SG10201910692SA - Photomask blank, and method of manufacturing photomask - Google Patents
Photomask blank, and method of manufacturing photomaskInfo
- Publication number
- SG10201910692SA SG10201910692SA SG10201910692SA SG10201910692SA SG10201910692SA SG 10201910692S A SG10201910692S A SG 10201910692SA SG 10201910692S A SG10201910692S A SG 10201910692SA SG 10201910692S A SG10201910692S A SG 10201910692SA SG 10201910692S A SG10201910692S A SG 10201910692SA
- Authority
- SG
- Singapore
- Prior art keywords
- photomask
- manufacturing
- blank
- photomask blank
- manufacturing photomask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018232298A JP7115281B2 (ja) | 2018-12-12 | 2018-12-12 | フォトマスクブランク、及びフォトマスクの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201910692SA true SG10201910692SA (en) | 2020-07-29 |
Family
ID=68696302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201910692SA SG10201910692SA (en) | 2018-12-12 | 2019-11-15 | Photomask blank, and method of manufacturing photomask |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11131920B2 (ko) |
| EP (1) | EP3667416A1 (ko) |
| JP (1) | JP7115281B2 (ko) |
| KR (1) | KR102442936B1 (ko) |
| CN (1) | CN111308851A (ko) |
| SG (1) | SG10201910692SA (ko) |
| TW (1) | TWI829823B (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7506114B2 (ja) | 2022-07-01 | 2024-06-25 | アルバック成膜株式会社 | マスクブランクスの製造方法及びマスクブランクス、フォトマスク |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2785313B2 (ja) * | 1989-04-05 | 1998-08-13 | 凸版印刷株式会社 | フオトマスクブランクおよびフオトマスク |
| US5230971A (en) * | 1991-08-08 | 1993-07-27 | E. I. Du Pont De Nemours And Company | Photomask blank and process for making a photomask blank using gradual compositional transition between strata |
| JP2002244274A (ja) * | 2001-02-13 | 2002-08-30 | Shin Etsu Chem Co Ltd | フォトマスクブランク、フォトマスク及びこれらの製造方法 |
| JP2003195483A (ja) | 2001-12-28 | 2003-07-09 | Hoya Corp | フォトマスクブランク、フォトマスク、及びそれらの製造方法 |
| JP2003195479A (ja) | 2001-12-28 | 2003-07-09 | Hoya Corp | ハーフトーン型位相シフトマスクブランク、及びハーフトーン型位相シフトマスクの製造方法 |
| JP3093632U (ja) | 2002-03-01 | 2003-05-16 | Ｈｏｙａ株式会社 | ハーフトーン型位相シフトマスクブランク |
| US7166392B2 (en) | 2002-03-01 | 2007-01-23 | Hoya Corporation | Halftone type phase shift mask blank and halftone type phase shift mask |
| KR101426190B1 (ko) * | 2005-09-09 | 2014-07-31 | 호야 가부시키가이샤 | 포토마스크 블랭크, 포토마스크와 그 제조 방법, 및 반도체 장치의 제조 방법 |
| JP2007076152A (ja) * | 2005-09-14 | 2007-03-29 | Yokohama Rubber Co Ltd:The | 難燃性樹脂配管 |
| JP4834203B2 (ja) | 2005-09-30 | 2011-12-14 | Ｈｏｙａ株式会社 | フォトマスクブランクの製造方法及びフォトマスクの製造方法 |
| KR101541982B1 (ko) | 2005-09-30 | 2015-08-04 | 호야 가부시키가이샤 | 포토마스크 블랭크 및 그 제조 방법, 포토마스크의 제조 방법과 반도체 장치의 제조 방법 |
| WO2007058199A1 (ja) | 2005-11-16 | 2007-05-24 | Hoya Corporation | マスクブランク及びフォトマスク |
| TWI397766B (zh) * | 2005-12-26 | 2013-06-01 | Hoya Corp | A manufacturing method of a mask blank and a mask, and a method of manufacturing the semiconductor device |
| KR101155415B1 (ko) * | 2010-05-19 | 2012-06-14 | 주식회사 에스앤에스텍 | 하프톤형 위상반전 블랭크 마스크 및 그 제조방법 |
| JP5464186B2 (ja) * | 2011-09-07 | 2014-04-09 | 信越化学工業株式会社 | フォトマスクブランク、フォトマスク及びその製造方法 |
| JP6229466B2 (ja) * | 2013-12-06 | 2017-11-15 | 信越化学工業株式会社 | フォトマスクブランク |
| JP2016188958A (ja) | 2015-03-30 | 2016-11-04 | Hoya株式会社 | マスクブランク、位相シフトマスクの製造方法、及び、半導体デバイスの製造方法 |
| JP6341166B2 (ja) * | 2015-09-03 | 2018-06-13 | 信越化学工業株式会社 | フォトマスクブランク |
| KR102416957B1 (ko) * | 2015-11-06 | 2022-07-05 | 호야 가부시키가이샤 | 마스크 블랭크, 위상 시프트 마스크의 제조 방법 및 반도체 디바이스의 제조 방법 |
| JP6677139B2 (ja) * | 2016-09-28 | 2020-04-08 | 信越化学工業株式会社 | ハーフトーン位相シフト型フォトマスクブランクの製造方法 |
| JP6733464B2 (ja) * | 2016-09-28 | 2020-07-29 | 信越化学工業株式会社 | ハーフトーン位相シフトマスクブランク及びハーフトーン位相シフトマスク |
| JP6812236B2 (ja) | 2016-12-27 | 2021-01-13 | Hoya株式会社 | 位相シフトマスクブランク及びこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法 |
| JP6271780B2 (ja) | 2017-02-01 | 2018-01-31 | Hoya株式会社 | マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法 |
-
2018
- 2018-12-12 JP JP2018232298A patent/JP7115281B2/ja active Active
-
2019
- 2019-11-15 SG SG10201910692SA patent/SG10201910692SA/en unknown
- 2019-11-22 US US16/692,491 patent/US11131920B2/en active Active
- 2019-11-26 EP EP19211441.1A patent/EP3667416A1/en active Pending
- 2019-12-09 KR KR1020190162488A patent/KR102442936B1/ko active IP Right Grant
- 2019-12-11 TW TW108145213A patent/TWI829823B/zh active
- 2019-12-11 CN CN201911264530.6A patent/CN111308851A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN111308851A (zh) | 2020-06-19 |
| TW202419982A (zh) | 2024-05-16 |
| US11131920B2 (en) | 2021-09-28 |
| US20200192215A1 (en) | 2020-06-18 |
| KR20200072413A (ko) | 2020-06-22 |
| JP7115281B2 (ja) | 2022-08-09 |
| TW202043926A (zh) | 2020-12-01 |
| KR102442936B1 (ko) | 2022-09-14 |
| TWI829823B (zh) | 2024-01-21 |
| EP3667416A1 (en) | 2020-06-17 |
| JP2020095133A (ja) | 2020-06-18 |
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