RU2004103976A - Способ получения тетрафторсилана, метод анализа примесей в тетрафторсилане и газ на его основе - Google Patents

Способ получения тетрафторсилана, метод анализа примесей в тетрафторсилане и газ на его основе Download PDF

Info

Publication number
RU2004103976A
RU2004103976A RU2004103976/15A RU2004103976A RU2004103976A RU 2004103976 A RU2004103976 A RU 2004103976A RU 2004103976/15 A RU2004103976/15 A RU 2004103976/15A RU 2004103976 A RU2004103976 A RU 2004103976A RU 2004103976 A RU2004103976 A RU 2004103976A
Authority
RU
Russia
Prior art keywords
tetrafluorosilane
stage
gaseous
gas
impurities
Prior art date
Application number
RU2004103976/15A
Other languages
English (en)
Other versions
RU2274603C2 (ru
Inventor
Хитоси АТОБЕ (JP)
Хитоси АТОБЕ
Масаказу ОКА (JP)
Масаказу ОКА
Тораити КАНЕКО (JP)
Тораити КАНЕКО
Original Assignee
Сова Денко К.К. (Jp)
Сова Денко К.К.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Сова Денко К.К. (Jp), Сова Денко К.К. filed Critical Сова Денко К.К. (Jp)
Publication of RU2004103976A publication Critical patent/RU2004103976A/ru
Application granted granted Critical
Publication of RU2274603C2 publication Critical patent/RU2274603C2/ru

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/20Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising free carbon; comprising carbon obtained by carbonising processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/28Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
    • B01J20/28014Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their form
    • B01J20/28016Particle form
    • B01J20/28019Spherical, ellipsoidal or cylindrical
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/28Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
    • B01J20/28054Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their surface properties or porosity
    • B01J20/28078Pore diameter
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/28Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
    • B01J20/28054Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their surface properties or porosity
    • B01J20/28078Pore diameter
    • B01J20/2808Pore diameter being less than 2 nm, i.e. micropores or nanopores
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/34Regenerating or reactivating
    • B01J20/3416Regenerating or reactivating of sorbents or filter aids comprising free carbon, e.g. activated carbon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30Processes for preparing, regenerating, or reactivating
    • B01J20/34Regenerating or reactivating
    • B01J20/345Regenerating or reactivating using a particular desorbing compound or mixture
    • B01J20/3458Regenerating or reactivating using a particular desorbing compound or mixture in the gas phase
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • C01B33/10705Tetrafluoride
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C03B37/01453Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering for doping the preform with flourine
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02Column chromatography
    • G01N30/88Integrated analysis systems specially adapted therefor, not covered by a single one of the groups G01N30/04 - G01N30/86
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2253/00Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10Inorganic adsorbents
    • B01D2253/102Carbon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2253/00Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/30Physical properties of adsorbents
    • B01D2253/302Dimensions
    • B01D2253/308Pore size
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/10Single element gases other than halogens
    • B01D2257/102Nitrogen
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/10Single element gases other than halogens
    • B01D2257/104Oxygen
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/204Inorganic halogen compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/204Inorganic halogen compounds
    • B01D2257/2047Hydrofluoric acid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/50Carbon oxides
    • B01D2257/502Carbon monoxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/50Carbon oxides
    • B01D2257/504Carbon dioxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/55Compounds of silicon, phosphorus, germanium or arsenic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2258/00Sources of waste gases
    • B01D2258/02Other waste gases
    • B01D2258/0216Other waste gases from CVD treatment or semi-conductor manufacturing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/40Further details for adsorption processes and devices
    • B01D2259/401Further details for adsorption processes and devices using a single bed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/22Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/22Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • B01D53/228Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/08Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N2021/3595Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using FTIR
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02Column chromatography
    • G01N30/88Integrated analysis systems specially adapted therefor, not covered by a single one of the groups G01N30/04 - G01N30/86
    • G01N2030/8809Integrated analysis systems specially adapted therefor, not covered by a single one of the groups G01N30/04 - G01N30/86 analysis specially adapted for the sample
    • G01N2030/8872Integrated analysis systems specially adapted therefor, not covered by a single one of the groups G01N30/04 - G01N30/86 analysis specially adapted for the sample impurities
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03Cuvette constructions
    • G01N21/09Cuvette constructions adapted to resist hostile environments or corrosive or abrasive materials
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3504Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/40Capture or disposal of greenhouse gases of CO2
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/151Reduction of greenhouse gas [GHG] emissions, e.g. CO2
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • Nanotechnology (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Silicon Compounds (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Optical Measuring Cells (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Claims (25)

1. Способ получения тетрафторсилана, включающий стадию (1) нагревания гексафторсиликата, стадию (2-1) реакции газообразного тетрафторсилана, содержащего гексафтордисилоксан, образовавшийся на стадии (1) с газообразным фтором, стадию (2-2) реакции газообразного тетрафторсилана, содержащего гексафтордисилоксан, образовавшийся на стадии (1) с фтористым соединением многовалентного металла, или стадию (2-1) реакции газообразного тетрафторсилана, содержащего гексафтордисилоксан, образовавшийся на стадии (1) с газообразным фтором, и стадию (2-3) реакции газообразного тетрафторсилана, полученного на стадии (2-1) с фтористым соединением многовалентного металла.
2. Способ по п.1, в котором стадию (1) проводят при температуре 400°С или выше.
3. Способ по п.1, в котором стадию (2-1) проводят при температуре 100-350°С.
4. Способ по п.1, в котором стадию (2-2) или стадию (2-3) проводят при температуре 50-350°С.
5. Способ по любому из пп.1-4, в котором гексафторсиликат представляет собой, по меньшей мере, одно соединение, выбранное из группы, состоящей из гексафторсиликата щелочного металла или гексафторсиликата щелочноземельного металла.
6. Способ по п.1, в котором гексафторсиликат измельчают и сушат перед проведением стадии (1).
7. Способ по п.1, в котором фтористое соединение многовалентного металла представляет собой, по меньшей мере, одно соединение, выбранное из группы, состоящей из CoF3, MnF3, MnF4, AgF2, CeF4, PbF4 и K3NiF7.
8. Способ по п.1, в котором используют фтористое соединение многовалентного металла на носителе.
9. Способ по п.8, в котором носитель получают фторированием, по меньшей мере, одного соединения, выбранного из группы, состоящей из оксида алюминия, оксида титана и оксида циркония.
10. Способ по п.1, в котором стадию (2-2) или стадию (2-3) проводят в присутствии газообразного фтора.
11. Способ по п.1, включающий стадию (3) контактирования кремния с газообразным тетрафторсиланом, полученным на стадии (2-1), стадии (2-2) или стадиях (2-1)и(2-3).
12. Способ по п.11, в котором стадию (3) проводят при температуре 50°С или выше.
13. Способ по п.11 или 12, в котором перед проведением стадии (3) кремний подвергают термообработке в присутствии инертного газа при 400°С или выше.
14. Способ по п.1, включающий стадию (4), заключающуюся в контактировании газа, полученного на стадии (2-1), стадии (2-2), стадиях (2-1) и (2-3), стадиях (2-1) и (3), стадиях (2-2) и (3), или стадиях (2-1), (2-3) и (3), с газоразделительной мембраной и/или молекулярно-ситовым углеродом.
15. Способ по п.14, в котором газоразделительная мембрана представляет собой SiO2-ZrO2 керамическую мембрану и/или поли(4-метилпентен-1) гетерогенизированную мембрану.
16. Способ по п.14, в котором молекулярно-ситовой углерод имеет размер пор 5Å или менее.
17. Высокочистый тетрафторсилан, содержащий гексафтордисилоксан в количестве 1 об.млн-1 или менее, полученный способом по любому из пп.1-16.
18. Высокочистый тетрафторсилан по п.17, содержащий гексафтордисилоксан в количестве 0,1 об.млн-1 или менее.
19. Метод анализа примесей в высокочистом тетрафторсилане, заключающийся в контактировании тетрафторсилана, содержащего в качестве примесей газообразный H2, газообразный O2, газообразный N2, газообразный СО, газообразный СН4 и/или газообразный СО2, с адсорбентом с целью отделения указанных примесей от тетрафторсилана, и введении указанных примесей совместно с газом-носителем в газовый хроматограф с целью анализа примесей.
20. способ по пункту 19, в котором адсорбент представляет собой активированный уголь, сферический активированный уголь на основе нефтяного пека и/или молекулярно-ситовой углерод с размером пор 6Å или более.
21. Метод анализа примесей в высокочистом тетрафторсилане, заключающийся в введении тетрафторсилана, содержащего гексафтордисилоксан в качестве примеси в оптическую ячейку, окно которой изготовлено из галогенида металла, и анализе гексафтордисилоксана и/или фтористого водорода методом инфракрасной спектрометрии.
22. Способ по п.1, в котором способ по любому из пп.19-21 используется для контроля процесса.
23. Газ, предназначенный для производства оптического волокна, включающий газообразный тетрафторсилан, полученный способом по любому из пп.1-16.
24. Газ, предназначенный для производства полупроводников, включающий газообразный тетрафторсилан, полученный способом по любому из пп.1-16.
25. Газ, предназначенный для производства элемента солнечной батареи, включающий газообразный тетрафторсилан, полученный способом по любому из пп.1-16.
RU2004103976A 2001-07-12 2002-07-11 Способ получения тетрафторсилана, метод анализа примесей в тетрафторсилане и газ на его основе RU2274603C2 (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001212890 2001-07-12
JP2001-212890 2001-07-12

Publications (2)

Publication Number Publication Date
RU2004103976A true RU2004103976A (ru) 2005-05-10
RU2274603C2 RU2274603C2 (ru) 2006-04-20

Family

ID=32012257

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2004103976A RU2274603C2 (ru) 2001-07-12 2002-07-11 Способ получения тетрафторсилана, метод анализа примесей в тетрафторсилане и газ на его основе

Country Status (10)

Country Link
US (1) US7074377B2 (ru)
EP (1) EP1406837B1 (ru)
JP (1) JP3909385B2 (ru)
KR (1) KR100636659B1 (ru)
CN (1) CN100478276C (ru)
AT (1) ATE466818T1 (ru)
DE (1) DE60236285D1 (ru)
RU (1) RU2274603C2 (ru)
TW (1) TWI265145B (ru)
WO (1) WO2003006374A1 (ru)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7666379B2 (en) 2001-07-16 2010-02-23 Voltaix, Inc. Process and apparatus for removing Bronsted acid impurities in binary halides
JP4588396B2 (ja) * 2003-09-25 2010-12-01 昭和電工株式会社 テトラフルオロシランの製造方法
TW200512159A (en) * 2003-09-25 2005-04-01 Showa Denko Kk Method for producing tetrafluorosilane
WO2005092790A2 (en) * 2004-03-19 2005-10-06 Entegris, Inc. Method and apparatus for purifying inorganic halides and oxyhalides using zeolites
US8017405B2 (en) 2005-08-08 2011-09-13 The Boc Group, Inc. Gas analysis method
US9001335B2 (en) 2005-09-30 2015-04-07 Mks Instruments Inc. Method and apparatus for siloxane measurements in a biogas
US7807074B2 (en) * 2006-12-12 2010-10-05 Honeywell International Inc. Gaseous dielectrics with low global warming potentials
JP2010537947A (ja) * 2007-09-04 2010-12-09 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド 四フッ化ケイ素及び塩化水素を含有するガス流の処理方法
US20090166173A1 (en) * 2007-12-31 2009-07-02 Sarang Gadre Effluent gas recovery process for silicon production
US20090165647A1 (en) * 2007-12-31 2009-07-02 Sarang Gadre Effluent gas recovery process for silicon production
WO2010077880A1 (en) * 2008-12-17 2010-07-08 Memc Electronic Materials, Inc. Processes and systems for producing silicon tetrafluoride from fluorosilicates in a fluidized bed reactor
KR101025748B1 (ko) 2009-03-03 2011-04-04 (주)원익머트리얼즈 불소가스 불순물 분석 장치
KR101103566B1 (ko) * 2009-05-15 2012-01-06 이용권 습식전극에 의한 피부 주름 다스림 장치
KR101159674B1 (ko) * 2009-11-16 2012-06-25 주식회사 케이씨씨 모노실란의 정제방법
US20110305621A1 (en) * 2010-06-11 2011-12-15 Kyung Hoon Kang Method Of Continuously Producing Tetrafluorosilane By Using Various Fluorinated Materials, Amorphous Silica And Sulfuric Acid
KR101215490B1 (ko) * 2010-06-11 2012-12-26 주식회사 케이씨씨 다양한 플루오라이드 원료들과 비정질 실리카 및 황산을 이용한 사불화규소의 연속 제조방법
US20120122265A1 (en) * 2010-11-17 2012-05-17 Hitachi Chemical Company, Ltd. Method for producing photovoltaic cell
CN102515170A (zh) * 2011-12-16 2012-06-27 天津市泰亨气体有限公司 采用氟硅酸法来制备四氟硅烷的方法
JP5933034B2 (ja) * 2012-01-17 2016-06-08 エムケイエス インストゥルメンツ, インコーポレイテッド バイオガス中のシロキサンを測定するための方法及び装置
FI125535B (en) * 2013-09-02 2015-11-13 Teknologian Tutkimuskeskus Vtt Oy Method and apparatus for determining the siloxane content of a gas
KR102344996B1 (ko) * 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법
CN111837025A (zh) * 2018-03-12 2020-10-27 关东电化工业株式会社 气体分析方法及装置
CN113247907A (zh) * 2021-05-14 2021-08-13 浙江福陆工程设计有限公司 一种用石英砂法制备四氟化硅的方法
CN113884600B (zh) * 2021-10-27 2023-08-08 中船(邯郸)派瑞特种气体股份有限公司 测定含氟混气中碳酰氟和四氟化硅含量的装置及测定方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3453079A (en) * 1964-06-05 1969-07-01 Dow Chemical Co Process for preparing compounds containing silicon and fluorine
GB2079262B (en) * 1980-07-02 1984-03-28 Central Glass Co Ltd Process of preparing silicon tetrafluoride by using hydrogen fluoride gas
JPS604127B2 (ja) 1981-08-06 1985-02-01 セントラル硝子株式会社 四弗化珪素ガスの精製法
DE3432678C2 (de) * 1984-09-05 1986-11-20 D. Swarovski & Co., Wattens, Tirol Verfahren zur Herstellung von Siliciumtetrafluorid
CA1290942C (en) * 1985-03-18 1991-10-22 Michihisa Kyoto Method for producing glass preform for optical fiber
EP1409400A4 (en) 1999-06-11 2004-09-15 Honeywell Intellectual Propert PURIFICATION OF A GAS INORGANIC HALIDE

Also Published As

Publication number Publication date
RU2274603C2 (ru) 2006-04-20
JP3909385B2 (ja) 2007-04-25
WO2003006374A1 (en) 2003-01-23
JP2003095636A (ja) 2003-04-03
CN100478276C (zh) 2009-04-15
DE60236285D1 (de) 2010-06-17
TWI265145B (en) 2006-11-01
US20040184980A1 (en) 2004-09-23
EP1406837B1 (en) 2010-05-05
KR100636659B1 (ko) 2006-10-19
CN1527796A (zh) 2004-09-08
KR20040013138A (ko) 2004-02-11
EP1406837A1 (en) 2004-04-14
ATE466818T1 (de) 2010-05-15
US7074377B2 (en) 2006-07-11

Similar Documents

Publication Publication Date Title
RU2004103976A (ru) Способ получения тетрафторсилана, метод анализа примесей в тетрафторсилане и газ на его основе
US7880039B2 (en) Production of carbonyl fluoride
KR20210082534A (ko) 저 히드록시기 고순도 석영 유리 및 그 제조 방법
CN100343245C (zh) 4-氟-1,3-二噁茂烷-2-酮的制备方法
US4983373A (en) Process for the production of high purity zirconium tetrafluoride and other fluorides
CA2724457A1 (en) Method of producing pretreated metal fluorides and fluoride crystals
Mamantov et al. Chlorine–Fluorine System at Low Temperatures: Characterization of the ClF2 Radical
US4310341A (en) Removal of --OH impurities from fiber optic precursor materials
GB1563625A (en) Reactive atmosphere crystal growth method
JPH04202007A (ja) 四塩化ケイ素の精製方法
US20050252246A1 (en) Method for manufacturing optical fiber
KR100490771B1 (ko) 이불화카보닐의 제조방법
JP2001064015A (ja) 希土類フッ化物の製造方法
JPH02157132A (ja) 高純度石英ガラスの製造方法
CN1736918A (zh) 一种掺镝硒化物玻璃及其制备方法
JPS5860603A (ja) 六方晶窒化硼素の高純度化方法
JPH0941225A (ja) 炭化ケイ素繊維の製造方法
RU2406694C1 (ru) Способ получения высокочистого тетрафторида кремния
JPS63285124A (ja) 石英ガラス薄膜の製造方法
JP3577224B2 (ja) フッ化水素ストロンチウムの製造方法
JP5252730B2 (ja) 放電灯用合成シリカガラス製バルブ及びその製造方法
CN1022680C (zh) 生产光纤玻璃预制件的方法
Fuller et al. The origin of optical absorptions in heavy-metal fluoride glass: II. Surface-layer and bulk absorptions
JPS60239339A (ja) 光フアイバ用母材の製造方法
CN115594388A (zh) 一种中红外波段低吸收的As-Se硫系玻璃的制备方法

Legal Events

Date Code Title Description
MM4A The patent is invalid due to non-payment of fees

Effective date: 20100712