SE9704260D0 - Plasmabearbetningsapparat - Google Patents

Plasmabearbetningsapparat

Info

Publication number
SE9704260D0
SE9704260D0 SE9704260A SE9704260A SE9704260D0 SE 9704260 D0 SE9704260 D0 SE 9704260D0 SE 9704260 A SE9704260 A SE 9704260A SE 9704260 A SE9704260 A SE 9704260A SE 9704260 D0 SE9704260 D0 SE 9704260D0
Authority
SE
Sweden
Prior art keywords
plasma processing
permanent magnet
rotary
processing device
magnet systems
Prior art date
Application number
SE9704260A
Other languages
English (en)
Other versions
SE9704260L (sv
SE511139C2 (sv
Inventor
Hana Barankova
Ladislav Bardos
Original Assignee
Hana Barankova
Ladislav Bardos
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=20409052&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SE9704260(D0) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Publication of SE9704260D0 publication Critical patent/SE9704260D0/sv
Priority to SE9704260A priority Critical patent/SE511139C2/sv
Application filed by Hana Barankova, Ladislav Bardos filed Critical Hana Barankova
Priority to PCT/SE1998/001983 priority patent/WO1999027758A1/en
Priority to AU11820/99A priority patent/AU1182099A/en
Priority to DE69828904T priority patent/DE69828904T3/de
Priority to CZ20001853A priority patent/CZ298474B6/cs
Priority to US09/554,666 priority patent/US6351075B1/en
Priority to JP2000522766A priority patent/JP4491132B2/ja
Priority to EP98954885A priority patent/EP1033068B2/en
Publication of SE9704260L publication Critical patent/SE9704260L/sv
Publication of SE511139C2 publication Critical patent/SE511139C2/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
SE9704260A 1997-11-20 1997-11-20 Plasmabearbetningsapparat med vridbara magneter SE511139C2 (sv)

Priority Applications (8)

Application Number Priority Date Filing Date Title
SE9704260A SE511139C2 (sv) 1997-11-20 1997-11-20 Plasmabearbetningsapparat med vridbara magneter
EP98954885A EP1033068B2 (en) 1997-11-20 1998-11-03 Plasma processing apparatus having rotating magnets
PCT/SE1998/001983 WO1999027758A1 (en) 1997-11-20 1998-11-03 Plasma processing apparatus having rotating magnets
JP2000522766A JP4491132B2 (ja) 1997-11-20 1998-11-03 プラズマ処理装置
AU11820/99A AU1182099A (en) 1997-11-20 1998-11-03 Plasma processing apparatus having rotating magnets
DE69828904T DE69828904T3 (de) 1997-11-20 1998-11-03 Plasmabehandlungsgerät mit rotierenden magneten
CZ20001853A CZ298474B6 (cs) 1997-11-20 1998-11-03 Zarízení na zpracování plazmatem
US09/554,666 US6351075B1 (en) 1997-11-20 1998-11-03 Plasma processing apparatus having rotating magnets

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9704260A SE511139C2 (sv) 1997-11-20 1997-11-20 Plasmabearbetningsapparat med vridbara magneter

Publications (3)

Publication Number Publication Date
SE9704260D0 true SE9704260D0 (sv) 1997-11-20
SE9704260L SE9704260L (sv) 1999-05-21
SE511139C2 SE511139C2 (sv) 1999-08-09

Family

ID=20409052

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9704260A SE511139C2 (sv) 1997-11-20 1997-11-20 Plasmabearbetningsapparat med vridbara magneter

Country Status (8)

Country Link
US (1) US6351075B1 (sv)
EP (1) EP1033068B2 (sv)
JP (1) JP4491132B2 (sv)
AU (1) AU1182099A (sv)
CZ (1) CZ298474B6 (sv)
DE (1) DE69828904T3 (sv)
SE (1) SE511139C2 (sv)
WO (1) WO1999027758A1 (sv)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7067034B2 (en) * 2000-03-27 2006-06-27 Lam Research Corporation Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma
CZ296094B6 (cs) * 2000-12-18 2006-01-11 Shm, S. R. O. Zarízení pro odparování materiálu k povlakování predmetu
SE525231C2 (sv) * 2001-06-14 2005-01-11 Chemfilt R & D Ab Förfarande och anordning för att alstra plasma
US6777885B2 (en) 2001-10-12 2004-08-17 Semiconductor Energy Laboratory Co., Ltd. Drive circuit, display device using the drive circuit and electronic apparatus using the display device
US6811657B2 (en) * 2003-01-27 2004-11-02 Micron Technology, Inc. Device for measuring the profile of a metal film sputter deposition target, and system and method employing same
US6864773B2 (en) * 2003-04-04 2005-03-08 Applied Materials, Inc. Variable field magnet apparatus
JP3508110B1 (ja) * 2003-04-25 2004-03-22 卓三 岩田 イオン化可能物質の活性化装置
JP2006024775A (ja) * 2004-07-08 2006-01-26 Tokyo Electron Ltd プラズマ処理装置、該装置の制御方法及び該方法を実行するプログラム
US20070209927A1 (en) 2004-07-09 2007-09-13 Masayuki Kamei Magnetron Sputtering Device In which Two Modes Of Magnetic Flux Distribution (Balanced Mode/Unbalanced Mode) Can Be Switched From One To The Other And Vice Versa, A Film Formation Method For Forming A Film From An Inorganic Film Formation Material Using The Device, And A Dual Mode Magnetron Sputtering Device And Film Formation Method For Forming A Film From An Inorganic Film Formation Material At A Low Temperature Using The Device
DE102005019101A1 (de) * 2005-04-25 2006-10-26 Steag Hama Tech Ag Verfahren und Vorrichtung zum Beschichten von Substraten
CN100460557C (zh) * 2005-09-28 2009-02-11 中芯国际集成电路制造(上海)有限公司 操作物理气相沉积工艺的方法与系统
RU2385967C2 (ru) * 2005-10-07 2010-04-10 Тохоку Юниверсити Аппарат магнетронного распыления
KR20080085893A (ko) * 2005-12-22 2008-09-24 오씨 외를리콘 발처스 악티엔게젤샤프트 적어도 하나의 스퍼터 코팅된 기판을 제조하는 방법 및스퍼터 소스
CN101466862A (zh) * 2006-06-08 2009-06-24 芝浦机械电子株式会社 磁控溅射磁体部件、磁控溅射装置和方法
US10043642B2 (en) * 2008-02-01 2018-08-07 Oerlikon Surface Solutions Ag, Pfäffikon Magnetron sputtering source and arrangement with adjustable secondary magnet arrangement
KR101009642B1 (ko) * 2008-07-09 2011-01-19 삼성모바일디스플레이주식회사 자화 방지용 마그네트론 부 이송 장치 및 이를 갖는마그네트론 스퍼터링 설비
US8698400B2 (en) * 2009-04-28 2014-04-15 Leybold Optics Gmbh Method for producing a plasma beam and plasma source
WO2013170052A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
ES2513866T3 (es) 2009-05-13 2014-10-27 Sio2 Medical Products, Inc. Revestimiento e inspección de recipientes
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
JP2013503974A (ja) * 2009-09-05 2013-02-04 ジェネラル・プラズマ・インコーポレーテッド プラズマ化学気相成長装置
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
WO2011156876A1 (en) * 2010-06-18 2011-12-22 Mahle Metal Leve S/A Plasma processing device
DE112010005668T5 (de) 2010-06-18 2013-05-02 Mahle International Gmbh Plasma-Verarbeitungsvorrichtung
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
KR20140004785A (ko) * 2011-05-30 2014-01-13 히타치 긴조쿠 가부시키가이샤 레이스트랙 형상의 마그네트론 스퍼터링용 자장 발생 장치
KR101241049B1 (ko) 2011-08-01 2013-03-15 주식회사 플라즈마트 플라즈마 발생 장치 및 플라즈마 발생 방법
KR101246191B1 (ko) * 2011-10-13 2013-03-21 주식회사 윈텔 플라즈마 장치 및 기판 처리 장치
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
WO2014071061A1 (en) 2012-11-01 2014-05-08 Sio2 Medical Products, Inc. Coating inspection method
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
EP2778253B1 (de) * 2013-02-26 2018-10-24 Oerlikon Surface Solutions AG, Pfäffikon Zylinderförmige Verdampfungsquelle
EP2961858B1 (en) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Coated syringe.
CN110074968B (zh) 2013-03-11 2021-12-21 Sio2医药产品公司 涂布包装材料
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US9508532B2 (en) * 2013-03-13 2016-11-29 Bb Plasma Design Ab Magnetron plasma apparatus
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
CN103269555B (zh) * 2013-04-28 2016-07-06 哈尔滨工业大学 用具零磁场区的磁场位形约束高温等离子体的系统和方法
RU2554085C2 (ru) * 2013-09-20 2015-06-27 Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный университет имени М.В. Ломоносова" (МГУ) Способ нагрева электродов и создания самостоятельного дугового разряда с поджигом от тонкой металлической проволочки в свободном пространстве в магнитном поле
EP3693493A1 (en) 2014-03-28 2020-08-12 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
US9533909B2 (en) 2014-03-31 2017-01-03 Corning Incorporated Methods and apparatus for material processing using atmospheric thermal plasma reactor
US9550694B2 (en) * 2014-03-31 2017-01-24 Corning Incorporated Methods and apparatus for material processing using plasma thermal source
US10410889B2 (en) 2014-07-25 2019-09-10 Applied Materials, Inc. Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors
RU2577040C2 (ru) * 2014-07-29 2016-03-10 Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный университет имени М.В. Ломоносова" (МГУ) Магнитный гаситель самостоятельного дугового разряда
JP6403269B2 (ja) * 2014-07-30 2018-10-10 株式会社神戸製鋼所 アーク蒸発源
US20160200618A1 (en) 2015-01-08 2016-07-14 Corning Incorporated Method and apparatus for adding thermal energy to a glass melt
EP3337915B1 (en) 2015-08-18 2021-11-03 SiO2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
RU2614526C2 (ru) * 2015-08-31 2017-03-28 Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный университет имени М.В. Ломоносова" (МГУ) Способ отклонения тепловой кумулятивной струи расплавленного металла и образованного ей канала на металлической поверхности катода в дуговом импульсном разряде при взрыве проволочки между электродами действием поперечного магнитного поля
WO2017221134A1 (en) * 2016-06-21 2017-12-28 Medident Technologies Inc. Plasmaclave device
FR3079775B1 (fr) * 2018-04-06 2021-11-26 Addup Dispositif de chauffage a confinement magnetique pour appareil de fabrication additive selective
US11784033B2 (en) 2021-05-28 2023-10-10 Applied Materials, Inc. Methods and apparatus for processing a substrate

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143371A (en) * 1974-10-12 1976-04-14 Daido Steel Co Ltd Netsushorihohooyobi netsushorisochi
US4588490A (en) * 1985-05-22 1986-05-13 International Business Machines Corporation Hollow cathode enhanced magnetron sputter device
JPH02243762A (ja) † 1989-03-17 1990-09-27 Hitachi Ltd スパッタ装置
JPH02246216A (ja) 1989-03-20 1990-10-02 Hitachi Ltd プラズマ装置
JPH0688229A (ja) * 1991-01-29 1994-03-29 Boc Group Inc:The 二重円筒マグネトロンに於けるスパッタリングターゲットの磁場ゾーン回転の電気制御
JPH04346662A (ja) * 1991-05-22 1992-12-02 Ube Ind Ltd スパッタリング方法およびその装置
US5411624A (en) * 1991-07-23 1995-05-02 Tokyo Electron Limited Magnetron plasma processing apparatus
JPH05148642A (ja) † 1991-11-28 1993-06-15 Hitachi Ltd マグネトロンスパツタ装置
NO174450C (no) * 1991-12-12 1994-05-04 Kvaerner Eng Anordning ved plasmabrenner for kjemiske prosesser
JP3311064B2 (ja) * 1992-03-26 2002-08-05 株式会社東芝 プラズマ生成装置、表面処理装置および表面処理方法
KR0127663B1 (ko) * 1992-04-17 1998-04-01 모리시타 요이찌 플라즈마발생장치 및 플라즈마발생방법
JPH06181187A (ja) * 1992-12-11 1994-06-28 Hitachi Ltd スパッタリング装置
US5399253A (en) † 1992-12-23 1995-03-21 Balzers Aktiengesellschaft Plasma generating device
JPH06212420A (ja) 1993-01-13 1994-08-02 Shin Etsu Chem Co Ltd スパッタ及びエッチング方法
JP2704352B2 (ja) 1993-01-22 1998-01-26 信越化学工業株式会社 磁場発生装置
JP3174982B2 (ja) 1993-03-27 2001-06-11 東京エレクトロン株式会社 プラズマ処理装置
JP2970317B2 (ja) * 1993-06-24 1999-11-02 松下電器産業株式会社 スパッタリング装置及びスパッタリング方法
US5518547A (en) * 1993-12-23 1996-05-21 International Business Machines Corporation Method and apparatus for reducing particulates in a plasma tool through steady state flows
JP3124204B2 (ja) * 1994-02-28 2001-01-15 株式会社東芝 プラズマ処理装置
ZA956811B (en) † 1994-09-06 1996-05-14 Boc Group Inc Dual cylindrical target magnetron with multiple anodes
SE503141C2 (sv) * 1994-11-18 1996-04-01 Ladislav Bardos Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning
JPH08319552A (ja) * 1995-05-22 1996-12-03 Nagata Tekko Kk プラズマトーチおよびプラズマ溶射装置

Also Published As

Publication number Publication date
EP1033068B2 (en) 2011-03-09
CZ298474B6 (cs) 2007-10-10
JP2001524743A (ja) 2001-12-04
AU1182099A (en) 1999-06-15
SE9704260L (sv) 1999-05-21
DE69828904D1 (de) 2005-03-10
WO1999027758A1 (en) 1999-06-03
EP1033068A1 (en) 2000-09-06
EP1033068B1 (en) 2005-02-02
SE511139C2 (sv) 1999-08-09
US6351075B1 (en) 2002-02-26
JP4491132B2 (ja) 2010-06-30
CZ20001853A3 (cs) 2000-08-16
DE69828904T2 (de) 2006-01-12
DE69828904T3 (de) 2012-02-09

Similar Documents

Publication Publication Date Title
SE9704260D0 (sv) Plasmabearbetningsapparat
DE69618655D1 (de) Permanent magnetregulierbarer koppler
AU594262B2 (en) Permanent magnet variable reluctance generator
DE69416747T2 (de) Vorrichtung zum Antrieb und zur Steuerung von Synchronmotoren, die Permanentmagnete als Erregungssystem benützen
NZ337242A (en) Adjustable magnetic coupler
IE812082L (en) Magnetic linear bearing
DE69201588D1 (de) Magnetplatte mit Permanentmagneten.
DE3783774D1 (de) Zylindrischer permanentmagnet zur erzeugung eines homogenen, transversalen magnetfeldes.
EP0987522A3 (en) Method of and apparatus for generating a pulse signal
ATE275300T1 (de) Betätigungs- und regelverfahren und vorrichtung, insbesondere für synchrone, permanentmagnet- motoren
ATE228712T1 (de) Elektromagnetisch arbeitende stelleinrichtung
GB1510548A (en) Positional transducers utilizing magnetic elements
MY126038A (en) Ultrafast magnetization reversal
FR2598808B1 (fr) Procede de reglage des correcteurs d'homogeneite du champ magnetique cree par un aimant
DE69113732T2 (de) Magnetkreis mit Permanentmagnet.
EP0356146A3 (en) Magnet assembly
GB2119774A (en) Device for oriented feeding ferromagnetic parts
EP0987821A3 (en) Apparatus for and method of generating a pulse signal
SU1517486A1 (ru) Инерциальный чувствительный элемент
KR970047612U (ko) 영구자석형 직류 전동기 계자 착자장치
JPS51133716A (en) Permanent magent means restricting inverse resistance and providing fo r action in a constant direction
EP0376604A3 (en) Speed sensor with magnetic field switching for actuating a magneto-optic switch means
SE8503947D0 (sv) Elektronisk brytare i form av en vipparm
JPS6435319A (en) Multiple output magnetic rotary encoder
GB8708646D0 (en) Electrical apparatus

Legal Events

Date Code Title Description
NUG Patent has lapsed