SG10201403252YA - Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers - Google Patents

Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers

Info

Publication number
SG10201403252YA
SG10201403252YA SG10201403252YA SG10201403252YA SG10201403252YA SG 10201403252Y A SG10201403252Y A SG 10201403252YA SG 10201403252Y A SG10201403252Y A SG 10201403252YA SG 10201403252Y A SG10201403252Y A SG 10201403252YA SG 10201403252Y A SG10201403252Y A SG 10201403252YA
Authority
SG
Singapore
Prior art keywords
orientation
top coats
thin film
block copolymers
block copolymer
Prior art date
Application number
SG10201403252YA
Inventor
Grant Willson Carlton
John Ellison Christopher
Seshimo Takehiro
Cushen Julia
M Bates Christopher
Dean Leon
J Santos Logan
L Rausch Erica
Maher Michael
Original Assignee
Univ Texas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/922,011 external-priority patent/US9314819B2/en
Application filed by Univ Texas filed Critical Univ Texas
Publication of SG10201403252YA publication Critical patent/SG10201403252YA/en

Links

Abstract

22 ANHYDRIDE COPOLYMER TOP COATS FOR ORIENTATION CONTROL OF THIN FILM BLOCK COPOLYMERS The use of self-assembled block copolymer structures to produce advanced lithographic patterns relies on control of the orientation of these structures in thin films. In particular, orientation of cylinders and lamellae perpendicular to the plane of the block copolymer film is required for most applications. The preferred method to achieve orientation is by heating. The present invention involves the use of polarity-switching top coats to control block copolymer thin film orientation by heating. The top coats can be spin coated onto block copolymer thin films from polar casting solvents and they change composition upon thermal annealing to become “neutral”. Top coats allow for the facile orientation control of block copolymers which would otherwise not be possible by heating alone. Figure 1
SG10201403252YA 2013-06-19 2014-06-13 Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers SG10201403252YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/922,011 US9314819B2 (en) 2012-02-10 2013-06-19 Anhydride copolymer top coats for orientation control of thin film block copolymers

Publications (1)

Publication Number Publication Date
SG10201403252YA true SG10201403252YA (en) 2015-01-29

Family

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SG10201403252YA SG10201403252YA (en) 2013-06-19 2014-06-13 Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers

Country Status (5)

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JP (1) JP6480674B2 (en)
KR (1) KR102303669B1 (en)
CN (1) CN104592539B (en)
SG (1) SG10201403252YA (en)
TW (1) TWI658055B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6325320B2 (en) * 2014-04-09 2018-05-16 東京応化工業株式会社 Method for manufacturing structure including phase separation structure and method for forming topcoat film
JP6413888B2 (en) * 2015-03-30 2018-10-31 Jsr株式会社 Pattern forming composition, pattern forming method, and block copolymer
JP7061799B2 (en) * 2016-02-23 2022-05-02 ボード オブ リージェンツ，ザ ユニバーシティ オブ テキサス システム Block copolymers for patterning less than 10 nm
CN109689779B (en) * 2016-09-13 2020-09-11 日产化学株式会社 Composition for forming upper layer film and method for producing phase separation pattern
WO2018135455A1 (en) * 2017-01-19 2018-07-26 日産化学工業株式会社 Underlayer film-forming composition for forming fine phase separation pattern
CN110198995B (en) 2017-01-19 2021-10-08 日产化学株式会社 Composition for forming self-assembled film for forming fine phase separation pattern
KR20210032378A (en) * 2018-07-17 2021-03-24 닛산 가가쿠 가부시키가이샤 Composition for forming a block copolymer layer for forming a fine phase separation pattern
TW202212508A (en) 2020-06-08 2022-04-01 日商日產化學股份有限公司 Upper layer film-forming composition and method for producing phase separated pattern

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7989026B2 (en) * 2008-01-12 2011-08-02 International Business Machines Corporation Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films
US8999492B2 (en) * 2008-02-05 2015-04-07 Micron Technology, Inc. Method to produce nanometer-sized features with directed assembly of block copolymers
US8426313B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
US8114301B2 (en) * 2008-05-02 2012-02-14 Micron Technology, Inc. Graphoepitaxial self-assembly of arrays of downward facing half-cylinders
JP2010115832A (en) * 2008-11-12 2010-05-27 Panasonic Corp Method for promoting self-formation of block copolymer and method for forming self-formation pattern of block copolymer using the method for promoting self-formation
KR20110018678A (en) * 2009-08-18 2011-02-24 연세대학교 산학협력단 Control of perpendicular orientations for cylinder-forming nano structure using functional terminated polystyrene
CN101734610B (en) * 2009-12-15 2012-05-23 江苏大学 Multilayer film for low load working condition of micro electro mechanical system and preparation method thereof
US8623458B2 (en) * 2009-12-18 2014-01-07 International Business Machines Corporation Methods of directed self-assembly, and layered structures formed therefrom
WO2011116223A1 (en) * 2010-03-18 2011-09-22 Board Of Regents The University Of Texas System Silicon-containing block co-polymers, methods for synthesis and use
WO2013040483A1 (en) * 2011-09-15 2013-03-21 Wisconsin Alumni Research Foundation Directed assembly of block copolymer films between a chemically patterned surface and a second surface
WO2013069544A1 (en) * 2011-11-09 2013-05-16 Jsr株式会社 Self-organization composition for pattern formation and pattern formation method
US9157008B2 (en) * 2012-02-10 2015-10-13 Board Of Regents, The University Of Texas System Anhydride copolymer top coats for orientation control of thin film block copolymers

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Publication number Publication date
KR102303669B1 (en) 2021-09-16
JP6480674B2 (en) 2019-03-13
CN104592539B (en) 2019-01-11
KR20140147718A (en) 2014-12-30
JP2015005750A (en) 2015-01-08
CN104592539A (en) 2015-05-06
TW201513222A (en) 2015-04-01
TWI658055B (en) 2019-05-01

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