SG11202113133RA - Photomask blank, method for producing photomask, and photomask - Google Patents
Photomask blank, method for producing photomask, and photomaskInfo
- Publication number
- SG11202113133RA SG11202113133RA SG11202113133RA SG11202113133RA SG11202113133RA SG 11202113133R A SG11202113133R A SG 11202113133RA SG 11202113133R A SG11202113133R A SG 11202113133RA SG 11202113133R A SG11202113133R A SG 11202113133RA SG 11202113133R A SG11202113133R A SG 11202113133RA
- Authority
- SG
- Singapore
- Prior art keywords
- photomask
- producing
- blank
- photomask blank
- producing photomask
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019102162A JP7044095B2 (en) | 2019-05-31 | 2019-05-31 | Photomask blank, photomask manufacturing method and photomask |
| PCT/JP2020/017009 WO2020241116A1 (en) | 2019-05-31 | 2020-04-20 | Photomask blank, method for producing photomask, and photomask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202113133RA true SG11202113133RA (en) | 2021-12-30 |
Family
ID=73552332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202113133RA SG11202113133RA (en) | 2019-05-31 | 2020-04-20 | Photomask blank, method for producing photomask, and photomask |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11971653B2 (en) |
| EP (1) | EP3979001A4 (en) |
| JP (1) | JP7044095B2 (en) |
| KR (1) | KR102598715B1 (en) |
| CN (1) | CN113874784A (en) |
| SG (1) | SG11202113133RA (en) |
| TW (1) | TWI824153B (en) |
| WO (1) | WO2020241116A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023156717A (en) * | 2022-04-13 | 2023-10-25 | 信越化学工業株式会社 | Reflection type photomask blank, production method of reflection type photomask, and reflection type photomask |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60182439A (en) * | 1984-02-29 | 1985-09-18 | Konishiroku Photo Ind Co Ltd | Chromium mask material |
| JP2983020B1 (en) | 1998-12-18 | 1999-11-29 | ホーヤ株式会社 | Halftone type phase shift mask blank and halftone type phase shift mask |
| JP3956103B2 (en) * | 2002-02-26 | 2007-08-08 | 信越化学工業株式会社 | Photomask blank, photomask and photomask blank evaluation method |
| JP2002287330A (en) * | 2002-03-01 | 2002-10-03 | Shin Etsu Chem Co Ltd | Blank for photomask and photomask |
| JP2004053663A (en) * | 2002-07-16 | 2004-02-19 | Shin Etsu Chem Co Ltd | Photomask blank, photomask, and method of selecting photomask blank |
| KR101621985B1 (en) * | 2008-03-31 | 2016-05-17 | 호야 가부시키가이샤 | Photomask blank and method for manufacturing the same |
| KR20110066207A (en) | 2008-09-30 | 2011-06-16 | 호야 가부시키가이샤 | Photomask blank, photomask, and process for producing same |
| JP5464186B2 (en) * | 2011-09-07 | 2014-04-09 | 信越化学工業株式会社 | Photomask blank, photomask and manufacturing method thereof |
| JP6279858B2 (en) * | 2013-09-03 | 2018-02-14 | Hoya株式会社 | Mask blank manufacturing method and transfer mask manufacturing method |
| JP6292581B2 (en) * | 2014-03-30 | 2018-03-14 | Hoya株式会社 | Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method |
| US10018905B2 (en) * | 2015-04-06 | 2018-07-10 | S & S Tech Co., Ltd | Phase shift blankmask and photomask |
| JP6341166B2 (en) * | 2015-09-03 | 2018-06-13 | 信越化学工業株式会社 | Photomask blank |
| JP6632950B2 (en) * | 2016-09-21 | 2020-01-22 | Hoya株式会社 | Photomask blank, photomask blank manufacturing method, photomask manufacturing method using the same, and display device manufacturing method |
| JP6812236B2 (en) * | 2016-12-27 | 2021-01-13 | Hoya株式会社 | A phase shift mask blank, a method for manufacturing a phase shift mask using the blank, and a method for manufacturing a display device. |
| JP6819546B2 (en) * | 2017-11-13 | 2021-01-27 | 信越化学工業株式会社 | Photomask blank and photomask manufacturing method |
-
2019
- 2019-05-31 JP JP2019102162A patent/JP7044095B2/en active Active
-
2020
- 2020-04-20 SG SG11202113133RA patent/SG11202113133RA/en unknown
- 2020-04-20 CN CN202080039879.4A patent/CN113874784A/en active Pending
- 2020-04-20 KR KR1020217042786A patent/KR102598715B1/en active IP Right Grant
- 2020-04-20 WO PCT/JP2020/017009 patent/WO2020241116A1/en unknown
- 2020-04-20 EP EP20814579.7A patent/EP3979001A4/en active Pending
- 2020-04-20 US US17/614,808 patent/US11971653B2/en active Active
- 2020-05-27 TW TW109117623A patent/TWI824153B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3979001A1 (en) | 2022-04-06 |
| KR20220013572A (en) | 2022-02-04 |
| TWI824153B (en) | 2023-12-01 |
| US11971653B2 (en) | 2024-04-30 |
| KR102598715B1 (en) | 2023-11-07 |
| CN113874784A (en) | 2021-12-31 |
| JP7044095B2 (en) | 2022-03-30 |
| WO2020241116A1 (en) | 2020-12-03 |
| JP2020197566A (en) | 2020-12-10 |
| US20220229358A1 (en) | 2022-07-21 |
| EP3979001A4 (en) | 2023-06-07 |
| TW202105045A (en) | 2021-02-01 |
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