SG10202000508YA - Memory device based on multi-bit perpendicular magnetic tunnel junction - Google Patents

Memory device based on multi-bit perpendicular magnetic tunnel junction

Info

Publication number
SG10202000508YA
SG10202000508YA SG10202000508YA SG10202000508YA SG10202000508YA SG 10202000508Y A SG10202000508Y A SG 10202000508YA SG 10202000508Y A SG10202000508Y A SG 10202000508YA SG 10202000508Y A SG10202000508Y A SG 10202000508YA SG 10202000508Y A SG10202000508Y A SG 10202000508YA
Authority
SG
Singapore
Prior art keywords
memory device
device based
tunnel junction
perpendicular magnetic
magnetic tunnel
Prior art date
Application number
SG10202000508YA
Other languages
English (en)
Inventor
Jea Gun Park
Jong Ung Baek
Kei Ashiba
Jin Young Choi
Mi Ri Park
Hyun Gyu Lee
Han Sol Jun
Sun Hwa Jung
Original Assignee
Univ Hanyang Ind Univ Coop Found
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Hanyang Ind Univ Coop Found filed Critical Univ Hanyang Ind Univ Coop Found
Publication of SG10202000508YA publication Critical patent/SG10202000508YA/en

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/161Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/14Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
    • G11C11/15Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5607Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using magnetic storage elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3263Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being symmetric, e.g. for dual spin valve, e.g. NiO/Co/Cu/Co/Cu/Co/NiO
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3272Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/80Constructional details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/80Constructional details
    • H10N50/85Magnetic active materials
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165Auxiliary circuits
    • G11C11/1675Writing or programming circuits or methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3286Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Power Engineering (AREA)
  • Hall/Mr Elements (AREA)
  • Mram Or Spin Memory Techniques (AREA)
SG10202000508YA 2019-11-05 2020-01-20 Memory device based on multi-bit perpendicular magnetic tunnel junction SG10202000508YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020190140529A KR102117393B1 (ko) 2019-11-05 2019-11-05 멀티 비트 수직 자기 터널링 접합에 기반한 메모리 소자

Publications (1)

Publication Number Publication Date
SG10202000508YA true SG10202000508YA (en) 2021-06-29

Family

ID=71083095

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202000508YA SG10202000508YA (en) 2019-11-05 2020-01-20 Memory device based on multi-bit perpendicular magnetic tunnel junction

Country Status (5)

Country Link
US (1) US11296276B2 (ko)
KR (1) KR102117393B1 (ko)
CN (1) CN112786779B (ko)
SG (1) SG10202000508YA (ko)
TW (1) TWI734378B (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11169227B2 (en) * 2019-08-28 2021-11-09 Western Digital Technologies, Inc. Dual free layer TMR magnetic field sensor
US11152048B1 (en) * 2020-04-20 2021-10-19 Western Digital Technologies, Inc. Tunneling metamagnetic resistance memory device and methods of operating the same
US11200934B2 (en) 2020-04-20 2021-12-14 Western Digital Technologies, Inc. Tunneling metamagnetic resistance memory device and methods of operating the same
US12108610B2 (en) 2021-05-06 2024-10-01 Qualcomm Incorporated One transistor one magnetic tunnel junction multiple bit magnetoresistive random access memory cell
US20220367790A1 (en) * 2021-05-12 2022-11-17 Globalfoundries Singapore Pte. Ltd. Non-volatile memory elements formed in conjunction with a magnetic via
JP2023043732A (ja) * 2021-09-16 2023-03-29 キオクシア株式会社 磁気記憶装置
KR102693380B1 (ko) * 2023-03-21 2024-08-12 한양대학교 산학협력단 스커미온 메모리 소자 및 이를 이용한 크로스바 어레이 회로

Family Cites Families (15)

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JP2002334971A (ja) * 2001-05-09 2002-11-22 Nec Corp 磁性メモリ及びその動作方法
JP4970113B2 (ja) * 2007-03-30 2012-07-04 株式会社東芝 磁気抵抗素子及び磁気メモリ
US8907436B2 (en) 2010-08-24 2014-12-09 Samsung Electronics Co., Ltd. Magnetic devices having perpendicular magnetic tunnel junction
US9196332B2 (en) 2011-02-16 2015-11-24 Avalanche Technology, Inc. Perpendicular magnetic tunnel junction (pMTJ) with in-plane magneto-static switching-enhancing layer
CN102938257B (zh) 2011-08-15 2017-05-17 中芯国际集成电路制造(上海)有限公司 磁隧道结、其制作方法及含磁隧道结的存储单元
US9443577B2 (en) * 2014-05-19 2016-09-13 Avalanche Technology, Inc. Voltage-switched magnetic random access memory (MRAM) and method for using the same
US10580964B2 (en) * 2015-03-18 2020-03-03 Industry-University Cooperation Foundation Hanyang University Memory device
US9337415B1 (en) 2015-03-20 2016-05-10 HGST Netherlands B.V. Perpendicular spin transfer torque (STT) memory cell with double MgO interface and CoFeB layer for enhancement of perpendicular magnetic anisotropy
EP3314674A4 (en) * 2015-06-26 2019-02-27 Intel Corporation VERTICAL MAGNETIC MEMORY WITH REDUCED SWITCHGEAR
US9831422B2 (en) 2015-10-21 2017-11-28 Samsung Electronics Co., Ltd. Magnetic memory devices having perpendicular magnetic tunnel junction
KR101956975B1 (ko) * 2016-02-05 2019-03-11 한양대학교 산학협력단 메모리 소자
US10354710B2 (en) * 2017-07-24 2019-07-16 Sandisk Technologies Llc Magnetoelectric random access memory array and methods of operating the same
WO2019143052A1 (ko) * 2018-01-17 2019-07-25 한양대학교 산학협력단 메모리 소자
KR102169622B1 (ko) * 2018-01-17 2020-10-26 한양대학교 산학협력단 메모리 소자
EP3664094B1 (en) * 2018-12-06 2022-08-24 IMEC vzw A magnetic tunnel junction unit and a memory device

Also Published As

Publication number Publication date
US11296276B2 (en) 2022-04-05
TW202119610A (zh) 2021-05-16
KR102117393B1 (ko) 2020-06-01
US20210135091A1 (en) 2021-05-06
CN112786779A (zh) 2021-05-11
TWI734378B (zh) 2021-07-21
CN112786779B (zh) 2024-07-02

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