SE518170C2 - Flerstrålemönstergenerator och metod för skannande - Google Patents
Flerstrålemönstergenerator och metod för skannandeInfo
- Publication number
- SE518170C2 SE518170C2 SE0002405A SE0002405A SE518170C2 SE 518170 C2 SE518170 C2 SE 518170C2 SE 0002405 A SE0002405 A SE 0002405A SE 0002405 A SE0002405 A SE 0002405A SE 518170 C2 SE518170 C2 SE 518170C2
- Authority
- SE
- Sweden
- Prior art keywords
- optical track
- carrier
- changing
- beams
- stationary optical
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Microscoopes, Condenser (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0002405A SE518170C2 (sv) | 2000-06-27 | 2000-06-27 | Flerstrålemönstergenerator och metod för skannande |
JP2002506371A JP2004502197A (ja) | 2000-06-27 | 2001-06-25 | マルチビームパターン生成装置 |
KR1020027017016A KR100794851B1 (ko) | 2000-06-27 | 2001-06-25 | 다중빔 패턴 발생기 |
US10/275,623 US6975443B2 (en) | 2000-06-27 | 2001-06-25 | Multi-beam pattern generator |
DE10196379T DE10196379B3 (de) | 2000-06-27 | 2001-06-25 | Mehrstrahl-Mustergenerator |
CNB018102700A CN1221866C (zh) | 2000-06-27 | 2001-06-25 | 扫描图案生成器系统以及扫描方法 |
PCT/SE2001/001443 WO2002001298A1 (en) | 2000-06-27 | 2001-06-25 | Multi-beam pattern generator |
AU2001266499A AU2001266499A1 (en) | 2000-06-27 | 2001-06-25 | Multi-beam pattern generator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0002405A SE518170C2 (sv) | 2000-06-27 | 2000-06-27 | Flerstrålemönstergenerator och metod för skannande |
Publications (3)
Publication Number | Publication Date |
---|---|
SE0002405D0 SE0002405D0 (sv) | 2000-06-27 |
SE0002405L SE0002405L (sv) | 2001-12-28 |
SE518170C2 true SE518170C2 (sv) | 2002-09-03 |
Family
ID=20280257
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0002405A SE518170C2 (sv) | 2000-06-27 | 2000-06-27 | Flerstrålemönstergenerator och metod för skannande |
Country Status (8)
Country | Link |
---|---|
US (1) | US6975443B2 (de) |
JP (1) | JP2004502197A (de) |
KR (1) | KR100794851B1 (de) |
CN (1) | CN1221866C (de) |
AU (1) | AU2001266499A1 (de) |
DE (1) | DE10196379B3 (de) |
SE (1) | SE518170C2 (de) |
WO (1) | WO2002001298A1 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7184184B2 (en) | 2003-12-31 | 2007-02-27 | Reliant Technologies, Inc. | High speed, high efficiency optical pattern generator using rotating optical elements |
US7196831B2 (en) | 2003-12-31 | 2007-03-27 | Reliant Technologies, Inc. | Two-dimensional optical scan system using a counter-rotating disk scanner |
KR101306184B1 (ko) | 2007-09-04 | 2013-09-09 | 삼성전자주식회사 | 3차원 디스플레이 장치 및 3차원 영상 표시 방법 |
US8390786B2 (en) | 2008-09-23 | 2013-03-05 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8670106B2 (en) | 2008-09-23 | 2014-03-11 | Pinebrook Imaging, Inc. | Optical imaging writer system |
US8390781B2 (en) | 2008-09-23 | 2013-03-05 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8395752B2 (en) | 2008-09-23 | 2013-03-12 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8253923B1 (en) | 2008-09-23 | 2012-08-28 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
EP2317386B1 (de) * | 2008-12-23 | 2012-07-11 | Carl Zeiss SMT GmbH | Beleuchtungssystem eines mikrolithographischen Projektionsbelichtungsgeräts |
CN103238113B (zh) | 2010-12-08 | 2015-09-09 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
US10725287B2 (en) | 2013-06-11 | 2020-07-28 | Nlight, Inc. | Image rotation compensation for multiple beam material processing |
WO2015060905A1 (en) * | 2013-10-22 | 2015-04-30 | Applied Materials, Inc. | Pattern generators employing processors to vary delivery dose of writing beams according to photoresist thickness, and associated methods |
US10569357B1 (en) | 2014-08-01 | 2020-02-25 | Nlight, Inc. | Scanner drift compensation for laser material processing |
US10406630B1 (en) | 2014-11-20 | 2019-09-10 | Nlight, Inc. | Multi-beam laser processing with dispersion compensation |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5793907U (de) * | 1980-11-26 | 1982-06-09 | ||
JPS57102016A (en) | 1980-12-17 | 1982-06-24 | Hitachi Ltd | Pattern generator |
DE3883056T2 (de) * | 1987-04-27 | 1994-03-17 | Dainippon Screen Mfg | Optisches System für ein Lichtpunktabtastsystem. |
JPH0315018A (ja) * | 1989-01-13 | 1991-01-23 | Dainippon Screen Mfg Co Ltd | 画像走査記録装置のレーザ露光装置 |
DE69226511T2 (de) | 1992-03-05 | 1999-01-28 | Micronic Laser Systems Ab | Verfahren und Vorrichtung zur Belichtung von Substraten |
JPH0992592A (ja) * | 1995-09-22 | 1997-04-04 | Canon Inc | 走査露光装置及びそれを用いたデバイスの製造方法 |
JP3991166B2 (ja) * | 1996-10-25 | 2007-10-17 | 株式会社ニコン | 照明光学装置および該照明光学装置を備えた露光装置 |
JP3571935B2 (ja) * | 1998-10-09 | 2004-09-29 | キヤノン株式会社 | 投影露光装置及びそれを用いたデバイスの製造方法 |
SE514835C2 (sv) * | 1999-01-21 | 2001-04-30 | Micronic Laser Systems Ab | System och metod för mikrolitografiskt skrivande |
US6570840B1 (en) * | 2000-04-26 | 2003-05-27 | Optical Disc Corporation | Figure of merit in optical recording structures |
-
2000
- 2000-06-27 SE SE0002405A patent/SE518170C2/sv not_active IP Right Cessation
-
2001
- 2001-06-25 AU AU2001266499A patent/AU2001266499A1/en not_active Abandoned
- 2001-06-25 WO PCT/SE2001/001443 patent/WO2002001298A1/en active Application Filing
- 2001-06-25 US US10/275,623 patent/US6975443B2/en not_active Expired - Lifetime
- 2001-06-25 KR KR1020027017016A patent/KR100794851B1/ko active IP Right Grant
- 2001-06-25 DE DE10196379T patent/DE10196379B3/de not_active Expired - Lifetime
- 2001-06-25 CN CNB018102700A patent/CN1221866C/zh not_active Expired - Lifetime
- 2001-06-25 JP JP2002506371A patent/JP2004502197A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2004502197A (ja) | 2004-01-22 |
AU2001266499A1 (en) | 2002-01-08 |
WO2002001298A1 (en) | 2002-01-03 |
DE10196379B3 (de) | 2012-03-29 |
US20030140806A1 (en) | 2003-07-31 |
CN1221866C (zh) | 2005-10-05 |
KR20030076235A (ko) | 2003-09-26 |
US6975443B2 (en) | 2005-12-13 |
SE0002405L (sv) | 2001-12-28 |
DE10196379T1 (de) | 2003-05-22 |
KR100794851B1 (ko) | 2008-01-15 |
SE0002405D0 (sv) | 2000-06-27 |
CN1432142A (zh) | 2003-07-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |