CN104592539B - 用于薄膜嵌段共聚物取向控制的酸酐共聚物面涂层 - Google Patents
用于薄膜嵌段共聚物取向控制的酸酐共聚物面涂层 Download PDFInfo
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- CN104592539B CN104592539B CN201410409101.4A CN201410409101A CN104592539B CN 104592539 B CN104592539 B CN 104592539B CN 201410409101 A CN201410409101 A CN 201410409101A CN 104592539 B CN104592539 B CN 104592539B
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- block copolymer
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- 229920001400 block copolymer Polymers 0.000 title claims abstract description 86
- 229920001577 copolymer Polymers 0.000 title claims description 14
- 230000010415 tropism Effects 0.000 title abstract description 7
- 238000000034 method Methods 0.000 claims abstract description 74
- 238000000137 annealing Methods 0.000 claims abstract description 32
- 239000002904 solvent Substances 0.000 claims abstract description 22
- 230000007935 neutral effect Effects 0.000 claims abstract description 20
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 239000012528 membrane Substances 0.000 claims abstract description 9
- 239000010410 layer Substances 0.000 claims description 53
- 239000000758 substrate Substances 0.000 claims description 35
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 20
- 239000003513 alkali Substances 0.000 claims description 19
- 150000003839 salts Chemical group 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 150000001412 amines Chemical class 0.000 claims description 9
- 238000004528 spin coating Methods 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 7
- -1 hydroxide radical anion Chemical class 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 7
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 6
- 150000008065 acid anhydrides Chemical class 0.000 claims description 6
- 239000000908 ammonium hydroxide Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 125000005210 alkyl ammonium group Chemical group 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 5
- 239000011877 solvent mixture Substances 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 4
- 150000001450 anions Chemical class 0.000 claims description 4
- 150000001768 cations Chemical class 0.000 claims description 4
- 229920006037 cross link polymer Polymers 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 4
- 150000003973 alkyl amines Chemical class 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 238000004090 dissolution Methods 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 claims description 3
- 238000001338 self-assembly Methods 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 238000007385 chemical modification Methods 0.000 claims description 2
- 230000006837 decompression Effects 0.000 claims description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 2
- 238000004821 distillation Methods 0.000 claims description 2
- 238000012986 modification Methods 0.000 claims description 2
- 230000004048 modification Effects 0.000 claims description 2
- 125000002524 organometallic group Chemical group 0.000 claims description 2
- 230000001376 precipitating effect Effects 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 230000008961 swelling Effects 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 claims 1
- 238000013007 heat curing Methods 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 239000002356 single layer Substances 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 38
- 238000010438 heat treatment Methods 0.000 abstract description 12
- 239000010409 thin film Substances 0.000 abstract description 9
- 238000005266 casting Methods 0.000 abstract description 5
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 229920000642 polymer Polymers 0.000 description 15
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000002086 nanomaterial Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 238000000572 ellipsometry Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- JJTUDXZGHPGLLC-IMJSIDKUSA-N 4511-42-6 Chemical compound C[C@@H]1OC(=O)[C@H](C)OC1=O JJTUDXZGHPGLLC-IMJSIDKUSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000012661 block copolymerization Methods 0.000 description 2
- 229920000359 diblock copolymer Polymers 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000002094 self assembled monolayer Substances 0.000 description 2
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- 150000003440 styrenes Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- OXHSYXPNALRSME-UHFFFAOYSA-N (4-ethenylphenyl)-trimethylsilane Chemical compound C[Si](C)(C)C1=CC=C(C=C)C=C1 OXHSYXPNALRSME-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- ZMYGBKXROOQLMY-UHFFFAOYSA-N N=NC=NN.N=NC=NN.C1=CC=CC2=CC=CC=C12 Chemical compound N=NC=NN.N=NC=NN.C1=CC=CC2=CC=CC=C12 ZMYGBKXROOQLMY-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229910052805 deuterium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000005400 gorilla glass Substances 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
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- 239000010959 steel Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 210000001258 synovial membrane Anatomy 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical compound O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229920000428 triblock copolymer Polymers 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052722 tritium Inorganic materials 0.000 description 1
Landscapes
- Chemical & Material Sciences (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Formation Of Insulating Films (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Drying Of Semiconductors (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Moulding By Coating Moulds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/922,011 | 2013-06-19 | ||
| US13/922,011 US9314819B2 (en) | 2012-02-10 | 2013-06-19 | Anhydride copolymer top coats for orientation control of thin film block copolymers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104592539A CN104592539A (zh) | 2015-05-06 |
| CN104592539B true CN104592539B (zh) | 2019-01-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410409101.4A Active CN104592539B (zh) | 2013-06-19 | 2014-06-19 | 用于薄膜嵌段共聚物取向控制的酸酐共聚物面涂层 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6480674B2 (ja) |
| KR (1) | KR102303669B1 (ja) |
| CN (1) | CN104592539B (ja) |
| SG (1) | SG10201403252YA (ja) |
| TW (1) | TWI658055B (ja) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6325320B2 (ja) * | 2014-04-09 | 2018-05-16 | 東京応化工業株式会社 | 相分離構造を含む構造体の製造方法及びトップコート膜の成膜方法 |
| JP6413888B2 (ja) * | 2015-03-30 | 2018-10-31 | Jsr株式会社 | パターン形成用組成物、パターン形成方法及びブロック共重合体 |
| WO2017147185A1 (en) * | 2016-02-23 | 2017-08-31 | Board Of Regents The University Of Texas System | Block copolymers for sub-10 nm patterning |
| KR102265116B1 (ko) | 2016-09-13 | 2021-06-15 | 닛산 가가쿠 가부시키가이샤 | 상층막형성 조성물 및 상분리패턴 제조방법 |
| WO2018135455A1 (ja) * | 2017-01-19 | 2018-07-26 | 日産化学工業株式会社 | 微細相分離パターン形成のための下層膜形成組成物 |
| WO2018135456A1 (ja) * | 2017-01-19 | 2018-07-26 | 日産化学工業株式会社 | 微細相分離パターン形成のための自己組織化膜形成組成物 |
| KR20210032378A (ko) * | 2018-07-17 | 2021-03-24 | 닛산 가가쿠 가부시키가이샤 | 미세 상분리패턴 형성을 위한 블록코폴리머층 형성 조성물 |
| TW202212508A (zh) | 2020-06-08 | 2022-04-01 | 日商日產化學股份有限公司 | 上層膜形成組成物及相分離圖型製造方法 |
Citations (5)
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| US7521090B1 (en) * | 2008-01-12 | 2009-04-21 | International Business Machines Corporation | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films |
| CN101734610A (zh) * | 2009-12-15 | 2010-06-16 | 江苏大学 | 一种用于微机电系统低载荷工况的多层薄膜及其制备方法 |
| CN101971093A (zh) * | 2008-02-05 | 2011-02-09 | 美光科技公司 | 用以产生具有嵌段共聚物的定向总成的纳米尺寸特征的方法 |
| WO2011080016A2 (en) * | 2009-12-18 | 2011-07-07 | International Business Machines Corporation | Methods of directed self-assembly and layered structures formed therefrom |
| CN104303103A (zh) * | 2012-02-10 | 2015-01-21 | 得克萨斯大学体系董事会 | 用于薄膜嵌段共聚物的取向控制的酸酐共聚物的面涂层 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8426313B2 (en) * | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference |
| US8114301B2 (en) * | 2008-05-02 | 2012-02-14 | Micron Technology, Inc. | Graphoepitaxial self-assembly of arrays of downward facing half-cylinders |
| JP2010115832A (ja) * | 2008-11-12 | 2010-05-27 | Panasonic Corp | ブロックコポリマーの自己組織化促進方法及びそれを用いたブロックコポリマーの自己組織化パターン形成方法 |
| KR20110018678A (ko) * | 2009-08-18 | 2011-02-24 | 연세대학교 산학협력단 | 기능성 말단기를 가진 폴리스티렌을 이용한 실린더 나노구조체의 수직배향 조절법 |
| KR20130039727A (ko) * | 2010-03-18 | 2013-04-22 | 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 | 규소 함유 블록 공중합체, 합성 방법 및 용도 |
| KR101999870B1 (ko) * | 2011-09-15 | 2019-10-02 | 위스콘신 얼럼나이 리서어치 화운데이션 | 화학적으로 패턴화된 표면과 제2 표면 사이의 블록 공중합체 막의 유도 조립 |
| WO2013069544A1 (ja) * | 2011-11-09 | 2013-05-16 | Jsr株式会社 | パターン形成用自己組織化組成物及びパターン形成方法 |
-
2014
- 2014-06-11 TW TW103120171A patent/TWI658055B/zh active
- 2014-06-13 SG SG10201403252YA patent/SG10201403252YA/en unknown
- 2014-06-17 KR KR1020140073594A patent/KR102303669B1/ko active IP Right Grant
- 2014-06-18 JP JP2014125288A patent/JP6480674B2/ja active Active
- 2014-06-19 CN CN201410409101.4A patent/CN104592539B/zh active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7521090B1 (en) * | 2008-01-12 | 2009-04-21 | International Business Machines Corporation | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films |
| CN101971093A (zh) * | 2008-02-05 | 2011-02-09 | 美光科技公司 | 用以产生具有嵌段共聚物的定向总成的纳米尺寸特征的方法 |
| CN101734610A (zh) * | 2009-12-15 | 2010-06-16 | 江苏大学 | 一种用于微机电系统低载荷工况的多层薄膜及其制备方法 |
| WO2011080016A2 (en) * | 2009-12-18 | 2011-07-07 | International Business Machines Corporation | Methods of directed self-assembly and layered structures formed therefrom |
| CN104303103A (zh) * | 2012-02-10 | 2015-01-21 | 得克萨斯大学体系董事会 | 用于薄膜嵌段共聚物的取向控制的酸酐共聚物的面涂层 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104592539A (zh) | 2015-05-06 |
| KR102303669B1 (ko) | 2021-09-16 |
| JP6480674B2 (ja) | 2019-03-13 |
| TW201513222A (zh) | 2015-04-01 |
| TWI658055B (zh) | 2019-05-01 |
| JP2015005750A (ja) | 2015-01-08 |
| SG10201403252YA (en) | 2015-01-29 |
| KR20140147718A (ko) | 2014-12-30 |
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