SG10201506215WA - Aqueous polishing compositions containing n-substituted diazenium dioxides and/or n'-hydroxy-diazenium oxide salts - Google Patents

Aqueous polishing compositions containing n-substituted diazenium dioxides and/or n'-hydroxy-diazenium oxide salts

Info

Publication number
SG10201506215WA
SG10201506215WA SG10201506215WA SG10201506215WA SG10201506215WA SG 10201506215W A SG10201506215W A SG 10201506215WA SG 10201506215W A SG10201506215W A SG 10201506215WA SG 10201506215W A SG10201506215W A SG 10201506215WA SG 10201506215W A SG10201506215W A SG 10201506215WA
Authority
SG
Singapore
Prior art keywords
diazenium
hydroxy
compositions containing
dioxides
polishing compositions
Prior art date
Application number
SG10201506215WA
Other languages
English (en)
Inventor
Bastian Noller
Diana Franz
Yuzhuo Li
Ibrahim Sheik Ansar Usman
Harvey Wayne Pinder
Shyam Sundar Venkataraman
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Publication of SG10201506215WA publication Critical patent/SG10201506215WA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N51/00—Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds having the sequences of atoms O—N—S, X—O—S, N—N—S, O—N—N or O-halogen, regardless of the number of bonds each atom has and with no atom of these sequences forming part of a heterocyclic ring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/04—Aqueous dispersions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/31051—Planarisation of the insulating layers
    • H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Environmental Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Zoology (AREA)
  • Wood Science & Technology (AREA)
  • General Health & Medical Sciences (AREA)
  • Dentistry (AREA)
  • Plant Pathology (AREA)
  • Pest Control & Pesticides (AREA)
  • Agronomy & Crop Science (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
SG10201506215WA 2010-09-08 2011-09-06 Aqueous polishing compositions containing n-substituted diazenium dioxides and/or n'-hydroxy-diazenium oxide salts SG10201506215WA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US38072210P 2010-09-08 2010-09-08

Publications (1)

Publication Number Publication Date
SG10201506215WA true SG10201506215WA (en) 2015-09-29

Family

ID=45810174

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201506215WA SG10201506215WA (en) 2010-09-08 2011-09-06 Aqueous polishing compositions containing n-substituted diazenium dioxides and/or n'-hydroxy-diazenium oxide salts
SG2013017256A SG188459A1 (en) 2010-09-08 2011-09-06 Aqueous polishing compositions containing n-substituted diazenium dioxidesand/or n'-hydroxy-diazenium oxide salts

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG2013017256A SG188459A1 (en) 2010-09-08 2011-09-06 Aqueous polishing compositions containing n-substituted diazenium dioxidesand/or n'-hydroxy-diazenium oxide salts

Country Status (10)

Country Link
US (1) US20130200039A1 (zh)
EP (1) EP2614122A4 (zh)
JP (1) JP2013540850A (zh)
KR (1) KR101967134B1 (zh)
CN (1) CN103210047B (zh)
IL (1) IL225084B (zh)
RU (1) RU2608890C2 (zh)
SG (2) SG10201506215WA (zh)
TW (1) TWI598434B (zh)
WO (1) WO2012032466A1 (zh)

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WO2016047714A1 (ja) * 2014-09-26 2016-03-31 株式会社フジミインコーポレーテッド 研磨用組成物
US20160172188A1 (en) * 2014-12-16 2016-06-16 Samsung Sdi Co., Ltd. Rinse solution for silica thin film, method of producing silica thin film, and silica thin film
KR102463863B1 (ko) * 2015-07-20 2022-11-04 삼성전자주식회사 연마용 조성물 및 이를 이용한 반도체 장치의 제조 방법
CN106189873A (zh) * 2016-07-22 2016-12-07 清华大学 一种抛光组合物
JP2019050307A (ja) * 2017-09-11 2019-03-28 株式会社フジミインコーポレーテッド 研磨方法、ならびに研磨用組成物およびその製造方法
US10584266B2 (en) * 2018-03-14 2020-03-10 Cabot Microelectronics Corporation CMP compositions containing polymer complexes and agents for STI applications
US11072726B2 (en) * 2018-06-29 2021-07-27 Versum Materials Us, Llc Low oxide trench dishing chemical mechanical polishing
US20200002607A1 (en) * 2018-06-29 2020-01-02 Versum Materials Us, Llc Low Oxide Trench Dishing Chemical Mechanical Polishing
US11078417B2 (en) * 2018-06-29 2021-08-03 Versum Materials Us, Llc Low oxide trench dishing chemical mechanical polishing
US11549034B2 (en) * 2018-08-09 2023-01-10 Versum Materials Us, Llc Oxide chemical mechanical planarization (CMP) polishing compositions
KR20210018607A (ko) * 2019-08-06 2021-02-18 삼성디스플레이 주식회사 연마 슬러리, 이를 이용한 표시 장치의 제조방법 및 표시 장치
CN114651317A (zh) * 2019-09-10 2022-06-21 富士胶片电子材料美国有限公司 蚀刻组合物

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Also Published As

Publication number Publication date
IL225084B (en) 2018-01-31
KR101967134B1 (ko) 2019-04-09
CN103210047A (zh) 2013-07-17
TWI598434B (zh) 2017-09-11
SG188459A1 (en) 2013-04-30
RU2013115236A (ru) 2014-10-20
JP2013540850A (ja) 2013-11-07
CN103210047B (zh) 2018-07-17
RU2608890C2 (ru) 2017-01-26
EP2614122A4 (en) 2014-01-15
EP2614122A1 (en) 2013-07-17
WO2012032466A1 (en) 2012-03-15
US20130200039A1 (en) 2013-08-08
TW201217506A (en) 2012-05-01
KR20130133175A (ko) 2013-12-06

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