashi
Original Assignee
Clariant Finance Bvi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Finance Bvi Ltd filed Critical Clariant Finance Bvi Ltd
Publication of SG102525A1 publication Critical patent/SG102525A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
SG9703757A 1996-10-25 1997-10-16 Radiation sensitive composition SG102525A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28429396A JP3376222B2 (ja) 1996-10-25 1996-10-25 放射線感応性組成物

Publications (1)

Publication Number Publication Date
SG102525A1 true SG102525A1 (en) 2004-03-26

Family

ID=17676662

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9703757A SG102525A1 (en) 1996-10-25 1997-10-16 Radiation sensitive composition

Country Status (7)

Country Link
US (1) US5962187A (ko)
EP (1) EP0838727B1 (ko)
JP (1) JP3376222B2 (ko)
KR (1) KR100509884B1 (ko)
CN (1) CN1180849A (ko)
DE (1) DE69705283T2 (ko)
SG (1) SG102525A1 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4019403B2 (ja) * 1999-03-08 2007-12-12 Ｊｓｒ株式会社 レジストパターンの形成方法
JP3894477B2 (ja) * 2002-02-27 2007-03-22 Ａｚエレクトロニックマテリアルズ株式会社 感光性樹脂組成物
JP3986927B2 (ja) * 2002-08-22 2007-10-03 富士通株式会社 半導体装置の製造方法
JP2004341431A (ja) * 2003-05-19 2004-12-02 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物およびレジストパターンの形成方法
JP4647418B2 (ja) * 2005-07-19 2011-03-09 ダイセル化学工業株式会社 レジスト組成物
JP2007101715A (ja) * 2005-09-30 2007-04-19 Fujifilm Corp パターン形成方法及びそれに用いるレジスト組成物
US8182975B2 (en) * 2007-03-28 2012-05-22 Fujifilm Corporation Positive resist composition and pattern forming method using the same
JP6650696B2 (ja) * 2014-09-08 2020-02-19 信越化学工業株式会社 ドライフィルム積層体の製造方法
CN105600943A (zh) * 2015-12-28 2016-05-25 上海亘卓生物工程有限公司 一种利用微生物有效降低发酵废水中bod、cod水平的方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410277A1 (de) * 1989-07-27 1991-01-30 Hoechst Aktiengesellschaft Beschichtungslösung für die Herstellung negativ arbeitender lichtempfindlicher Aufzeichnungsmaterialen
EP0634696A1 (en) * 1993-07-15 1995-01-18 Japan Synthetic Rubber Co., Ltd. Chemically amplified resist composition
JPH07152155A (ja) * 1993-11-29 1995-06-16 Shin Etsu Chem Co Ltd ポジ型フォトレジスト組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH049063A (ja) * 1990-04-07 1992-01-13 Konica Corp 感光性組成物
JPH0748805B2 (ja) * 1990-05-28 1995-05-24 三菱電機株式会社 オート・トラッキング・モニタのｓ字補正コンデンサ切替装置
US5426017A (en) * 1990-05-31 1995-06-20 Hoechst Celanese Corporation Composition and method for removing photoresist composition from substrates surfaces
KR920005780B1 (ko) * 1990-06-16 1992-07-18 제일합섬 주식회사 내열성이 우수한 포토레지스트 조성물
JPH0692909A (ja) * 1992-04-10 1994-04-05 Sumitomo Chem Co Ltd 炭酸エステル環状化合物、その製造方法及びそれを用いてなるポジ型フォトレジスト組成物
US5612303B1 (en) * 1993-06-15 2000-07-18 Nitto Chemical Industry Co Ltd Solvent composition
JPH0736189A (ja) * 1993-07-15 1995-02-07 Japan Synthetic Rubber Co Ltd レジスト塗布組成物
US5458921A (en) * 1994-10-11 1995-10-17 Morton International, Inc. Solvent system for forming films of photoimageable compositions

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410277A1 (de) * 1989-07-27 1991-01-30 Hoechst Aktiengesellschaft Beschichtungslösung für die Herstellung negativ arbeitender lichtempfindlicher Aufzeichnungsmaterialen
EP0634696A1 (en) * 1993-07-15 1995-01-18 Japan Synthetic Rubber Co., Ltd. Chemically amplified resist composition
JPH07152155A (ja) * 1993-11-29 1995-06-16 Shin Etsu Chem Co Ltd ポジ型フォトレジスト組成物

Also Published As

Publication number Publication date
DE69705283T2 (de) 2001-10-31
JP3376222B2 (ja) 2003-02-10
KR19980033124A (ko) 1998-07-25
CN1180849A (zh) 1998-05-06
EP0838727B1 (en) 2001-06-20
EP0838727A1 (en) 1998-04-29
JPH10133363A (ja) 1998-05-22
KR100509884B1 (ko) 2005-11-16
DE69705283D1 (de) 2001-07-26
US5962187A (en) 1999-10-05

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