PL2852698T3 - Kąpiel galwaniczna do powlekania niklem lub stopem niklu w celu osadzania pół-błyszczącej warstwy niklu lub stopu niklu - Google Patents
Kąpiel galwaniczna do powlekania niklem lub stopem niklu w celu osadzania pół-błyszczącej warstwy niklu lub stopu nikluInfo
- Publication number
- PL2852698T3 PL2852698T3 PL14711278T PL14711278T PL2852698T3 PL 2852698 T3 PL2852698 T3 PL 2852698T3 PL 14711278 T PL14711278 T PL 14711278T PL 14711278 T PL14711278 T PL 14711278T PL 2852698 T3 PL2852698 T3 PL 2852698T3
- Authority
- PL
- Poland
- Prior art keywords
- nickel
- bath
- electroplating
- nickel alloy
- depositing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/78—Carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D213/81—Amides; Imides
- C07D213/82—Amides; Imides in position 3
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/72—Nitrogen atoms
- C07D213/74—Amino or imino radicals substituted by hydrocarbon or substituted hydrocarbon radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/18—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carboxylic acids, or sulfur or nitrogen analogues thereof
- C07D295/182—Radicals derived from carboxylic acids
- C07D295/192—Radicals derived from carboxylic acids from aromatic carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/06—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D413/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D413/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
- C07D413/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Pyridine Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13167074.7A EP2801640A1 (en) | 2013-05-08 | 2013-05-08 | Galvanic nickel or nickel alloy electroplating bath for depositing a semi-bright nickel or nickel alloy |
| EP14711278.3A EP2852698B1 (en) | 2013-05-08 | 2014-03-20 | Galvanic nickel or nickel alloy electroplating bath for depositing a semi-bright nickel or nickel alloy, method for electroplating and use of such a bath and compounds for the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL2852698T3 true PL2852698T3 (pl) | 2017-05-31 |
Family
ID=48227095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL14711278T PL2852698T3 (pl) | 2013-05-08 | 2014-03-20 | Kąpiel galwaniczna do powlekania niklem lub stopem niklu w celu osadzania pół-błyszczącej warstwy niklu lub stopu niklu |
Country Status (12)
| Country | Link |
|---|---|
| US (2) | US9752244B2 (pl) |
| EP (2) | EP2801640A1 (pl) |
| JP (2) | JP5882540B2 (pl) |
| KR (3) | KR101665905B1 (pl) |
| CN (1) | CN104285000B (pl) |
| BR (1) | BR112014028046B1 (pl) |
| CA (1) | CA2882477C (pl) |
| ES (1) | ES2609384T3 (pl) |
| PL (1) | PL2852698T3 (pl) |
| PT (1) | PT2852698T (pl) |
| TW (1) | TWI527797B (pl) |
| WO (1) | WO2014180595A1 (pl) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014207778B3 (de) | 2014-04-25 | 2015-05-21 | Kiesow Dr. Brinkmann GmbH & Co. KG | Verwendung einer Mischung zur Verwendung in einem galvanischen Bad oder eines galvanischen Bades zur Herstellung einer Glanznickelschicht sowie Verfahren zur Herstellung eines Artikels mit einer Glanznickelschicht |
| CN105112949A (zh) * | 2015-07-31 | 2015-12-02 | 广东欧珀移动通信有限公司 | 一种改善铝合金镀件光泽度的方法及铝合金镀件、电子装置 |
| TWI707061B (zh) * | 2015-11-27 | 2020-10-11 | 德商德國艾托特克公司 | 鈀之電鍍浴組合物及無電電鍍方法 |
| CN109154093B (zh) * | 2016-05-18 | 2020-11-27 | 日本高纯度化学株式会社 | 电解镍(合金)镀覆液 |
| KR102023363B1 (ko) * | 2016-07-15 | 2019-09-24 | 한국생산기술연구원 | 니켈 도금용 평탄제 및 이를 포함하는 니켈 도금액 |
| EP3360988B1 (en) * | 2017-02-09 | 2019-06-26 | ATOTECH Deutschland GmbH | Pyridinium compounds, a synthesis method therefor, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating baths |
| CN110785516A (zh) * | 2017-06-23 | 2020-02-11 | 德国艾托特克公司 | 用于在衬底上沉积装饰用镍涂层的镍电镀浴 |
| EP3456870A1 (en) * | 2017-09-13 | 2019-03-20 | ATOTECH Deutschland GmbH | A bath and method for filling a vertical interconnect access or trench of a work piece with nickel or a nickel alloy |
| JP2021503560A (ja) * | 2017-11-20 | 2021-02-12 | ビーエイエスエフ・ソシエタス・エウロパエアＢａｓｆ Ｓｅ | レベリング剤を含んだコバルト電気メッキ用組成物 |
| US20210317589A1 (en) * | 2018-07-03 | 2021-10-14 | Jcu Corporation | Trivalent chromium plating solution and chromium plating method using same |
| CN113614290A (zh) * | 2019-04-15 | 2021-11-05 | 德国艾托特克公司 | 用于沉积半光亮镍或半光亮镍合金涂层的电镀镍或镍合金电镀浴 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3432509A (en) * | 1964-02-24 | 1969-03-11 | M & T Chemicals Inc | Certain quaternary n-propargyl pyridinium salts |
| US3444056A (en) | 1966-06-24 | 1969-05-13 | Cilag Chemie | Nickel electroplating electrolyte |
| DE1621157A1 (de) * | 1967-08-16 | 1971-05-19 | Riedel & Co | Saures galvanisches Nickelbad |
| FR2292057A1 (fr) * | 1974-11-20 | 1976-06-18 | Popescu Francine | Bain galvanique pour nickelage brillant |
| US3953304A (en) * | 1975-06-23 | 1976-04-27 | Dart Industries Inc. | Electroplating baths for nickel and brightener-leveler compositions therefor |
| JPS5818996B2 (ja) | 1980-02-21 | 1983-04-15 | キザイ株式会社 | 緻密なめっき被膜を得るための中性錫電気めっき浴 |
| DE3817722A1 (de) * | 1988-05-25 | 1989-12-14 | Raschig Ag | Verwendung von 2-substituierten ethansulfon-verbindungen als galvanotechnische hilfsstoffe |
| EP0407594A4 (en) * | 1988-10-31 | 1991-09-25 | Nippon Soda Co., Ltd. | Novel tetrahydropyrimidine derivatives, process for their preparation and insecticides containing same as active ingredients |
| GB2242200B (en) * | 1990-02-20 | 1993-11-17 | Omi International | Plating compositions and processes |
| DE4446329A1 (de) | 1994-12-23 | 1996-06-27 | Basf Ag | Salze aromatischer Hydroxylverbindungen und deren Verwendung als Glanzbildner |
| DE19610361A1 (de) | 1996-03-15 | 1997-09-18 | Basf Ag | Bad und Verfahren für die galvanische Abscheidung von Halbglanznickel |
| DE19840019C1 (de) * | 1998-09-02 | 2000-03-16 | Atotech Deutschland Gmbh | Wäßriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- oder Zinklegierungsüberzügen sowie Verfahren |
| DE10025552C1 (de) * | 2000-05-19 | 2001-08-02 | Atotech Deutschland Gmbh | Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges |
| JP4880138B2 (ja) * | 2001-07-13 | 2012-02-22 | 石原薬品株式会社 | スズメッキ浴、スズメッキ方法及び当該メッキ浴を用いてスズメッキを施した電子部品 |
| JP3858241B2 (ja) | 2002-04-09 | 2006-12-13 | 石原薬品株式会社 | 中性スズメッキ浴を用いたバレルメッキ方法 |
| US7442286B2 (en) * | 2004-02-26 | 2008-10-28 | Atotech Deutschland Gmbh | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys |
| JP4510533B2 (ja) * | 2004-06-21 | 2010-07-28 | 英夫 本間 | マイクロバンプの形成方法 |
| EP1870495A1 (de) * | 2006-06-21 | 2007-12-26 | Atotech Deutschland Gmbh | Wässriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- und Zinklegierungsüberzügen |
| ES2340973T3 (es) | 2008-02-29 | 2010-06-11 | Atotech Deutschland Gmbh | Baño basado en pirofosfato para la deposicion de capas de aleaciones de estaño. |
-
2013
- 2013-05-08 EP EP13167074.7A patent/EP2801640A1/en not_active Withdrawn
-
2014
- 2014-03-20 KR KR1020157024417A patent/KR101665905B1/ko active IP Right Grant
- 2014-03-20 PT PT147112783T patent/PT2852698T/pt unknown
- 2014-03-20 KR KR1020167027333A patent/KR101943175B1/ko active IP Right Grant
- 2014-03-20 WO PCT/EP2014/055649 patent/WO2014180595A1/en active Application Filing
- 2014-03-20 EP EP14711278.3A patent/EP2852698B1/en active Active
- 2014-03-20 ES ES14711278.3T patent/ES2609384T3/es active Active
- 2014-03-20 JP JP2015515555A patent/JP5882540B2/ja active Active
- 2014-03-20 CN CN201480001062.2A patent/CN104285000B/zh active Active
- 2014-03-20 BR BR112014028046-0A patent/BR112014028046B1/pt active IP Right Grant
- 2014-03-20 KR KR1020147030433A patent/KR101650647B1/ko active IP Right Grant
- 2014-03-20 CA CA2882477A patent/CA2882477C/en active Active
- 2014-03-20 US US14/421,568 patent/US9752244B2/en active Active
- 2014-03-20 PL PL14711278T patent/PL2852698T3/pl unknown
- 2014-04-09 TW TW103113075A patent/TWI527797B/zh active
-
2015
- 2015-11-11 JP JP2015220989A patent/JP5877928B2/ja active Active
-
2017
- 2017-08-02 US US15/666,649 patent/US9790607B1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR101665905B1 (ko) | 2016-10-12 |
| EP2852698A1 (en) | 2015-04-01 |
| KR20160120350A (ko) | 2016-10-17 |
| KR20150109492A (ko) | 2015-10-01 |
| US20160053395A1 (en) | 2016-02-25 |
| CA2882477A1 (en) | 2014-11-13 |
| CA2882477C (en) | 2016-08-23 |
| CN104285000B (zh) | 2016-03-30 |
| JP5882540B2 (ja) | 2016-03-09 |
| CN104285000A (zh) | 2015-01-14 |
| WO2014180595A1 (en) | 2014-11-13 |
| KR101650647B1 (ko) | 2016-08-23 |
| BR112014028046B1 (pt) | 2021-07-27 |
| TWI527797B (zh) | 2016-04-01 |
| US9752244B2 (en) | 2017-09-05 |
| TW201446742A (zh) | 2014-12-16 |
| PT2852698T (pt) | 2016-12-07 |
| BR112014028046A2 (pt) | 2017-06-27 |
| US9790607B1 (en) | 2017-10-17 |
| EP2801640A1 (en) | 2014-11-12 |
| JP2015525294A (ja) | 2015-09-03 |
| JP5877928B2 (ja) | 2016-03-08 |
| KR101943175B1 (ko) | 2019-01-28 |
| KR20140145608A (ko) | 2014-12-23 |
| JP2016027211A (ja) | 2016-02-18 |
| ES2609384T3 (es) | 2017-04-20 |
| EP2852698B1 (en) | 2016-10-05 |
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