SE514835C2 - System och metod för mikrolitografiskt skrivande - Google Patents
System och metod för mikrolitografiskt skrivandeInfo
- Publication number
- SE514835C2 SE514835C2 SE9900170A SE9900170A SE514835C2 SE 514835 C2 SE514835 C2 SE 514835C2 SE 9900170 A SE9900170 A SE 9900170A SE 9900170 A SE9900170 A SE 9900170A SE 514835 C2 SE514835 C2 SE 514835C2
- Authority
- SE
- Sweden
- Prior art keywords
- writing
- detector
- substrate
- laser
- typing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9900170A SE514835C2 (sv) | 1999-01-21 | 1999-01-21 | System och metod för mikrolitografiskt skrivande |
PCT/SE2000/000136 WO2000043838A1 (en) | 1999-01-21 | 2000-01-21 | Laser writer |
AU23404/00A AU2340400A (en) | 1999-01-21 | 2000-01-21 | Laser writer |
US09/869,922 US6624878B1 (en) | 1999-01-21 | 2000-01-21 | Laser writer |
JP2000595202A JP2002535719A (ja) | 1999-01-21 | 2000-01-21 | レーザー記録方法およびシステム |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9900170A SE514835C2 (sv) | 1999-01-21 | 1999-01-21 | System och metod för mikrolitografiskt skrivande |
Publications (3)
Publication Number | Publication Date |
---|---|
SE9900170D0 SE9900170D0 (sv) | 1999-01-21 |
SE9900170L SE9900170L (sv) | 2000-07-22 |
SE514835C2 true SE514835C2 (sv) | 2001-04-30 |
Family
ID=20414167
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9900170A SE514835C2 (sv) | 1999-01-21 | 1999-01-21 | System och metod för mikrolitografiskt skrivande |
Country Status (5)
Country | Link |
---|---|
US (1) | US6624878B1 (de) |
JP (1) | JP2002535719A (de) |
AU (1) | AU2340400A (de) |
SE (1) | SE514835C2 (de) |
WO (1) | WO2000043838A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10138313A1 (de) * | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
US20050002090A1 (en) * | 1998-05-05 | 2005-01-06 | Carl Zeiss Smt Ag | EUV illumination system having a folding geometry |
SE518170C2 (sv) * | 2000-06-27 | 2002-09-03 | Micronic Laser Systems Ab | Flerstrålemönstergenerator och metod för skannande |
SE0200547D0 (sv) * | 2002-02-25 | 2002-02-25 | Micronic Laser Systems Ab | An image forming method and apparatus |
JP2007052080A (ja) * | 2005-08-15 | 2007-03-01 | Fujifilm Holdings Corp | 描画装置、露光装置、および描画方法 |
US20090199152A1 (en) * | 2008-02-06 | 2009-08-06 | Micronic Laser Systems Ab | Methods and apparatuses for reducing mura effects in generated patterns |
JP6000695B2 (ja) * | 2011-07-08 | 2016-10-05 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 |
WO2017040639A1 (en) | 2015-08-31 | 2017-03-09 | Lithoptek LLC | Apparatus and method for using scanning light beam for film or surface modification |
WO2021167587A1 (en) * | 2020-02-18 | 2021-08-26 | Applied Materials, Inc. | Data inspection for digital lithography for hvm using offline and inline approach |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2030468A5 (de) * | 1969-01-29 | 1970-11-13 | Thomson Brandt Csf | |
US4313188A (en) * | 1976-03-19 | 1982-01-26 | Rca Corporation | Method of recording an ablative optical recording medium |
US4218142A (en) * | 1978-03-08 | 1980-08-19 | Aerodyne Research, Inc. | Mask analysis |
JPS5862630A (ja) * | 1981-10-08 | 1983-04-14 | Sony Corp | 光変調装置 |
US4464030A (en) * | 1982-03-26 | 1984-08-07 | Rca Corporation | Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system |
JPS5928337A (ja) | 1982-08-09 | 1984-02-15 | Hitachi Ltd | プロジエクシヨンアライナ |
JP2797503B2 (ja) * | 1989-08-28 | 1998-09-17 | 日本電気株式会社 | プッシュプル昇圧コンバータのパルス幅変調回路 |
DE4022732A1 (de) * | 1990-07-17 | 1992-02-20 | Micronic Laser Systems Ab | Auf einem lichtempfindlich beschichteten substrat durch fokussierte laserstrahlung hergestellte struktur sowie verfahren und vorrichtung zu ihrer herstellung |
DE69226511T2 (de) * | 1992-03-05 | 1999-01-28 | Micronic Laser Systems Ab | Verfahren und Vorrichtung zur Belichtung von Substraten |
US5315111A (en) * | 1992-10-15 | 1994-05-24 | Lasa Industries, Inc. | Method and apparatus for laser beam drift compensation |
US5477304A (en) | 1992-10-22 | 1995-12-19 | Nikon Corporation | Projection exposure apparatus |
JPH0725061A (ja) * | 1993-07-09 | 1995-01-27 | Matsushita Electric Ind Co Ltd | 印字装置 |
JP3647121B2 (ja) * | 1996-01-04 | 2005-05-11 | キヤノン株式会社 | 走査露光装置および方法、ならびにデバイス製造方法 |
-
1999
- 1999-01-21 SE SE9900170A patent/SE514835C2/sv not_active IP Right Cessation
-
2000
- 2000-01-21 JP JP2000595202A patent/JP2002535719A/ja active Pending
- 2000-01-21 WO PCT/SE2000/000136 patent/WO2000043838A1/en active Application Filing
- 2000-01-21 US US09/869,922 patent/US6624878B1/en not_active Expired - Lifetime
- 2000-01-21 AU AU23404/00A patent/AU2340400A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
SE9900170L (sv) | 2000-07-22 |
WO2000043838A1 (en) | 2000-07-27 |
SE9900170D0 (sv) | 1999-01-21 |
JP2002535719A (ja) | 2002-10-22 |
AU2340400A (en) | 2000-08-07 |
US6624878B1 (en) | 2003-09-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |