SE0002405L - Multi-beam pattern generator - Google Patents
Multi-beam pattern generatorInfo
- Publication number
- SE0002405L SE0002405L SE0002405A SE0002405A SE0002405L SE 0002405 L SE0002405 L SE 0002405L SE 0002405 A SE0002405 A SE 0002405A SE 0002405 A SE0002405 A SE 0002405A SE 0002405 L SE0002405 L SE 0002405L
- Authority
- SE
- Sweden
- Prior art keywords
- optical path
- substrate
- beams
- light source
- carrier
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Microscoopes, Condenser (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0002405A SE518170C2 (sv) | 2000-06-27 | 2000-06-27 | Flerstrålemönstergenerator och metod för skannande |
PCT/SE2001/001443 WO2002001298A1 (en) | 2000-06-27 | 2001-06-25 | Multi-beam pattern generator |
US10/275,623 US6975443B2 (en) | 2000-06-27 | 2001-06-25 | Multi-beam pattern generator |
JP2002506371A JP2004502197A (ja) | 2000-06-27 | 2001-06-25 | マルチビームパターン生成装置 |
CNB018102700A CN1221866C (zh) | 2000-06-27 | 2001-06-25 | 扫描图案生成器系统以及扫描方法 |
AU2001266499A AU2001266499A1 (en) | 2000-06-27 | 2001-06-25 | Multi-beam pattern generator |
KR1020027017016A KR100794851B1 (ko) | 2000-06-27 | 2001-06-25 | 다중빔 패턴 발생기 |
DE10196379T DE10196379B3 (de) | 2000-06-27 | 2001-06-25 | Mehrstrahl-Mustergenerator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0002405A SE518170C2 (sv) | 2000-06-27 | 2000-06-27 | Flerstrålemönstergenerator och metod för skannande |
Publications (3)
Publication Number | Publication Date |
---|---|
SE0002405D0 SE0002405D0 (sv) | 2000-06-27 |
SE0002405L true SE0002405L (sv) | 2001-12-28 |
SE518170C2 SE518170C2 (sv) | 2002-09-03 |
Family
ID=20280257
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0002405A SE518170C2 (sv) | 2000-06-27 | 2000-06-27 | Flerstrålemönstergenerator och metod för skannande |
Country Status (8)
Country | Link |
---|---|
US (1) | US6975443B2 (sv) |
JP (1) | JP2004502197A (sv) |
KR (1) | KR100794851B1 (sv) |
CN (1) | CN1221866C (sv) |
AU (1) | AU2001266499A1 (sv) |
DE (1) | DE10196379B3 (sv) |
SE (1) | SE518170C2 (sv) |
WO (1) | WO2002001298A1 (sv) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7184184B2 (en) | 2003-12-31 | 2007-02-27 | Reliant Technologies, Inc. | High speed, high efficiency optical pattern generator using rotating optical elements |
US7196831B2 (en) | 2003-12-31 | 2007-03-27 | Reliant Technologies, Inc. | Two-dimensional optical scan system using a counter-rotating disk scanner |
KR101306184B1 (ko) | 2007-09-04 | 2013-09-09 | 삼성전자주식회사 | 3차원 디스플레이 장치 및 3차원 영상 표시 방법 |
US8390781B2 (en) | 2008-09-23 | 2013-03-05 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8395752B2 (en) | 2008-09-23 | 2013-03-12 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8253923B1 (en) | 2008-09-23 | 2012-08-28 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8390786B2 (en) | 2008-09-23 | 2013-03-05 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US8670106B2 (en) | 2008-09-23 | 2014-03-11 | Pinebrook Imaging, Inc. | Optical imaging writer system |
EP2202580B1 (en) * | 2008-12-23 | 2011-06-22 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
JP5689535B2 (ja) * | 2010-12-08 | 2015-03-25 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及びデバイス製造方法 |
US10725287B2 (en) | 2013-06-11 | 2020-07-28 | Nlight, Inc. | Image rotation compensation for multiple beam material processing |
CN105659164B (zh) * | 2013-10-22 | 2019-04-30 | 应用材料公司 | 根据光刻胶厚度使用处理器改变写入射束的输送剂量的图案产生器及相关方法 |
US10569357B1 (en) | 2014-08-01 | 2020-02-25 | Nlight, Inc. | Scanner drift compensation for laser material processing |
US10406630B1 (en) | 2014-11-20 | 2019-09-10 | Nlight, Inc. | Multi-beam laser processing with dispersion compensation |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5793907U (sv) * | 1980-11-26 | 1982-06-09 | ||
JPS57102016A (en) * | 1980-12-17 | 1982-06-24 | Hitachi Ltd | Pattern generator |
US4861983A (en) * | 1987-04-27 | 1989-08-29 | Dainippon Screen Mfg. Co., Ltd. | Optical system for flying-spot scanning system |
JPH0315018A (ja) * | 1989-01-13 | 1991-01-23 | Dainippon Screen Mfg Co Ltd | 画像走査記録装置のレーザ露光装置 |
DE69226511T2 (de) * | 1992-03-05 | 1999-01-28 | Micronic Laser Systems Ab | Verfahren und Vorrichtung zur Belichtung von Substraten |
JPH0992592A (ja) * | 1995-09-22 | 1997-04-04 | Canon Inc | 走査露光装置及びそれを用いたデバイスの製造方法 |
JP3991166B2 (ja) * | 1996-10-25 | 2007-10-17 | 株式会社ニコン | 照明光学装置および該照明光学装置を備えた露光装置 |
JP3571935B2 (ja) * | 1998-10-09 | 2004-09-29 | キヤノン株式会社 | 投影露光装置及びそれを用いたデバイスの製造方法 |
SE514835C2 (sv) * | 1999-01-21 | 2001-04-30 | Micronic Laser Systems Ab | System och metod för mikrolitografiskt skrivande |
US6570840B1 (en) * | 2000-04-26 | 2003-05-27 | Optical Disc Corporation | Figure of merit in optical recording structures |
-
2000
- 2000-06-27 SE SE0002405A patent/SE518170C2/sv not_active IP Right Cessation
-
2001
- 2001-06-25 US US10/275,623 patent/US6975443B2/en not_active Expired - Lifetime
- 2001-06-25 CN CNB018102700A patent/CN1221866C/zh not_active Expired - Lifetime
- 2001-06-25 AU AU2001266499A patent/AU2001266499A1/en not_active Abandoned
- 2001-06-25 DE DE10196379T patent/DE10196379B3/de not_active Expired - Lifetime
- 2001-06-25 KR KR1020027017016A patent/KR100794851B1/ko active IP Right Grant
- 2001-06-25 JP JP2002506371A patent/JP2004502197A/ja active Pending
- 2001-06-25 WO PCT/SE2001/001443 patent/WO2002001298A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
CN1221866C (zh) | 2005-10-05 |
SE0002405D0 (sv) | 2000-06-27 |
US20030140806A1 (en) | 2003-07-31 |
KR20030076235A (ko) | 2003-09-26 |
US6975443B2 (en) | 2005-12-13 |
SE518170C2 (sv) | 2002-09-03 |
KR100794851B1 (ko) | 2008-01-15 |
CN1432142A (zh) | 2003-07-23 |
JP2004502197A (ja) | 2004-01-22 |
WO2002001298A1 (en) | 2002-01-03 |
AU2001266499A1 (en) | 2002-01-08 |
DE10196379B3 (de) | 2012-03-29 |
DE10196379T1 (de) | 2003-05-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |