PL3030698T3 - Elektrolit do elektrolitycznego osadzania stopów srebra i palladu oraz sposób ich osadzania - Google Patents
Elektrolit do elektrolitycznego osadzania stopów srebra i palladu oraz sposób ich osadzaniaInfo
- Publication number
- PL3030698T3 PL3030698T3 PL14747884T PL14747884T PL3030698T3 PL 3030698 T3 PL3030698 T3 PL 3030698T3 PL 14747884 T PL14747884 T PL 14747884T PL 14747884 T PL14747884 T PL 14747884T PL 3030698 T3 PL3030698 T3 PL 3030698T3
- Authority
- PL
- Poland
- Prior art keywords
- deposition
- electrolyte
- silver
- palladium alloys
- electrolytic
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/64—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of silver
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/02—Heating or cooling
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102013215476.3A DE102013215476B3 (de) | 2013-08-06 | 2013-08-06 | Elektrolyt zur elektrolytischen Abscheidung von Silber-Palladium-Legierungen und Verfahren zu deren Abscheidung |
EP14747884.6A EP3030698B1 (en) | 2013-08-06 | 2014-07-24 | Electrolyte for the electrolytic deposition of silver-palladium alloys and method for deposition thereof |
PCT/EP2014/065958 WO2015018654A1 (en) | 2013-08-06 | 2014-07-24 | Electrolyte for the electrolytic deposition of silver-palladium alloys and method for deposition thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
PL3030698T3 true PL3030698T3 (pl) | 2020-06-15 |
Family
ID=51292931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL14747884T PL3030698T3 (pl) | 2013-08-06 | 2014-07-24 | Elektrolit do elektrolitycznego osadzania stopów srebra i palladu oraz sposób ich osadzania |
Country Status (8)
Country | Link |
---|---|
US (1) | US9797056B2 (pl) |
EP (1) | EP3030698B1 (pl) |
JP (1) | JP6370380B2 (pl) |
KR (1) | KR102259480B1 (pl) |
CN (1) | CN105473768B (pl) |
DE (1) | DE102013215476B3 (pl) |
PL (1) | PL3030698T3 (pl) |
WO (1) | WO2015018654A1 (pl) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PL3159435T3 (pl) | 2015-10-21 | 2018-10-31 | Umicore Galvanotechnik Gmbh | Dodatek do elektrolitów do stopu srebro-palladowego |
WO2018215057A1 (en) | 2017-05-23 | 2018-11-29 | Saxonia Edelmetalle Gmbh | Noble metal salt preparation, a method for production thereof and use for electroplating |
JP7405827B2 (ja) | 2018-08-21 | 2023-12-26 | ウミコレ・ガルファノテフニック・ゲーエムベーハー | 銀の非シアン系析出用電解質 |
DE102019106004B4 (de) * | 2019-03-08 | 2023-11-30 | Umicore Galvanotechnik Gmbh | Additiv für die cyanidfreie Abscheidung von Silber |
DE102018126174B3 (de) | 2018-10-22 | 2019-08-29 | Umicore Galvanotechnik Gmbh | Thermisch stabile Silberlegierungsschichten, Verfahren zur Abscheidung und Verwendung |
CN109735891A (zh) * | 2018-12-13 | 2019-05-10 | 江苏师范大学 | 一种用于提高微粒射流电沉积复合镀层力学性能的方法 |
US11242609B2 (en) | 2019-10-15 | 2022-02-08 | Rohm and Hass Electronic Materials LLC | Acidic aqueous silver-nickel alloy electroplating compositions and methods |
CN111893526B (zh) * | 2020-08-06 | 2022-05-13 | 中国科学技术大学 | 一种纳米银合金修饰基底及其制备方法和应用 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2914880A1 (de) * | 1979-04-12 | 1980-10-30 | Degussa | Verfahren zur elektrolytischen abscheidung von silber- und silberlegierungsschichten |
US4465563A (en) * | 1982-12-22 | 1984-08-14 | Learonal, Inc. | Electrodeposition of palladium-silver alloys |
US4478692A (en) * | 1982-12-22 | 1984-10-23 | Learonal, Inc. | Electrodeposition of palladium-silver alloys |
US4673472A (en) * | 1986-02-28 | 1987-06-16 | Technic Inc. | Method and electroplating solution for deposition of palladium or alloys thereof |
US5882736A (en) * | 1993-05-13 | 1999-03-16 | Atotech Deutschland Gmbh | palladium layers deposition process |
JPH08193290A (ja) * | 1995-01-18 | 1996-07-30 | Sumitomo Metal Ind Ltd | 光沢パラジウム系めっき浴およびめっき方法 |
US6251249B1 (en) * | 1996-09-20 | 2001-06-26 | Atofina Chemicals, Inc. | Precious metal deposition composition and process |
JP2008081765A (ja) * | 2006-09-26 | 2008-04-10 | Tanaka Kikinzoku Kogyo Kk | パラジウム合金めっき液及びそのめっき液を用いためっき方法。 |
US20110147225A1 (en) * | 2007-07-20 | 2011-06-23 | Rohm And Haas Electronic Materials Llc | High speed method for plating palladium and palladium alloys |
US20090283411A1 (en) * | 2008-05-15 | 2009-11-19 | Serdar Aksu | Selenium electroplating chemistries and methods |
-
2013
- 2013-08-06 DE DE102013215476.3A patent/DE102013215476B3/de not_active Expired - Fee Related
-
2014
- 2014-07-24 US US14/910,138 patent/US9797056B2/en active Active
- 2014-07-24 PL PL14747884T patent/PL3030698T3/pl unknown
- 2014-07-24 WO PCT/EP2014/065958 patent/WO2015018654A1/en active Application Filing
- 2014-07-24 KR KR1020167003366A patent/KR102259480B1/ko active IP Right Grant
- 2014-07-24 JP JP2016532301A patent/JP6370380B2/ja active Active
- 2014-07-24 EP EP14747884.6A patent/EP3030698B1/en active Active
- 2014-07-24 CN CN201480044126.7A patent/CN105473768B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
WO2015018654A1 (en) | 2015-02-12 |
EP3030698A1 (en) | 2016-06-15 |
KR20160040573A (ko) | 2016-04-14 |
JP2016529400A (ja) | 2016-09-23 |
US20160177462A1 (en) | 2016-06-23 |
EP3030698B1 (en) | 2020-01-15 |
JP6370380B2 (ja) | 2018-08-08 |
CN105473768A (zh) | 2016-04-06 |
US9797056B2 (en) | 2017-10-24 |
CN105473768B (zh) | 2017-12-12 |
DE102013215476B3 (de) | 2015-01-08 |
KR102259480B1 (ko) | 2021-06-03 |
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