SG10201403252YA - Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers - Google Patents

Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers

Info

Publication number
SG10201403252YA
SG10201403252YA SG10201403252YA SG10201403252YA SG10201403252YA SG 10201403252Y A SG10201403252Y A SG 10201403252YA SG 10201403252Y A SG10201403252Y A SG 10201403252YA SG 10201403252Y A SG10201403252Y A SG 10201403252YA SG 10201403252Y A SG10201403252Y A SG 10201403252YA
Authority
SG
Singapore
Prior art keywords
orientation
top coats
thin film
block copolymers
block copolymer
Prior art date
Application number
SG10201403252YA
Other languages
English (en)
Inventor
Grant Willson Carlton
John Ellison Christopher
Seshimo Takehiro
Cushen Julia
M Bates Christopher
Dean Leon
J Santos Logan
L Rausch Erica
Maher Michael
Original Assignee
Univ Texas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/922,011 external-priority patent/US9314819B2/en
Application filed by Univ Texas filed Critical Univ Texas
Publication of SG10201403252YA publication Critical patent/SG10201403252YA/en

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  • Chemical & Material Sciences (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Drying Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Paints Or Removers (AREA)
  • Wood Science & Technology (AREA)
  • Moulding By Coating Moulds (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
SG10201403252YA 2013-06-19 2014-06-13 Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers SG10201403252YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/922,011 US9314819B2 (en) 2012-02-10 2013-06-19 Anhydride copolymer top coats for orientation control of thin film block copolymers

Publications (1)

Publication Number Publication Date
SG10201403252YA true SG10201403252YA (en) 2015-01-29

Family

ID=52301358

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201403252YA SG10201403252YA (en) 2013-06-19 2014-06-13 Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers

Country Status (5)

Country Link
JP (1) JP6480674B2 (ja)
KR (1) KR102303669B1 (ja)
CN (1) CN104592539B (ja)
SG (1) SG10201403252YA (ja)
TW (1) TWI658055B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6325320B2 (ja) * 2014-04-09 2018-05-16 東京応化工業株式会社 相分離構造を含む構造体の製造方法及びトップコート膜の成膜方法
JP6413888B2 (ja) * 2015-03-30 2018-10-31 Jsr株式会社 パターン形成用組成物、パターン形成方法及びブロック共重合体
WO2017147185A1 (en) * 2016-02-23 2017-08-31 Board Of Regents The University Of Texas System Block copolymers for sub-10 nm patterning
US10865262B2 (en) 2016-09-13 2020-12-15 Nissan Chemical Corporation Upper-layer film forming composition and method for producing a phase-separated pattern
CN110198995B (zh) 2017-01-19 2021-10-08 日产化学株式会社 用于形成微细相分离图案的自组装化膜形成用组合物
KR102523359B1 (ko) * 2017-01-19 2023-04-19 닛산 가가쿠 가부시키가이샤 미세상분리 패턴형성을 위한 하층막 형성 조성물
JP7409308B2 (ja) * 2018-07-17 2024-01-09 日産化学株式会社 微細相分離パターン形成のためのブロックコポリマー層形成組成物
TW202212508A (zh) 2020-06-08 2022-04-01 日商日產化學股份有限公司 上層膜形成組成物及相分離圖型製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7989026B2 (en) * 2008-01-12 2011-08-02 International Business Machines Corporation Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films
US8999492B2 (en) * 2008-02-05 2015-04-07 Micron Technology, Inc. Method to produce nanometer-sized features with directed assembly of block copolymers
US8426313B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
US8114301B2 (en) * 2008-05-02 2012-02-14 Micron Technology, Inc. Graphoepitaxial self-assembly of arrays of downward facing half-cylinders
JP2010115832A (ja) * 2008-11-12 2010-05-27 Panasonic Corp ブロックコポリマーの自己組織化促進方法及びそれを用いたブロックコポリマーの自己組織化パターン形成方法
KR20110018678A (ko) * 2009-08-18 2011-02-24 연세대학교 산학협력단 기능성 말단기를 가진 폴리스티렌을 이용한 실린더 나노구조체의 수직배향 조절법
CN101734610B (zh) * 2009-12-15 2012-05-23 江苏大学 一种用于微机电系统低载荷工况的多层薄膜及其制备方法
US8623458B2 (en) * 2009-12-18 2014-01-07 International Business Machines Corporation Methods of directed self-assembly, and layered structures formed therefrom
CN102870247A (zh) * 2010-03-18 2013-01-09 得克萨斯大学体系董事会 含硅嵌段共聚合物及其合成和使用方法
KR101999870B1 (ko) * 2011-09-15 2019-10-02 위스콘신 얼럼나이 리서어치 화운데이션 화학적으로 패턴화된 표면과 제2 표면 사이의 블록 공중합체 막의 유도 조립
JP5994788B2 (ja) * 2011-11-09 2016-09-21 Jsr株式会社 パターン形成用自己組織化組成物及びパターン形成方法
JP6258227B2 (ja) * 2012-02-10 2018-01-10 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 薄膜ブロックコポリマーの配向性の制御のための無水コポリマートップコート

Also Published As

Publication number Publication date
KR20140147718A (ko) 2014-12-30
TWI658055B (zh) 2019-05-01
TW201513222A (zh) 2015-04-01
JP6480674B2 (ja) 2019-03-13
KR102303669B1 (ko) 2021-09-16
CN104592539A (zh) 2015-05-06
JP2015005750A (ja) 2015-01-08
CN104592539B (zh) 2019-01-11

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