DE10196379T1 - Mehrstrahl-Mustergenerator - Google Patents

Mehrstrahl-Mustergenerator

Info

Publication number
DE10196379T1
DE10196379T1 DE10196379T DE10196379T DE10196379T1 DE 10196379 T1 DE10196379 T1 DE 10196379T1 DE 10196379 T DE10196379 T DE 10196379T DE 10196379 T DE10196379 T DE 10196379T DE 10196379 T1 DE10196379 T1 DE 10196379T1
Authority
DE
Germany
Prior art keywords
beam pattern
pattern generator
generator
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE10196379T
Other languages
English (en)
Other versions
DE10196379B3 (de
Inventor
Torbjoern Sandstroem
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micronic Laser Systems AB
Original Assignee
Micronic Laser Systems AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems AB filed Critical Micronic Laser Systems AB
Publication of DE10196379T1 publication Critical patent/DE10196379T1/de
Application granted granted Critical
Publication of DE10196379B3 publication Critical patent/DE10196379B3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Microscoopes, Condenser (AREA)
DE10196379T 2000-06-27 2001-06-25 Mehrstrahl-Mustergenerator Expired - Lifetime DE10196379B3 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE0002405A SE518170C2 (sv) 2000-06-27 2000-06-27 Flerstrålemönstergenerator och metod för skannande
SE0002405-9 2000-06-27
PCT/SE2001/001443 WO2002001298A1 (en) 2000-06-27 2001-06-25 Multi-beam pattern generator

Publications (2)

Publication Number Publication Date
DE10196379T1 true DE10196379T1 (de) 2003-05-22
DE10196379B3 DE10196379B3 (de) 2012-03-29

Family

ID=20280257

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10196379T Expired - Lifetime DE10196379B3 (de) 2000-06-27 2001-06-25 Mehrstrahl-Mustergenerator

Country Status (8)

Country Link
US (1) US6975443B2 (de)
JP (1) JP2004502197A (de)
KR (1) KR100794851B1 (de)
CN (1) CN1221866C (de)
AU (1) AU2001266499A1 (de)
DE (1) DE10196379B3 (de)
SE (1) SE518170C2 (de)
WO (1) WO2002001298A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7184184B2 (en) * 2003-12-31 2007-02-27 Reliant Technologies, Inc. High speed, high efficiency optical pattern generator using rotating optical elements
US7196831B2 (en) 2003-12-31 2007-03-27 Reliant Technologies, Inc. Two-dimensional optical scan system using a counter-rotating disk scanner
KR101306184B1 (ko) 2007-09-04 2013-09-09 삼성전자주식회사 3차원 디스플레이 장치 및 3차원 영상 표시 방법
US8253923B1 (en) 2008-09-23 2012-08-28 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US8390781B2 (en) 2008-09-23 2013-03-05 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US8390786B2 (en) 2008-09-23 2013-03-05 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US8670106B2 (en) 2008-09-23 2014-03-11 Pinebrook Imaging, Inc. Optical imaging writer system
US8395752B2 (en) 2008-09-23 2013-03-12 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
EP2202580B1 (de) * 2008-12-23 2011-06-22 Carl Zeiss SMT GmbH Beleuchtungssystem eines mikrolithographischen Projektionsbelichtungsgeräts
NL2007789A (en) * 2010-12-08 2012-06-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US10725287B2 (en) 2013-06-11 2020-07-28 Nlight, Inc. Image rotation compensation for multiple beam material processing
CN105659164B (zh) 2013-10-22 2019-04-30 应用材料公司 根据光刻胶厚度使用处理器改变写入射束的输送剂量的图案产生器及相关方法
US10569357B1 (en) 2014-08-01 2020-02-25 Nlight, Inc. Scanner drift compensation for laser material processing
US10406630B1 (en) 2014-11-20 2019-09-10 Nlight, Inc. Multi-beam laser processing with dispersion compensation

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5793907U (de) * 1980-11-26 1982-06-09
JPS57102016A (en) * 1980-12-17 1982-06-24 Hitachi Ltd Pattern generator
EP0288970B1 (de) * 1987-04-27 1993-08-11 Dainippon Screen Mfg. Co., Ltd. Optisches System für ein Lichtpunktabtastsystem
JPH0315018A (ja) * 1989-01-13 1991-01-23 Dainippon Screen Mfg Co Ltd 画像走査記録装置のレーザ露光装置
DE69226511T2 (de) * 1992-03-05 1999-01-28 Micronic Laser Systems Ab, Taeby Verfahren und Vorrichtung zur Belichtung von Substraten
JPH0992592A (ja) * 1995-09-22 1997-04-04 Canon Inc 走査露光装置及びそれを用いたデバイスの製造方法
JP3991166B2 (ja) * 1996-10-25 2007-10-17 株式会社ニコン 照明光学装置および該照明光学装置を備えた露光装置
JP3571935B2 (ja) * 1998-10-09 2004-09-29 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
SE514835C2 (sv) * 1999-01-21 2001-04-30 Micronic Laser Systems Ab System och metod för mikrolitografiskt skrivande
US6570840B1 (en) * 2000-04-26 2003-05-27 Optical Disc Corporation Figure of merit in optical recording structures

Also Published As

Publication number Publication date
CN1432142A (zh) 2003-07-23
JP2004502197A (ja) 2004-01-22
WO2002001298A1 (en) 2002-01-03
US6975443B2 (en) 2005-12-13
US20030140806A1 (en) 2003-07-31
KR100794851B1 (ko) 2008-01-15
CN1221866C (zh) 2005-10-05
DE10196379B3 (de) 2012-03-29
SE518170C2 (sv) 2002-09-03
SE0002405L (sv) 2001-12-28
KR20030076235A (ko) 2003-09-26
SE0002405D0 (sv) 2000-06-27
AU2001266499A1 (en) 2002-01-08

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
R016 Response to examination communication
R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final

Effective date: 20120630

R071 Expiry of right