PT3497519T - Resiste amplificado quimicamente de película espessa ambientalmente estável - Google Patents
Resiste amplificado quimicamente de película espessa ambientalmente estávelInfo
- Publication number
- PT3497519T PT3497519T PT177523461T PT17752346T PT3497519T PT 3497519 T PT3497519 T PT 3497519T PT 177523461 T PT177523461 T PT 177523461T PT 17752346 T PT17752346 T PT 17752346T PT 3497519 T PT3497519 T PT 3497519T
- Authority
- PT
- Portugal
- Prior art keywords
- enviromentally
- stable
- thick film
- chemically amplified
- amplified resist
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Other In-Based Heterocyclic Compounds (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662372573P | 2016-08-09 | 2016-08-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
PT3497519T true PT3497519T (pt) | 2021-02-09 |
Family
ID=59631750
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PT177523461T PT3497519T (pt) | 2016-08-09 | 2017-08-07 | Resiste amplificado quimicamente de película espessa ambientalmente estável |
Country Status (8)
Country | Link |
---|---|
US (1) | US11385543B2 (pt) |
EP (1) | EP3497519B1 (pt) |
JP (1) | JP6818888B2 (pt) |
KR (1) | KR102261808B1 (pt) |
CN (1) | CN109844641B (pt) |
PT (1) | PT3497519T (pt) |
TW (1) | TWI717543B (pt) |
WO (1) | WO2018029142A1 (pt) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7002966B2 (ja) * | 2018-03-12 | 2022-01-20 | 東京応化工業株式会社 | 化学増幅型ポジ型感光性樹脂組成物、鋳型付き基板の製造方法、及びめっき造形物の製造方法 |
KR20240090788A (ko) * | 2018-12-12 | 2024-06-21 | 제이에스알 가부시끼가이샤 | 감광성 수지 조성물, 레지스트 패턴막의 제조 방법, 및 도금 조형물의 제조 방법 |
CN110531579A (zh) * | 2019-09-26 | 2019-12-03 | 京东方科技集团股份有限公司 | 掩模版及其制造方法、光刻方法、显示面板、曝光装置 |
TWI833992B (zh) * | 2019-10-15 | 2024-03-01 | 美商羅門哈斯電子材料有限公司 | 光致抗蝕劑組成物及圖案形成方法 |
KR20220101662A (ko) | 2019-11-14 | 2022-07-19 | 메르크 파텐트 게엠베하 | 알칼리-가용성 아크릴 수지를 포함하는 dnq-타입 포토레지스트 조성물 |
KR20220106794A (ko) * | 2019-11-25 | 2022-07-29 | 메르크 파텐트 게엠베하 | 화학 증폭형 포토레지스트 |
US20210200084A1 (en) * | 2019-12-31 | 2021-07-01 | Rohm And Haas Electronic Materials Llc | Polymers and photoresist compositions |
WO2021192802A1 (ja) * | 2020-03-26 | 2021-09-30 | 富士フイルム株式会社 | 感放射線性樹脂組成物の製造方法、パターン形成方法 |
CN118284852A (zh) | 2021-11-17 | 2024-07-02 | 默克专利股份有限公司 | 通过湿式化学蚀刻以改善金属结构制造的组合物和方法 |
CN114874384A (zh) * | 2022-01-21 | 2022-08-09 | 南通林格橡塑制品有限公司 | 一种193nm光刻胶成膜树脂及其制备方法和正型光刻胶组合物 |
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-
2017
- 2017-08-07 US US16/323,005 patent/US11385543B2/en active Active
- 2017-08-07 WO PCT/EP2017/069943 patent/WO2018029142A1/en unknown
- 2017-08-07 CN CN201780048100.3A patent/CN109844641B/zh active Active
- 2017-08-07 EP EP17752346.1A patent/EP3497519B1/en active Active
- 2017-08-07 PT PT177523461T patent/PT3497519T/pt unknown
- 2017-08-07 KR KR1020197006990A patent/KR102261808B1/ko active IP Right Grant
- 2017-08-07 JP JP2019529686A patent/JP6818888B2/ja active Active
- 2017-08-07 TW TW106126605A patent/TWI717543B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR102261808B1 (ko) | 2021-06-07 |
CN109844641B (zh) | 2022-10-11 |
CN109844641A (zh) | 2019-06-04 |
JP2019530903A (ja) | 2019-10-24 |
US20200183278A1 (en) | 2020-06-11 |
EP3497519B1 (en) | 2020-11-25 |
US11385543B2 (en) | 2022-07-12 |
EP3497519A1 (en) | 2019-06-19 |
TWI717543B (zh) | 2021-02-01 |
KR20190039990A (ko) | 2019-04-16 |
TW201818157A (zh) | 2018-05-16 |
WO2018029142A1 (en) | 2018-02-15 |
JP6818888B2 (ja) | 2021-01-20 |
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